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JP7155801B2 |
The present invention relates to a salt and an acid generator comprising the same, a photoresist composition, and a process for producing a photoresist pattern. The salt comprising a group represented by the formula (aa): wherein Xa and ...
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JP2022544274A |
A method for reducing the odor of compounds having at least one five-membered cyclic monothiocarbonate group, called monothiocarbonate compounds for short, wherein the monothiocarbonate compound is in a liquid phase and is oxidized. A me...
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JP2022149952A |
To provide a novel cyclic fluorine compound and a production method thereof.The cyclic fluorine compound is represented by general formula (1). The production method thereof comprises mixing and agitating a fluorine compound represented ...
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JP2022141492A |
To provide a method for producing a fluorine-containing sulfonamide compound used as raw material for a sulfonamide group-containing monomer, in short steps and at high yield, and a method for producing a sulfonamide group-containing mon...
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JP7109178B2 |
To provide a new compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition comprising the acid generator, and a method for forming a resist pattern using the resist composit...
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JP2022533595A |
A method for synthesizing a compound containing at least one acyclic carbonate group, wherein compound A) containing at least one 5-membered cyclic monothiocarbonate group is combined with at least one hydroxy group or compound of compou...
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JP7069798B2 |
To provide a salt that makes it possible to produce a resist pattern with excellent CD uniformity (CDU), and a resist composition containing the salt.The present invention provides a salt represented by formula (I) [Rand Rindependently r...
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JP7067081B2 |
A resist composition comprising a base polymer and a quencher in the form of an iodonium salt of fluorinated aminobenzoic acid, fluorinated nitrobenzoic acid or fluorinated hydroxybenzoic acid offers a high dissolution contrast and minim...
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JP7067271B2 |
An onium salt of arenesulfonic acid having a bridged ring-containing group generates a bulky acid having an appropriate strength and controlled diffusion. When a positive resist composition comprising the onium salt and a base polymer is...
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JP2022070151A |
To produce a fluorinated cyclic compound (3) in high yield while reducing the amount of waste to the yield of the fluorinated cyclic compound (3).The present invention pertains to a method for producing a fluorinated cyclic compound (3) ...
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JP2022068394A |
To provide a chemically amplified resist composition that has improved lithography performance factors such as CDU, LWR and DOF and reduced defects in photolithography using high-energy radiation as the energy source, an acid diffusion i...
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JP7058045B2 |
Provided are a 1,3-di-substituted ketene compound having a structure as represented by formula (I) and an application thereof. Such a type of compound primarily activates peroxisome proliferator-activated receptor (PPAR) α, and also act...
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JP7056421B2 |
To provide a salt capable of producing a resist pattern with a good focus margin (DOF), and a resist composition containing the salt.A carboxylate is represented by formula (I) [where Lrepresents a C1-6 fluorinated alkanediyl group; Lrep...
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JP7044494B2 |
To provide a salt and a resist composition, which can produce a resist pattern with a good mask error factor (MEF).The salt is represented by formula (I), and the resist composition contains the salt and a resin containing a structural u...
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JP7042878B2 |
To provide a resist composition capable of producing a resist pattern with good CD uniformity.The resist composition contains an acid generator containing a salt represented by formula (I0), and a resin having an acid-labile group. [In t...
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JP2022517403A |
A method for preparing a compound containing at least one cyclic monothiocarbonate group, wherein a salt of an acidic compound having at least one acidic hydrogen atom is used in the formula (I) [formula, group R.1~ R4One of them is the ...
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JP2022517402A |
A method for preparing a compound having at least one 5-membered cyclic monothiocarbonate group, a) using compound C1 having at least one halohydrin group as a starting material and b) compound C1 as a phosgen. Alternatively, the adduct ...
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JP7032549B2 |
The present invention provides: an active-light-sensitive or radiation-sensitive resin composition containing (A) a resin that decomposes due to the action of an acid, the degree of solubility increasing in an alkaline developing solutio...
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JP7027711B2 |
A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of specific structure has a high resolution. When the resist c...
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JP2022028612A |
To provide a salt that makes it possible to produce a resist pattern having excellent line edge roughness, an acid generator, a resin and a resist composition comprising the same.The present invention discloses a salt represented by, for...
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JP2022028615A |
To provide a salt that makes it possible to produce a resist pattern having excellent CD uniformity (CDU), an acid generator, a resin and a resist composition comprising the same.The present invention discloses a salt represented by, for...
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JP7019291B2 |
To provide a compound which makes it possible to produce a resist pattern with excellent CD uniformity, a resin and a resist composition comprising the resin.A resist composition comprises a resin (A) comprising a compound represented by...
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JP6998957B2 |
The present invention relates to a method for preparing 3-substituted 2-vinylphenyl sulfonates.
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JP2022022216A |
To identify additional compounds capable of modulating GPR119 activity, and compounds that are therapeutically useful for treatment of diseases and conditions associated with dysregulation of GPR119 such as T2DM, diabetes-mediated diseas...
