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JP2008222992A |
To provide a film-forming composition capable of giving a film which is low in relative dielectric constant, has high mechanical strength and is excellent in planarity, to provide an electrical insulation film produced by using the above...
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JP2008536956A |
A top-coat composition comprising a non-self imageable polymer consisting of norbornene-type repeating units, said polymer comprising a first norbornene-type repeating unit represented by Formula I: where X is -CH 2 -, -CH 2 CH 2 -, O or...
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JP2008202003A |
To provide a norbornene-based compound with good efficiency by using an organopalladium complex stable in air and preservable for a long period of time.The method of manufacturing a homo-or co-polymer of a norbornene-based compound which...
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JP2008202059A |
To provide a polymer which can be suitably used as a base polymer for a resist using ArF excimer laser as a light source, that is, a novel polymer capable of satisfying characteristics such as transparency at 193 nm, dry etching resistan...
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JP4139948B2 |
There is provided a chemically-amplified resist composition having high transparency to light having a wavelength of 220 nanometers or smaller, excellent resistance to etching, and excellent adhesion to a substrate. The chemically-amplif...
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JP4137406B2 |
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JP4127941B2 |
The present invention relates to a cross-linker for photoresist compositions which is suitable for a photolithography process using KrF (248 mn), ArF (193 mn), E-beam, ion beam or EUV light sources. Preferred cross-linkers, according to ...
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JP4123343B2 |
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JP4118508B2 |
Ruthenium complexes of the formula I or IVwhereX, Y are anionic ligands,R is hydrogen or a substituted or unsubstituted C1-C20-alkyl radical or C6-C20-aryl radical andL1 and L2 are, independently of one another, uncharged electron donor ...
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JP2008156569A |
To provide a method of removing impurities such as catalyst residue, particularly, impurities containing metals from a norbornene compound polymer hydrogenated substance solution in high removing efficiency without damaging the productiv...
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JP4116340B2 |
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JP4102889B2 |
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JP4096241B2 |
A rubber roller formed by molding an elastomer composition not less than 250 mus nor more than 400 mus in a T 2 relaxation time (spin-spin relaxation) of a bound rubber formed between a rubber and/or a thermoplastic elastomer and a reinf...
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JP4092756B2 |
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JPWO2006043617A1 |
The present invention has a resin layer of a resin composition containing a cyclic olefin resin (A) having an epoxy group and a photoacid generator (B) on a circuit element forming surface, and the residual stress of the resin layer afte...
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JP2008115379A |
To provide a process for producing a cycloolefin addition polymer that can achieve the production of a homogeneous cycloolefin addition polymer having a narrow molecular weight distribution, a controlled molecular weight and excellent ba...
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JP4088672B2 |
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JP2008101169A |
To provide a method for obtaining a polymer solution of a sufficiently lowered metallic component content by effectively removing a metallic component from a polymer solution by a simple additional step.The method for removing the metall...
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JP4085034B2 |
There is disclosed a polymer containing at least a repeating unit represented by the following general formula (1), and the resist composition containing the polymer as a base resin, especially a chemically amplified resist composition. ...
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JP4081640B2 |
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JPWO2006006399A1 |
[Summary] [Problem] To provide a thermoplastic resin capable of obtaining a highly heat-resistant molded product having little change in performance due to water absorption and excellent optical performance, and a molded product made of ...
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JP4079799B2 |
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JP4079893B2 |
The present invention relates to a fluorine-containing cyclic compound of formula (5): wherein R2-R4 and R9-R15 are independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group, and may contai...
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JP2008088247A |
To provide a method for producing a norbornene polymer having a fluorosulfonyl group, and an electrolyte membrane for a fuel cell by using the polymer.This method for obtaining a polymer containing a unit expressed by formula (a) is prov...
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JP4075789B2 |
[Means to solve problems] The process for preparing a cycloolefin addition polymer comprises addition-polymerizing monomers containing a specific cycloolefin compound in the presence of ethylene and a multicomponent catalyst containing, ...
