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WO/2022/169171A2 |
The present invention relates to a pellicle frame for extreme ultraviolet lithography. More specifically, the present invention relates to a pellicle frame for extreme ultraviolet lithography ensuring ventilation. The present invention p...
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WO/2022/166319A1 |
A light processing device (100), comprising a base (40), a light source (10) fixed on the base (40), a tray (20), and a digital mask (30) interposed between the light source (10) and the tray (20), wherein the tray (20) is used for placi...
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WO/2022/168728A1 |
This Ta-B sputtering target contains Ta and B, and is characterized by having Ta-B compound particles comprising one or more kinds selected from among Ta2B, Ta3B2, Ta3B4, Ta5B6, TaB, and TaB2, wherein the abundance ratio of elementary su...
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WO/2022/167500A1 |
The invention relates to a method for identifying and/or localising faults, more particularly assembly and/or operating faults in the production and/or operation of more particularly parts (11) supported in a vibration-decoupled manner, ...
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WO/2022/166080A1 |
A photomask forming method and a photomask. The photomask forming method comprises the following steps: providing a substrate, the substrate being provided with a chip area (33), and a first scribe line (31) and a second scribe line (32)...
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WO/2022/160644A1 |
Provided is a method for forming an integrated circuit structure. The method comprises: providing a first pattern and a pattern to be corrected, wherein the first pattern comprises a first sub-pattern and a second sub-pattern, which are ...
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WO/2022/163434A1 |
Provided is a mask blank having few microdefects on the surface of a thin film for pattern formation. A mask blank according to the present invention is provided with a thin film for pattern formation on a substrate. The thin film for pa...
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WO/2022/160146A1 |
A mask and a manufacturing method therefor, and a mask assembly. The mask comprises a display region and welding regions located at the opposite two sides of the display region in a first direction; each welding region at least comprises...
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WO/2022/161771A1 |
An apparatus for removing a contaminant from an optical element of a lithography apparatus, said apparats including a chamber for receiving the optical element, a gas supply configured to provide a gas, and a plasma generator and/or an e...
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WO/2022/153657A1 |
The present invention provides a reflective photomask blank which exhibits sufficient heat resistance during light exposure, while being capable of suppressing or reducing the projection effect of a reflective photomask for patterning tr...
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WO/2022/151368A1 |
A mask plate assembly (100) and a processing method therefor. The mask plate assembly (100) comprises a frame (1), shielding strips (2), and a mask plate (3); opening portions (12) are formed in the frame (1); the shielding strips (2) ar...
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WO/2022/153793A1 |
A purpose of the present invention is to provide a photomask correction device with which it is possible to smoothly perform a film process so that a deposition film, which is a pattern film of a photomask, has suitable light transmittan...
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WO/2022/152755A1 |
The invention relates to a mobile scanning and processing device (20) for the acquisition of matrix codes (14) formed as relief on flexographic printing plates (10) wherein the device comprises a light source (41) for emitting light to t...
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WO/2022/149530A1 |
The present invention provides a reflective photomask blank and a reflective photomask that have high interlayer adhesion between a capping layer and a low-reflection layer, and suppress or reduce a projection effect in a reflective phot...
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WO/2022/149417A1 |
Provided are a mask blank substrate, with which a transfer mask capable of satisfying a desired overlay accuracy can be manufactured, a substrate with a multi-layer reflective film, and a mask blank. The mask blank substrate has two op...
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WO/2022/147967A1 |
A design method and device for a dicing street mark and a photoetching mask layout (100). The design method for the dicing street mark comprises: providing a first dicing street mark (203), the first dicing street mark (203) comprising l...
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WO/2022/150545A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2022/142364A1 |
Provided are a method and apparatus for correcting a placement error of a mask. The method comprises: acquiring an exposure offset during wafer exposure after the manufacturing of a mask is completed, wherein the wafer exposure is the pr...
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WO/2022/141341A1 |
The present application discloses a photomask, a method for preparing an array substrate, and a display panel. The photomask comprises: a first conductive portion photomask wiring; a second conductive portion photomask wiring which is sp...
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WO/2022/142345A1 |
A photomask protection device, a photomask protection system and a method for using the photomask protection system. The photomask protection device comprises a frame (30) and a protection film (40), wherein the frame (30) is configured ...
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WO/2022/135823A1 |
A radiation source for generating broadband radiation, and comprising: a pump source comprising only one single fiber amplifier configured to generate pump radiation comprising a plurality of radiation pulses having a pulse energy of 2.5...
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WO/2022/140215A1 |
A photomask-inspection system includes a vacuum chamber and a stage, disposed in the vacuum chamber, to support a photomask and to translate the photomask horizontally and vertically. The system also includes an EUV objective, disposed i...
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WO/2022/140147A1 |
Substrate processing systems or platforms and methods configured to process substrates including of extreme ultraviolet (EUV) mask blanks are disclosed. Systems or platforms provide a small footprint, high throughput of substrates and mi...
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WO/2022/135981A1 |
The present invention relates to a method for repairing a defect of a lithographic mask, comprising the following steps: (a.) directing a particle beam to the defect for inducing a local etching process at the defect; (b.) monitoring the...
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WO/2022/137874A1 |
With the present invention, a pellicle frame can be correctly grasped even if warped. The present invention comprises: a frame body (10) that is a frame-shaped member in which a plurality of rod-shaped members are assembled in a substa...
