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JP4445519B2 |
A heat processing furnace comprises: a processing vessel for receiving an object to be processed by a heat process; a cylindrical heat insulation member surrounding the processing vessel; a helical heating resistor arranged along an inne...
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JP2010070844A |
To provide a method for using a heat treatment furnace, which can keep a stable nitriding quality for a long period of time.The method for using the heat treatment furnace includes heating a steel material in predetermined atmospheres to...
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JP4438058B2 |
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JP4439513B2 |
A dropping model electrostatic levitation furnace which puts a charged sample in levitation state by an electric field generated between electrodes and subjects the sample to heat treatment, in which a drop tube evacuatable in vacuum is ...
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JP4438246B2 |
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JP4419159B2 |
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JP4422545B2 |
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JP4421238B2 |
After the maintenance of a heat treatment apparatus, a susceptor and a heating plate are moved upwardly and a nitrogen gas flow from an inlet toward an outlet passage is produced prior to heat treating a semiconductor wafer. In this stat...
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JP4415110B2 |
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JP4418556B2 |
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JP4417591B2 |
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JP4417590B2 |
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JP4413734B2 |
To provide a kiln which can reduce the fuel cost. A kiln 100 comprising a burning means 2 which burns fuel 11, a kiln main body 1 which bakes an object to be baked and discharges combustion gas, and a methane reformer 3 which heats a sta...
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JP4399222B2 |
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JP4397546B2 |
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JP4393009B2 |
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JP4379553B2 |
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JP4380236B2 |
A heating means is disclosed which comprises a reflector plate composed of an opaque quartz and a quartz tube welded to the surface of the reflector plate. A carbon wire which generates heat when a current is applied is inserted in the q...
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JP4365017B2 |
A vertical heat-processing apparatus includes a surrounding member, which surrounds a process chamber and a heater. The surrounding member forms a heating space around the process chamber. The heating space has zones juxtaposed in a vert...
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JP2009263175A |
To provide a firing furnace in which a silicon carbide powder having higher purity with a reduced content of impurities can be produced, and to provide a production method of a silicon carbide powder.The firing furnace 100 is equipped wi...
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JP4357715B2 |
A heat treatment apparatus has a controller ( 100 ) provided with a temperature estimator ( 110 ) for estimating a temperature of a wafer by detection signals of temperature sensors (Sin, Sout) and a temperature calibrator ( 120 ) for co...
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JP4358380B2 |
A magnetic-field thermal treatment apparatus is used to carry out a thermal treatment for plural substrates, which are placed in a vacuum chamber, as a magnetic field is applied to the substrates. Around the vacuum chamber, a heater and ...
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JP4354371B2 |
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JP2009243879A |
To provide a heat treatment device capable of suppressing accumulation of sublimate within a derivation duct.The heat processing device 1A heat-treats a processed object W by circulating and heating air in a heat treating part 21 in such...
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JP2009229006A |
To provide a reflector for a tubular furnace capable of improving heat insulating effect and easily carrying a workpiece into the furnace.The reflectors for the tubular furnace, mounted on both end sections of a core tube, are respective...
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JP2009216257A |
To provide a drying processing device or a firing processing device capable of minimizing an opening for taking in and out a workpiece to prevent or minimize leakage of an inert gas.An insert gas atmosphere furnace device for processing ...
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JP4328307B2 |
To provide a heat storage type alternating combustion furnace for completing treatment for exhausting high temperature furnace gas from a furnace body through heat storage chambers in a short time, and to provide a metal deposition preve...
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JP4326570B2 |
A life estimating method for a heater wire utilizes data obtained during a period (e.g., a temperature rising period), in which a sign of disconnection of the heater wire is likely to be seen. This method includes detecting a maximum mag...
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JP4327086B2 |
Carbon bodies are heated in an oven under low pressure and while being swept with an inert gas, gaseous effluent containing elemental or compound sodium in sublimed form being continuously extracted from the oven via an effluent exhaust ...
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JP4323064B2 |
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JP2009192124A |
To provide a heat treatment furnace, preventing the interior of a heat insulating material casing from being saturated or almost saturated with vapor in a process of heating in reduced pressure.This heat treatment furnace 1 includes a va...
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JP4320126B2 |
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JP2009528444A |
The invention and its group of variants consists of metal heat treating methods, a method for the combustion of liquid or gaseous fuel and hot air in a directly or indirectly fired furnace, and a heating device and regeneration nozzles f...
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JP4301403B2 |
A member provided around a susceptor for mounting a semiconductor in a chamber of a semiconductor production system. The member has a face opposing the susceptor and a center line average surface roughness of the face opposing the suscep...
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JP4295350B1 |
A furnace of heat treatment capable of keeping a stable nitriding quality for a long period of time is provided. The furnace of heat treatment performs a halogenation treatment and a nitriding treatment by heating a steel material under ...
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JP4286864B2 |
The inventive subject matter is directed toward a pyrolytic waste treatment system having multiple pyrolysis chambers. It is contemplated that the system is adapted to heat at least one pyrolysis chamber independently of at least one oth...
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JP4286981B2 |
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JP4274446B2 |
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JP4273145B2 |
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JP4264708B2 |
A method of manufacturing a ceramic film includes providing a treatment target in which a raw material body including a complex oxide is applied to a substrate, and crystallizing the raw material body by holding the treatment target in a...
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JP4262908B2 |
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JPWO2007026420A1 |
An object of the present invention is to suppress an increase in the cost of the heat treatment jig by expanding the selection range of the material of the heat treatment jig (particularly the material of the resistance heating element),...
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JP4232307B2 |
In a batch type vertical heat-treating method, first, product wafers and dummy wafers are set to be stacked on an upstream side of a flow of a process gas, in heat treatment, within main holding positions of a holder. The dummy substrate...
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JP4226510B2 |
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JPWO2007010607A1 |
The carburizing furnace is arranged so as to be able to open and close the upper end closed vertical tubular furnace main body 12, the graphite tubular heating element 13 coated on the inner surface of the furnace main body 12, and the l...
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JP4214040B2 |
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JP4215469B2 |
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JP4207354B2 |
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JP2009002581A |
To provide a rotary processor, efficiently moving a material to be treated between cylinders different in diameter from each other.This rotary processor includes: a rotatable first cylinder 31a, a second cylinder 31b having a diameter sm...
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JPWO2006135042A1 |
To provide a firing furnace in which the risk of contamination of the material to be fired is extremely low without putting the material to be fired in a firing container or the like. To provide a firing furnace that has a simple device ...
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