Title:
CHLOROPRENE-BASED LATEX COMPOSITION, CHLOROPRENE-BASED LATEX COMPOSITION PRODUCTION METHOD, AND AQUEOUS ADHESIVE AGENT
Document Type and Number:
WIPO Patent Application WO/2023/190065
Kind Code:
A1
Abstract:
Provided is a chloroprene-based latex composition which has excellent storage stability and mechanical stability and from which it is possible to obtain an adhesive agent having excellent adhesion characteristics such as initial detachment strength, normal-state detachment strength, water resistance strength, and heat resistance adhesive power. The present invention provides a chloroprene-based latex composition containing a chloroprene-based copolymer, a polyvinyl alcohol, and a surfactant. The chloroprene-based copolymer includes a monomer unit derived from chloroprene and a monomer unit derived from a vinyl monomer including a carboxyl group. The polyvinyl alcohol has a degree of polymerization of 250-450 and a degree of saponification of 85-95 mol%. The surfactant has an HLB value of 3.0-10.0. The chloroprene-based latex composition contains 0.04-0.36 parts by mass of the surfactant with respect to 100 parts by mass of the chloroprene-based latex composition.
Inventors:
NAGAOKA KOTA (JP)
UENO YUMEMI (JP)
UENO YUMEMI (JP)
Application Number:
PCT/JP2023/011594
Publication Date:
October 05, 2023
Filing Date:
March 23, 2023
Export Citation:
Assignee:
DENKA COMPANY LTD (JP)
International Classes:
C08L11/02; C08F2/24; C08F236/18; C08K5/00; C08L29/04; C09J11/06; C09J111/02; C09J151/04
Domestic Patent References:
| WO2020111144A1 | 2020-06-04 | |||
| WO2004101670A1 | 2004-11-25 |
Foreign References:
| JPS553425A | 1980-01-11 | |||
| JP2014152183A | 2014-08-25 |
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
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