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JP2008081655A |
To provide a norbornene polymer which can be used in producing a film having the property of developing a negative Rth, a film using the norbornene type polymer, a polarizing plate using the film, and a liquid crystal display device usin...
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JP4073255B2 |
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JP4072063B2 |
The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent; (b) providing the fol...
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JP4067251B2 |
The present invention relates to novel monomers which can be used to form photoresist polymers and photoresist compositions using the same which are suitable for photolithography processes employing a far ultraviolet light source, copoly...
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JP2008065061A |
To provide an optical film made of cyclic olefin based resin homogeneous in thickness direction and superior in transparency, in industrial manufacture of a long film, and a method of manufacturing the same.The optical film contains cycl...
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JP4064667B2 |
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JP2008050415A |
To provide a method for producing a terpene and/or allylphenol-based polymer, advantageous in industrial production.The method for producing the terpene and/or allylphenol-based polymer involves polymerizing the terpene-based compound ha...
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JP4056345B2 |
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JP4056318B2 |
To provide a positive resist composition which improves edge roughness of a pattern, remedies the problem of development defects and gives an excellent resist pattern profile. The positive resist composition comprises (A) a resin having ...
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JP4052943B2 |
A monomer containing an electron-withdrawing group of the present invention is represented by following Formula (a), (b) or (c): wherein A1, A2, and A3 are each a ring; Ra, Rb, Rc, and Ru are the same or different and are each a hydrogen...
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JP2008031292A |
To provide a film stretchable at an industrially appropriate temperature and manifesting wide-ranging retardation.The film is comprised of a norbornene polymer having a recurring unit represented by general formula (1). In formula (1), L...
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JP2008031319A |
To provide a norbornene polymer film whose retardation has reverse wavelength dispersion characteristics.The film is comprised of a norbornene polymer containing a recurring unit represented by general formula (I). In the formula, R1 and...
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JP4046314B2 |
Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aroma...
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JP4044947B2 |
Metallocenes of formula (XI) are new, wherein M<1> = Ti, Zr, Hf, V, Nb or Ta; R<14>, R<15> = H, halogen, 1-10 C alkyl, 1-10 C alkoxy, 6-10 C aryl, 6-10 C aryloxy, 2-10 C alkenyl, 7-40 C arylalkyl, 7-40 C alkylaryl or 8-40 C arylalkenyl; ...
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JP4041335B2 |
Photoresist polymers, and photoresist compositions using the polymer are disclosed. More specifically, photoresist polymers containing maleimide represented by Formula 1. Photoresist compositions including the photoresist polymers have e...
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JP4038675B2 |
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JP2008013770A |
To provide an aliphatic resin which is controlled with respect to the softening point and the molecular weight and which is useful for imparting tackiness; a manufacturing method thereof; and a pressure-sensitive adhesive composition con...
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JP4037099B2 |
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JP2008006807A |
To provide a high-quality cellulose acylate film and a saturated norbornene resin film, and the process for producing them since the cellulose acylate film and the saturated norbornene resin film which are produced by a melt film formati...
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JP2008007733A |
To provide an optical form excellent in low birefringence and low in water absorption.A spiro ring-containing norbornene derivative of the formula(1) ( wherein, R1 and R2 are each H, a 1-20C hydrocarbon group or a group containing haloge...
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JP4034538B2 |
Disclosed is a polymer compound for photoresist characterized in that the polymer compound is formed of a polymer compound having at least one skeleton represented by the following general formula (1), general formula (2A), general formu...
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JP4034896B2 |
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JP4025076B2 |
To provide a positive photosensitive composition which is improved inline edge roughness and excellent in profile. The positive photosensitive composition is characterized in containing (A1) at least one compound which generates an aroma...
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JPWO2005085303A1 |
Provided is a curable composition which is excellent in transparency, light resistance (particularly short wavelength light having a wavelength of 200 to 500 nm), and heat resistance, and gives a fluorine-containing cured product having ...
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JP4018101B2 |
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