Title:
MEASUREMENT DATABASE CONSTRUCTION METHOD AND APPARATUS BASED ON DESIGN LAYOUT, AND DEVICE AND MEDIUM
Document Type and Number:
WIPO Patent Application WO/2024/082567
Kind Code:
A1
Abstract:
Provided in the present application are a measurement database construction method and apparatus based on a design layout, and electronic device and a computer-readable storage medium. The measurement database construction method based on a design layout comprises: selecting an actual pattern that needs to be measured on a design layout; acquiring a scanning electron microscope (SEM) image of the actual pattern at an actual position of a silicon wafer; acquiring all measurement data of the SEM image; and storing the measurement data to obtain a measurement database. In the embodiments of the present application, the measurement database constructed therein can store a lot of measurement data obtained from an actual pattern of a chip and a pattern environment surrounding the measurement data.
Inventors:
HAN CHUNYING (CN)
Application Number:
PCT/CN2023/086171
Publication Date:
April 25, 2024
Filing Date:
April 04, 2023
Export Citation:
Assignee:
DONGFANG JINGYUAN ELECTRON LTD (CN)
International Classes:
G06F16/22
Attorney, Agent or Firm:
IP MARCH (CN)
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