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JP4016765B2 |
To provide a pattern forming method capable of forming a dense pattern independently of standing waves and capable of further forming a resist pattern having a high aspect ratio by using an underlayer film excellent in dry etching resist...
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JP4007582B2 |
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JPWO2005080467A1 |
Provided is a norbornene-based polymer having excellent heat-resistant deformability and a high balance between low birefringence and mechanical strength. A cyclic hydrocarbon structure (I) derived from the norbornene ring, which constit...
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JPWO2005081019A1 |
An object of the present invention is to provide a method for producing an optical resin lens and an optical resin material, which exhibit high durability without deterioration of optical characteristics even under long-term laser irradi...
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JP3997387B2 |
Tetrahydrofuran compounds of formula (1) wherein the broken line represents a single bond, a divalent organic group, or a structure in which the alicyclic structure in the form of norbornene or tetracyclo[4.4.0.12,5.17,10]dodecene and th...
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JP3997382B2 |
Ester compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography.R1 is H or C1-6 alkyl, R2 is an acid labile group, k is 0 or 1, and m i...
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JP3997381B2 |
Ester compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. R<1> is H or C1-6 alkyl, R<2> is an unsubstituted or halo-substituted ...
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JP2007261980A |
To provide an exo-norbornene monomer from which a norbornene-based polymer usable as an excellent electronic material, optical material or the like can be produced in good yield. The production method involves reacting an endo-norbornene...
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JP2007249161A |
To provide a material for protective-film formation which eliminates the problem that when an alcohol solvent is used as the only solvent in forming a protective film over a photoresist layer, the photoresist layer cannot be a readily al...
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JP3982306B2 |
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JP3982340B2 |
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JP3980572B2 |
Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aroma...
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JP2007238677A |
To provide a method for safely producing a hydrogenated norbornene polymer realizing a process to operate at a high polymer solution temperature without causing the corrosion of the metallic parts of a production facility and achieving h...
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JP2007240570A |
To provide an optical film roll which hardly damages film surface thereof, hardly causes deposition of foreign matter and, moreover, can prevent foreign matter from additionally being stuck in a process of manufacturing a polarizing plat...
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JP3978862B2 |
Intended is to provide a sheet which exhibits excellent adhesion and also excellent long-term reliability, without detriment to good properties inherent to an alicyclic polymer such as good heat resistance, water resistance, low absoptiv...
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JP2007233206A |
To provide an inexpensive polarizing plate suitable for use in a large liquid crystal display device and having excellent heat resistance and small birefringence with good production efficiency. The polarizing plate is equipped with a tr...
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JP3975790B2 |
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JP3971610B2 |
Process for the preparation of a condensation compound by reaction of at least one functional group of a first low-molecular weight compound having at least two functional groups, with at least one functional group of at least one furthe...
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JP3969115B2 |
To provide a crosslinkable cyclic olefin (co)polymer giving an excellent chemical resistance and solvent resistance while keeping a high optical transparency, storage stability and heat resistance, and to provide its composition and a cr...
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JP3965547B2 |
To provide a resist material sensitive to high-energy rays, excellent in sensitivity, resolution and oxygen plasma etching resistance, especially capable of becoming an excellent material for a two-layer resist and capable of easily form...
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JP2007212990A |
To provide a positive resist composition for immersion exposure which suppresses material elution in immersion exposure, and a method for forming a resist pattern. The positive resist composition for immersion exposure contains a resin c...
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JP3962432B2 |
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radi...
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JP3960042B2 |
To provide a radiation-sensitive resin composition having an excellent relative dielectric constant, heat-resistant dimensional stability, solvent resistance, flatness, coating uniformity, transparency, heat-resistant color changing prop...
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JP2007197603A |
To provide a norbornene-based addition copolymer having excellent heat resistance, being excellent in transparency and toughness, melt-moldable and suitably used as an optical material; a process for producing the addition copolymer; and...
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JP3956089B2 |
To provide a resist material which is produced by using a high- molecular compound of the present invention as a base resin, which is sensitive to high energy rays, and excellent in sensitivity, resolution and etching resistance, and acc...
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JP2007521326A |
Palladium compound compositions are provided in accordance with Formulae [((R)3E)aPd(Q)(LB)b]p [WCA]r, where ((R)3E) is a Group 15 electron donor ligand, Q is an anionic ligand, LB is a Lewis base, WCA is a weakly coordinating anion, a i...
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JP2007520726A |
The present invention relates to mass spectrometers capable of performing electron (or positron) capture dissociation, methods of performing tandem mass spectrometry, methods of performing electron capture dissociation, and methods of pe...
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JP3945269B2 |
To provide a molded article that is formed from an addition polymer of a cycloolefin-based monomer having a polar group and has excellent optical characteristics, adhesion and heat resistance. The molded article is produced by subjecting...
