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JP2023171386A |
To provide a salt, a resist composition, and the like which allow a resist pattern having good line edge roughness to be produced.The salt is represented by formula (I) [where Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl ...
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JP7375685B2 |
A chemically amplified resist composition comprising a quencher containing an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group exclusive of an iodized or brominated aromatic ring and an acid generator ...
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JP7373307B2 |
A salt capable of producing a resist pattern with excellent line edge roughness is represented by formula (I):wherein, R1 represents —(X1—O)o—R5, and o represents an integer of 0 to 6, R5 represents a hydrocarbon group having 1 to ...
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JP2023545066A |
The present invention relates to a compound having a cyclic sulfur oxide structure, a non-aqueous electrolyte additive containing the compound, a non-aqueous electrolyte, and a lithium secondary battery. Performance can be achieved, as w...
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JP7367185B2 |
Provided is an actinic ray-sensitive or radiation-sensitive resin composition, with which a pattern having excellent LWR performance can be obtained. In addition, also provided are a resist film, a pattern forming method, and a method fo...
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JP7365349B2 |
The present invention relates to a process for preparing the Hexanoic acid, 6-(nitrooxy)-, (1S,2E)-3-[(1R,2R,3S,5R)-2-[(2Z)-7-(ethylamino)-7-oxo-2-hept
en-1-yl]-3,5-dihydroxycyclopentyl]-1-(2-phenylethyl)-2-prope
n-1-yl ester of formula ...
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JP2023147520A |
To provide a method for producing a cyclic sulfite compound that has a high reaction yield and can suppress the formation of organic halide by-products, and, when the halogen is chlorine, can also suppress the by-products of a specific o...
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JP7358627B2 |
The present invention provides: an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin in which polarity is increased due to acid activity, and (B) a compound which is represented by a specific general f...
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JP7356568B2 |
The present invention provides: an actinic ray-sensitive or radiation-sensitive resin composition, represented by specific general formula (1), containing (A) a resin, and (B) a compound that produces an acid when irradiated with actinic...
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JP2023131576A |
To provide a resist composition achieving higher sensitivity and having good lithographic characteristics, a resist pattern forming method using the resist composition, a polymer compound usable for producing the resist composition, and ...
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JP7345503B2 |
The present invention concerns new fragrant and aromatic compounds presenting peach, fruity and/or exotic fruit notes, but with no lactonic and fat aspects. More specifically, new spirooxathiolanone-type compounds responding to the follo...
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JP2023539113A |
Hallucinogen and psychotropic compounds, serotonin 5-HT2Uses of such compounds in the treatment of diseases associated with receptors, pharmaceutical compositions and kits, such as tablet compositions, containing such compounds, methods ...
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JP2023126883A |
To provide novel thiol compounds and applications thereof, and specifically, novel thiol compounds, methods for synthesizing the thiol compounds, curing agents containing the thiol compounds, resin compositions containing the curing agen...
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JP7339677B2 |
Disclosed in the present invention were a fluorosulfonyl-containing compound, an intermediate thereof, a preparation method therefor and use thereof. The fluorosulfonyl-containing compound disclosed in the present invention comprises a c...
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JP7332372B2 |
To provide a salt capable of manufacturing a resist pattern having good CD uniformity (CDU) and a resist composition containing the salt.There are provided a salt represented by the formula (I), an acid generator, and a resist compositio...
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JP7330946B2 |
Process for the preparation of a compound with at least one monothiocarbonate group by reacting:—a compound with at least one mercaptoalcohol group and—a dialkylcarbonate, in the presence of a catalyst wherein the catalyst is a salt ...
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JP7324082B2 |
To provide a method for producing carboxylic acid anhydride or sulfonic acid anhydride in which carboxylic acid anhydride or sulfonic acid anhydride is produced in a simple or easy process using carboxylic acid or sulfonic acid as raw ma...
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JP2023108593A |
To provide a radiation-sensitive resin composition, a resist pattern forming method, and a compound which are capable of forming a resist pattern good in sensitivity to exposure light and excellent in CDU performance and resolution.The r...
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JP7318338B2 |
The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar1 represents a group obtained by removing (m+n+2)...
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JP7317602B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the salt.The salt represented by formula (I) and the resist composition are provided. [In the formula, Rrepresen...
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JP2023103409A |
To provide a method for production of monothiocarbonates which is useful for industrial scale production.A method for production of a compound with at least one monothiocarbonate group represented by a formula I comprises reacting a dial...
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JP7310724B2 |
An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of goo...
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JP7310007B2 |
The present invention provides a method for producing an active light sensitive or radiation sensitive resin composition that is improved in terms of agglomeration defects caused by a starting material, a pattern forming method which use...
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JP7296808B2 |
To provide a salt for an acid generator used for fine processing of a semiconductor, an acid generator containing the salt, a resist composition and a method for producing a resist pattern.The present invention provides a salt represente...
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JP2023070657A |
To provide a salt and the like and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided: a salt having a specific structure; and an acid generator, a resin, and a resist comp...
