Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
CLEANING LIQUID AND SUBSTRATE CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2024/095926
Kind Code:
A1
Abstract:
This cleaning liquid is for cleaning a substrate having a metal exposed on the surface thereof, and contains an alkanol hydroxylamine, a chelating agent, and water. The pH of the cleaning liquid at 23°C is lower than 10.

Inventors:
GO CHOITSU (JP)
WADA YUKIHISA (JP)
Application Number:
PCT/JP2023/038953
Publication Date:
May 10, 2024
Filing Date:
October 27, 2023
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
H01L21/304; C11D1/00; C11D3/30; C11D3/33; C11D3/43; C11D7/32
Domestic Patent References:
WO2021230026A12021-11-18
WO2012073909A12012-06-07
WO2022168687A12022-08-11
WO2011027772A12011-03-10
Foreign References:
JP2018109153A2018-07-12
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: PHOTOCURABLE COMPOSITION FOR NAILS OR ARTIFICIAL NAILS

Next Patent: PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD F...