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JP3946892B2 |
To provide a method for treating a molding of a specific cyclic olefin- based resin with a liquid hydrocarbon-based compound, to soften or fluidize the resin, reduce volume of the molding, and easily recover the resin from the molding. T...
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JP2007517967A |
The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymer...
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JP3941894B2 |
To obtain a new polyvalent (meth)acrylate useful as a monomer for UV light-curable resins, electron beam-curable resins, etc., and as a comonomer for copolymers with other ethylenically unsaturated compounds, etc., and giving, the resins...
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JP2007146033A |
To provide an optically transparent material having excellent optical transparency and heat resistance, also having excellent low water absorptivity and adhesion to a metal, and composed of an addition polymer of a norbornene compound; a...
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JP3928690B2 |
To provide a new lactone compound which polymerizes and gives a high energy beam sensitive resist material excellent in sensitivity, resolution, etching resistance, useful for microprocessing by an electron beam and far ultraviolet ray, ...
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JP3930058B2 |
The invention relates to penta- and hexacoordinated ruthenium and osmium carbene catalysts, in which a sulfur, oxygen or nitrogen atom is attached to the carbene group which is coordinated with the central ruthenium or osmium atom, to th...
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JP2007140184A |
To provide a liquid crystal display device that optically compensates a bend alignment mode liquid crystal cell, shows high contrast and preferable tone and is free from gradation inversion.The liquid crystal display device has an optica...
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JP2007131703A |
To provide a cyclic olefin-based polymer excellent in optical characteristics, heat resistance, adhesiveness, tightness and hygroscopic resistance.The cyclic olefin-based polymer contains a repeating unit expressed by general formula (1)...
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JP2007131702A |
To provide a cyclic olefin polymer excellent in all of optical properties, heat resistance, adhesive properties, and hygroscopicity resistance.The cyclic olefin polymer comprises a repeating unit represented by general formula (1). In th...
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JP2007131701A |
To provide a cyclic olefin polymer excellent in all of optical properties, heat resistance, adhesive properties, and hygroscopicity resistance.The cyclic olefin polymer comprises a repeating unit represented by general formula (1). In th...
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JP2007131704A |
To provide a cyclic olefin-based polymer excellent in optical characteristics, heat resistance, adhesiveness, cohesiveness and hygroscopic resistance.The cyclic olefin-based polymer contains a repeating unit expressed by general formula ...
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JP2007126673A |
To provide a polymerization catalyst of a norbornene type monomer.The polymerization catalyst of a norbornene type monomer is obtained by reacting a halide (A) of at least one type of transition metal selected from the group consisting o...
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JP2007119509A |
To provide a method for stably preparing cyclic olefin polymers showing same physical properties at a high polymerization rate, wherein properties such as molecular weight do not vary between different lots.Indenes with a purity of 90 wt...
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JP2007106907A |
To provide a new organic palladium complex-containing composition, to provide a highly active norbornene-based compound-polymerizing catalyst which uses the above-mentioned complex composition and can improve the yellow color and the lik...
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JP3907908B2 |
To provide a protective film equipped with excellent properties and a polarizing plate using the same. The protective film for the polarizing plate is composed of a practically nonaligned film formed of a specific cyclic olefin polymer w...
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JP3904064B2 |
To provide a resist material which is sensitive to high energy beams, particularly excellent in sensitivity at ≤170 nm wavelength and which has improved transparency of a resist and excellent plasma etching resistance. A high polymer c...
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JP3900320B2 |
To obtain the subject polymer composed of specific kind(s) of recurring unit (s), having specific number-average molecular weight, excellent in electrical properties, heat resistance, soldering resistance, and chemical resistance and mec...
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JP3897088B2 |
To obtain a new polymer compound useful as a base polymer for chemically amplified resist material with excellent transmittance to vacuum UV rays, to obtain a chemically amplified resist material comprising the polymer compound, and to p...
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JP3891251B2 |
To provide an ester compound giving a resist material via a polymer, in which the resist material is sensitive to a high energy ray, excellent in sensitivity, resolution and etching resistance, is useful for fine processing with an elect...
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JP3879815B2 |
To provide a new ester compund that can give a polymer compound used as a base resin for a resist material that has a high sensitivity to a high- energy radiation and excellent sensitivity, resolution, and etching resistance and is there...
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JP3880860B2 |
To provide a resist material containing a PED stabilizing agent and having high sensitivity, high resolution and satisfactory PED stability and to provide a pattern forming method using the resist material. The resist material contains a...
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JP3876977B2 |
To obtain a resist material which comprises as a base resin a polymer compound and is sensitive to high energy rays, excellent in sensitivity, resolution and etching resistance and therefore suitable for use in microfabrication by electr...
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