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JP2023062677A |
To provide a chemically amplified resist material which exhibits high sensitivity and improved LWR and CDU regardless of whether it is positive or negative, and a pattern forming method using the same.The chemically amplified resist mate...
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JP2023046675A |
To provide a chemically amplified resist composition which exhibits high sensitivity and improved LWR and CDU regardless of whether it is positive or negative, and a pattern forming method using the same.There are provided: an amine comp...
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JP7252245B2 |
B, X1 and X2 represent N, O or S(O)n, R, Ra, Rb, Rc, Rd and IV represent radicals such as hydrogen, halogen, (C1-C6)-alkyl, (C1-C6)-alkyloxy and cyano.
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JP7249093B2 |
To provide a salt capable of producing a resist pattern with a good mask error factor (MEF) and a resist composition containing the salt.The salt has an anion represented by formula (aa2) [where Xa and Xb each independently represent an ...
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JP7240068B2 |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness, and a resist composition containing the carboxylate.A carboxylate represented by a formula (I) and a resist composition containing the carbox...
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JP7240069B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).There are provided a sulfate ester salt having a group represented by formula (I) and a resist composition containing the sulf...
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JP7221308B2 |
Provided is an actinic ray-sensitive or radiation-sensitive resin composition that is capable of obtaining a pattern having excellent LWR performance even in a case of long-term storage. In addition, also provided are a resist film, a pa...
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JP2023016040A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I),...
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JP2023013753A |
To provide a lubricant having excellent wear resistance, corrosion resistance and heat resistance.An alkylated phenoxathiin according to an embodiment of the present invention is represented by the formula (1) where R independently repre...
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JP2023010674A |
To provide a salt that can produce a resist pattern having excellent pattern collapse resistance, and a resist composition comprising the same.The present invention provides a salt represented by the formula (I), an acid generator and a ...
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JP2023010681A |
To provide a carboxylate or the like that can produce a resist pattern having excellent mask error factors, and a resist composition comprising the same.The present invention provides a carboxylate or the like, comprising a sulfonium cat...
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JP2023010675A |
To provide a carboxylate and a carboxylic acid generator that can produce a resist pattern having excellent resolution, and a resist composition comprising the same.The present invention provides a carboxylate represented by the formula ...
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JP2023010680A |
To provide a salt and an acid generator that can produce a resist pattern having excellent focus margin (DOF), and a resist composition comprising the same.The present invention provides a salt having a specific structure, an acid genera...
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JP7200267B2 |
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent storage stability during long-term storage. In addition, also provided are a resist film, a pattern forming method, and a m...
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JP7199291B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).The salt is represented by formula (I), and the resist composition contains the salt. [In the formula, each of Rand Rrepresent...
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JP7187125B2 |
A nonaqueous electrolytic solution including a nonaqueous solvent and a compound represented by Formula (1) .(wherein, in Formula (1), R1 to R5 each independently represent a hydrogen atom or an alkyl group that has 1 to 3 carbon atoms a...
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JP7178169B2 |
To provide a resist composition capable of producing a resist pattern having a good pattern collapse margin (PCM).The resist composition contains a non-polymerizable compound having a 1,2-naphthoquinone diazide sulfonyl group in the mole...
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JP7169008B2 |
Disclosed are compounds for medical uses, for example, compounds of formula Ia,wherein A1, A2, A3, A4, A5, A6, A7, R6, R7 and E are as described herein, pharmaceutical compositions containing such compounds, and methods of treating or pr...
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JP2022544930A |
A method for purifying an organic sulfur compound, wherein the organic sulfur compound is in a liquid phase and is combined with oxides of metals from Groups VIIb or VIIIb and from Groups Ia to IIIa of the periodic system, or Alternative...
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JP2022161021A |
To provide a resist composition from which a resist pattern having a good focus margin (DOF) can be produced.The resist composition contains a compound represented by formula (I), a resin having an acid-labile group, and an acid generato...
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JP7155801B2 |
The present invention relates to a salt and an acid generator comprising the same, a photoresist composition, and a process for producing a photoresist pattern. The salt comprising a group represented by the formula (aa): wherein Xa and ...
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JP2022544274A |
A method for reducing the odor of compounds having at least one five-membered cyclic monothiocarbonate group, called monothiocarbonate compounds for short, wherein the monothiocarbonate compound is in a liquid phase and is oxidized. A me...
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JP2022149952A |
To provide a novel cyclic fluorine compound and a production method thereof.The cyclic fluorine compound is represented by general formula (1). The production method thereof comprises mixing and agitating a fluorine compound represented ...
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JP2022141492A |
To provide a method for producing a fluorine-containing sulfonamide compound used as raw material for a sulfonamide group-containing monomer, in short steps and at high yield, and a method for producing a sulfonamide group-containing mon...
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JP7109178B2 |
To provide a new compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition comprising the acid generator, and a method for forming a resist pattern using the resist composit...
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