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JP7009076B2 |
To provide a salt and a resist composition comprising the salt, from which a resist pattern can be produced with a good MEF (mask error factor).A resist composition comprises an acid generator represented by formula (I0), and a resin inc...
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JP2022014782A |
To provide a resist composition having good fine resolution, a resist pattern formation method, a compound, and an acid diffusion control agent.A resist composition contains a base material component whose dissolubility to a developer is...
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JP2022508261A |
A method of preparing a coating or sealed material, the first component containing compound A) having at least one 5-membered ring monothiocarbonate group, and a primary component, hereinafter referred to as an amino group. Alternatively...
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JP2022506713A |
The present invention relates to a 1,3-oxathiolan-2-thione derivative, a method for producing the same, and its use. The present invention also relates to silylated polymers obtained from the 1,3-oxathiolan-2-thione derivatives and formu...
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JP2022502374A |
Ben Ming, α2- Drena Drena Drena Receptor Sub-tapping C (α-2c) Ango GototoOcclusive and central sleep without breathing Good morning good nothing.
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JP2022001567A |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The salt represented by formula (I), the acid generator, and the resist composition are provided. [In th...
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JP2021191745A |
To provide a salt capable of producing a resist pattern having a good pattern collapse margin (PCM), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist ...
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JP2021191746A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good resolution.The carboxylate represented by formula (I), the carboxylic acid generator, and the resist compos...
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JP6974981B2 |
To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), a resist composition containing the same, and a method for producing a resist pattern.There are provided a salt represented by formula (I), an acid ge...
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JP2021178812A |
To provide a salt and an acid generator which make it possible to produce a resist pattern with excellent focus margin (DOF) and a resist composition comprising the same.The present invention discloses a salt represented by, for example,...
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JP2021178813A |
To provide a carboxylate and a carboxylic acid generator which make it possible to produce a resist pattern with excellent mask error factor (MEF) and a resist composition comprising the same.The present invention discloses a carboxylate...
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JP2021176851A |
To provide a salt capable of producing a resist pattern with excellent CD uniformity (CDU), and to provide a resist composition containing the salt.A salt has an anion expressed by a formula (aa1). [In the formula (aa1), X1 represents a ...
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JP2021169440A |
To provide: a method for producing an allylic position-substituted methacrylate having a hydroxy group and a sulfide group by using as a raw material a hydroxyl group-containing mercaptan having a hydroxyl group and a mercapto group in a...
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JPWO2020105505A1 |
An object of the present invention is a composition of an actinic light-sensitive or radiation-sensitive resin in which the cross-sectional shape of the pattern to be formed is excellent in rectangularity and the dimensional fluctuation ...
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JP6948880B2 |
To improve CD uniformity (CDU) of a resist pattern.There are provided: a salt represented by formula (I); an acid generator containing the salt; a resist composition containing the acid generator and a resin containing a structural unit ...
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JP6944246B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the acid generator.The salt is represented by formula (I) [where Qand Qeach represent a fluor...
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JP2021151989A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the same.A salt represented by formula (I), an acid generator, and a resist composition containing the same are ...
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JP2021151990A |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), and a resist composition containing the same.A salt represented by formula (I), an acid generator, and a resist composition containing the sam...
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JP6932943B2 |
To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), and a resist composition containing the salt.The salt is represented by formula (I) [Rand Rare each independently H, a hydroxy group, or a C1-12 hydro...
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JP6931310B2 |
To provide: a chemically amplified positive photosensitive resin composition capable of suppressing occurrence of "footing", in which a width of a bottom (a side proximal to the surface of a support) becomes narrower than a top (a side p...
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JP2021123579A |
To provide a salt capable of producing a resist pattern having good CD uniformity, and a resist composition containing the same.There are provided: a salt represented by formula (I); and an acid generator and a resist composition contain...
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JP6923805B2 |
The present invention provides an industrially applicable method for production of a fluorine-containing cyclopropane carboxylic acid compound useful as an intermediate for pharmaceutical and agrichemical products. A fluorine-containing ...
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JP6925982B2 |
The present application relates to spirobifluorene derivatives of a formula (I), to the use thereof in electronic devices, and to processes for preparing said derivatives.
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JP6913031B2 |
[Problem] The present invention addresses the problem of providing a radiation-sensitive composition having excellent LWR, CDU, and EL performance, and a compound and polymer used in the same. [Solution] A polymer having structural units...
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JP6910173B2 |
To provide a novel dithiocarbonate compound that provides epoxy resin composition having viscosity which hardly increases even when the dithiocarbonate compound is applied to epoxy resin and to provide a resin composition using the dithi...
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JP6910838B2 |
To provide a salt and a resist composition from which a resist pattern can be produced with a good MEF (mask error factor).A salt is represented by formula (I); and a resist composition comprises the salt, a resin including a structural ...
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