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WO/2022/138713A1 |
The present invention addresses the problem of providing an image formation laminate that has high sensitivity in a thermosensitive image forming layer and has excellent manufacturing suitability and a method for manufacturing a flexogra...
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WO/2022/138434A1 |
Provided are: a multilayer reflective film-equipped substrate that is provided with a protective film having high resistance to a fluorine-based etching gas for use in a step for repairing a absorbent pattern without decreasing the refle...
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WO/2022/138170A1 |
Provided is a reflective mask blank capable of performing mask inspection with high accuracy while satisfying optical characteristics and a phase shift function required for a reflective-phase shift mask. This reflective mask blank com...
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WO/2022/135818A1 |
Improved Systems and methods of feature-based cell extraction are disclosed. The methods comprise obtaining data representative of a layout, wherein the layout includes a pattern region having no vertices, extracting unit cells from the ...
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WO/2022/138360A1 |
Provided is a reflective mask blank which makes it possible to form a transfer pattern having a fine pattern shape on a transfer target substrate, and which can be used for the manufacture of a reflective mask having a transfer pattern t...
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WO/2022/128500A1 |
Described herein are a method for determining a mask pattern and a method for training a machine learning model. The method for generating data for a mask pattern associated with a patterning process includes obtaining (i) a first mask i...
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WO/2022/128688A1 |
Disclosed is method of determining at least one homogeneity metric describing homogeneity of an etched trench on a substrate formed by a lithographic manufacturing process. The method comprises obtaining one or more images of the etched ...
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WO/2022/128246A1 |
There is provided a cleaning apparatus for cleaning a component of a lithographic apparatus, said apparatus comprising a first cleaning surface configured to physically interact with a contaminant particle located on a surface to be clea...
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WO/2022/121888A1 |
A photoresist and a patterning method therefor, a photoresist combination product, and a method for generating a printed circuit board. The photoresist comprises an organic solvent and titanium zirconium oxide nanoparticles. The general ...
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WO/2022/124192A1 |
Provided is a mask blank with which it is possible to increase a phase shift effect by increasing the transmittance of an ArF excimer laser with respect to exposure light to or above a certain transmittance, with which it is possible to ...
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WO/2022/118762A1 |
The present invention pertains to a reflection-type mask blank which is for EUV lithography and in which a multilayer reflective film that reflects EUV light, a protective film for the multilayer reflective film, and an absorption layer ...
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WO/2022/117325A1 |
Disclosed is an optical imaging system, and associated method, comprising a stage module configured to support an object such that an area of the object is illuminated by an illumination beam; an objective lens configured to collect at l...
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WO/2022/118623A1 |
Provided is a member for an exposure device, the member containing a glassy carbon. Also provided is a manufacturing method for a member for an exposure device, the method including: a molding step for molding a thermosetting resin mater...
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WO/2022/116586A1 |
Provided are an optical proximity effect correction method and system (800) and mask, said method comprising: obtaining a pattern of a layer preceding a current layer, and, according to pattern of the previous layer, classifying a region...
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WO/2022/110902A1 |
An optical proximity correction method, a mask, a readable storage medium, and a computer device. Said correction method comprises: acquiring photolithographic mask design patterns (S102); selecting, from the photolithographic mask desig...
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WO/2022/106071A1 |
A one-piece clamping device (200, 500), a storage system (300, 600) and an operating method (400, 410) for an EUV reticle stocker are provided. The required space for storing EUV reticles is significantly reduced while ensuring a high qu...
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WO/2022/109169A1 |
A phase-shift reticle for a photolithography process in semiconductor fabrication is provided. The reticle includes a substrate, a reflective structure, a pattern defining layer and a phase shifter. The reflective structure is disposed o...
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WO/2022/106482A1 |
Method for inspection of an inner pod EIP and/or an outer pod EOP of an EUV pod, respectively including a base member and a cover member, the method comprising acquiring inspection data sets using a line scan camera and an area scan came...
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WO/2022/103874A1 |
In some aspects, a mask pattern is accessed. The mask pattern is for use in a lithography process that prints a pattern on a wafer. The mask pattern is applied as input to a deterministic model of the lithography process to predict a cha...
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WO/2022/083977A1 |
Described herein is a method of for generating a mask pattern for a patterning process. The method includes obtaining (i) a subset of target features (e.g., features too close) within a target pattern, the subset of target features havin...
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WO/2022/084317A1 |
The invention relates to a binary intensity mask (100) for use in an EUV system working with EUV radiation, comprising a substrate (110) and a mask structure (140), which is applied to the substrate and contains absorber material. The ma...
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WO/2022/084243A1 |
A device, a computer program, a computer readable medium and a method setting respective relative laser intensities to a plurality of pixels representing a lithographic exposure. The plurality of pixels comprises at least one edge pixel ...
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WO/2022/082428A1 |
A mask assembly (10) and a manufacturing method therefor, and a display panel (30) and a display apparatus (00), which relate to the technical field of display. First through holes (1032a) of a mask structure (103) in the mask assembly (...
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WO/2022/079986A1 |
The present invention addresses the problem of improving the resistance to corrosion of a receiving surface of a receiving plate member that catches a plasma material or debris. This extreme ultraviolet light source (1) comprises: a li...
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WO/2022/078724A1 |
The present invention relates to a structured layer arrangement having a planar carrier substrate, on the functional and effective side of which a structured chromium layer is arranged. Said layer consists of chromium regions which alter...
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