| Document |
Document Title |
|
WO/2024/010631A1 |
This disclosure relates to compositions for cleaning post etching residues on a semiconductor substrate, as well as related cleaning methods.
|
|
WO/2024/006037A1 |
A system and method for cleaning an optical element of an EUV optical system is disclosed. The system and method may include receiving design data of one or more samples. The system and method may include simulating a plurality of irradi...
|
|
WO/2024/004843A1 |
Provided is a method for manufacturing a thin film-equipped substrate, the method making it possible to detect an identification mark when performing a defect inspection on the thin film-equipped substrate, and easily performing an indiv...
|
|
WO/2024/005038A1 |
[Problem] The present invention addresses the problem of improving the adhesion between a first layer and a second layer in a substrate with a multilayer reflective film, the substrate having a protective film that comprises the first la...
|
|
WO/2024/006117A1 |
Spacers include a base configured to be placed within depressions of one of a cover or a baseplate of a reticle pod, and a contact surface configured to contact the other of the cover and the baseplate. The spacers are configured to spac...
|
|
WO/2023/247443A1 |
The disclosure relates to a stencil mask, a method for manufacturing the stencil mask and use of the stencil mask in nanoscale device nanofabrication, including imprinting on substrates of deposition patterns for nanoscale devices. One e...
|
|
WO/2023/249314A1 |
The present invention relates to a method for manufacturing a pellicle for extreme ultraviolet lithography. The present invention relates to a method for manufacturing a pellicle for extreme ultraviolet lithography. More specifically, th...
|
|
WO/2023/245047A1 |
The present disclosure relates to precursor compositions for forming irradiation sensitive films. In particular, the disclosure is directed to use of metal-containing precursors having haloaliphatic or unsaturated substituents, or other ...
|
|
WO/2023/240672A1 |
The embodiments of the present disclosure provide a region analysis method and device for a scribe line pattern. The method comprises: determining the size of a scribe line pattern on a mask plate; according to a first image layer in a l...
|
|
WO/2023/237404A1 |
An illumination optical unit (1) is part of a mask inspection system for use with EUV illumination light (3). A hollow waveguide (11) serves to guide the illumination light (3). For the illumination light (3), the hollow waveguide (11) h...
|
|
WO/2023/236254A1 |
A photomask pattern correction method, a system, a photomask and a preparation method therefor. The photomask pattern correction method comprises: acquiring photomask data of all photomask patterns in a photomask pattern template, the ph...
|
|
WO/2023/236271A1 |
A photomask layout structure design method and a photomask layout structure, the design method comprising: acquiring an original layout of a photomask, the original layout comprising at least one first graphic, and the first graphic comp...
|
|
WO/2023/239563A1 |
An extreme ultraviolet (EUV) light source includes a vacuum chamber with a rotating target assembly therein. The rotating target assembly has an annular groove with a distal wall relative to an axis of rotation. The distal wall includes ...
|
|
WO/2023/234637A1 |
An EUV mask inspection device is provided. The EUV mask inspection device comprises: a light source for generating EUV light; a mirror for changing a path of light such that the EUV light generated from the light source is emitted to a m...
|
|
WO/2023/232408A1 |
Disclosed is a pellicle membrane comprising three or more layers, the three or more layers comprising at least one inner layer and at least one outer layer on either side of said at least one inner layer, wherein the at least one inner l...
|
|
WO/2023/230113A1 |
Reticle containers include a cover and a baseplate, with magnetic particle traps included in at least one of the cover or the baseplate. The cover and baseplate each include sealing surfaces, and at least one of the sealing surfaces incl...
|
|
WO/2023/217243A1 |
A photolithography method for preparing a semiconductor vertical cross-sectional structure. A partition member (3) is designed according to a photolithographic pattern, the partition member (3) comprises a cover plate (31), the cover pla...
|
|
WO/2023/210667A1 |
The present invention relates to a reflection-type mask blank comprising a substrate, a multilayer reflection film that reflects EUV light, a protection film, and a phase shift membrane that shifts the phase of the EUV light in this orde...
|
|
WO/2023/209271A1 |
A method for forming a free-standing pellicle film comprising high aspect ratio molecular structures (HARM-structures) is disclosed. The method comprises: a) depositing a first portion of HARM-structures onto a porous filter to form a fi...
|
|
WO/2023/183218A9 |
A method of manufacturing a photomask including the steps of receiving initial photomask design data associated with one or more patterns to be formed on a photomask and optimizing the initial photomask design data to minimize printing e...
|
|
WO/2023/203866A1 |
Provided is a manufacturing method for a reflective mask blank having a substrate and a reflective film which is laminated on a surface of the substrate and reflects exposure light, a reference mark having recessed groove-shaped cross se...
|
|
WO/2023/202822A1 |
There is provided a pellicle membrane comprising emissive crystals in a matrix containing at least one element which forms a chemical bond with silicon having a bond dissociation energy of at least 447 kJ mol-1. Also provided is a method...
|
|
WO/2023/204983A1 |
Reticle containers include a magnetic latch to close the container and clamp the reticle contained within. The magnetic latch includes at least one magnet and another ferromagnetic material, which can be either another magnet or a magnet...
|
|
WO/2023/204991A1 |
Reticle containers include a rotating latch including a spring. The spring provides force bringing the segments of the reticle container towards one another such that a reticle in the container is clamped between the container segments. ...
|
|
WO/2023/197550A1 |
A mask, a photolithographic apparatus, and a method for manufacturing a mask. The mask comprises: an electrolytic reaction layer (110), a metal element in the electrolytic reaction layer (110) being configured to be in a deposited metal ...
|
|
WO/2023/199668A1 |
This phase shift mask blank has: a substrate; and a first layer that is deposited on the substrate. The first layer contains zirconium (Zr), silicon (Si), and nitrogen (N). The transmittance of the first layer at a thickness at which a 1...
|
|
WO/2023/200300A1 |
The present invention relates to a method for manufacturing a graphene thin film for a pellicle material using ozone gas, and more specifically, the method comprises: a graphene forming step in which graphene is formed on an upper surfac...
|
|
WO/2023/200139A1 |
The present invention provides a method for manufacturing a pellicle and a pellicle for extreme ultraviolet exposure manufactured by the method, the method comprising a step of forming a metal silicide capping layer by using a silicon pr...
|
|
WO/2023/199888A1 |
The present invention relates to a reflective mask blank having, in the following order on a substrate, a multilayer reflective film that reflects EUV light and is formed by alternately laminating Mo layers and Si layers, an intermediate...
|
|
WO/2023/197552A1 |
A mask (100), a photolithography apparatus and a method for manufacturing a mask (100). The mask (100) comprises: an electrolytic reaction layer (110), the electrolytic reaction layer (110) comprising an electrochromic material; a first ...
|
|
WO/2023/197553A1 |
A mask, a photolithographic device, a manufacturing method for a mask, and a mask-based photolithography method. The mask comprises: a substrate (110), configured to transmit light to an exposure light beam (920) for photolithography, th...
|
|
WO/2023/195818A1 |
A comprehensive inspection device for an EUV exposure process is provided. The comprehensive inspection device for an EUV exposure process may comprise: a light generation unit for generating EUV light; a splitter for receiving the EUV l...
|
|
WO/2023/194017A1 |
An apparatus comprising a multilayer structure configured to reflect electromagnetic radiation. The apparatus comprises a sensor configured to detect an angular distribution of the electromagnetic radiation after reflection from the mult...
|
|
WO/2023/195677A1 |
The disclosed method for manufacturing a pellicle comprises the steps of: forming an upper and a lower silicon nitride layer on both surfaces of a wafer substrate; forming a metal layer on the lower silicon nitride layer; etching the upp...
|
|
WO/2023/193995A1 |
A pellicle for EUV lithography comprises a core layer comprising silicon and having at least one non- oxidised surface, and a cap layer at at least one major surface of the core layer. The cap layer comprises carbon and/or boron. The cap...
|
|
WO/2023/193428A1 |
A pixelation optical proximity correction method applied to super-resolution photolithography. The method comprises: S1, obtaining pixelated initial mask data according to a target pattern; S2, calculating an imaging error between a phot...
|
|
WO/2023/190360A1 |
A reflective mask blank has, in the following order, a substrate, a multilayer reflective film that reflects EUV light, a protective film that protects the multilayer reflective film, and an absorption shift film (13) that absorbs the EU...
|
|
WO/2023/188484A1 |
Provided is a light source device capable of improving the luminous efficiency of plasma generated by an energy beam. A light source device according to an embodiment of the present invention uses an energy beam to create plasma from a...
|
|
WO/2023/190696A1 |
The purpose of the present disclosure is to provide a reflective photomask blank and a reflective photomask that make maximal use of a phase shift effect and that possess high transferability. A reflective photomask blank (10) according ...
|
|
WO/2023/180020A1 |
Methods, systems, and computer software are disclosed for determining a mask pattern for use with a lithographic process. One method includes assigning locations of two-dimensional elements based on a target pattern, associating the two-...
|
|
WO/2023/181869A1 |
The purpose of the present invention is to provide: a pellicle frame in which warpage caused by tension in a pellicle film is suppressed, and which can suppress warpage of an original plate cause by deformation of the pellicle frame; a p...
|
|
WO/2023/183220A1 |
A method of manufacturing a photomask including the steps of providing a photomask blank, inspecting the photomask blank to determine presence of one or more defects in the photomask blank, wherein the one or more defects comprise one or...
|
|
WO/2023/182314A1 |
Provided are a pellicle package and a pellicle housing, configured so that the total amount of outgas from volatile organic components under conditions of heating for 30 minutes at 100°C is 90 ppm or less.
|
|
WO/2023/182186A1 |
Provided is a manufacturing method for a pellicle frame having a pressure-sensitive adhesive layer by which it is possible to suppress the number of instances of air entrapment when attaching a pellicle to a photomask. This manufacturi...
|
|
WO/2023/175990A1 |
Provided is a method for efficiently producing a high-quality EUV-transmissive film or pellicle in which a mask layer is prevented from remaining in an eave-like shape extending toward a cavity and particles are unlikely to occur. The me...
|
|
WO/2023/171582A1 |
The present invention pertains to a reflective mask blank (10) in which a multilayer reflective film (2) that reflects EUV light and an absorption layer (3) that absorbs EUV light are layered upon a substrate (1) in this order from the s...
|
|
WO/2023/171583A1 |
The present invention pertains to a binary reflective mask blank comprising a substrate, a multilayer reflective film that reflects EUV light, and a pattern film in the order stated, wherein the pattern film is a layered structure includ...
|
|
WO/2023/164793A1 |
The present invention relates to the technical field of display, and provides a display substrate and a manufacturing method therefor, and a display device. The manufacturing method for the display substrate comprises: forming a metal la...
|
|
WO/2023/165975A1 |
The present invention relates to methods, to an apparatus and to a computer program for processing of an object for lithography. A method of processing an object for lithography comprises: providing a first gas comprising first molecules...
|
|
WO/2023/166961A1 |
This ultrasonic cleaning head has a vibration surface that faces the upper surface of a substrate with a gap therebetween, and contacts a liquid film formed on the upper surface of the substrate. The vibration surface has a surface densi...
|
