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JP2023016038A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023016040A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I),...
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JP2023010679A |
To provide a carboxylate that can produce a resist pattern having excellent line edge roughness, and a resist composition comprising the same.The present invention provides a carboxylate represented by the formula (I), a carboxylic acid ...
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JP2023010681A |
To provide a carboxylate or the like that can produce a resist pattern having excellent mask error factors, and a resist composition comprising the same.The present invention provides a carboxylate or the like, comprising a sulfonium cat...
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JP2023010675A |
To provide a carboxylate and a carboxylic acid generator that can produce a resist pattern having excellent resolution, and a resist composition comprising the same.The present invention provides a carboxylate represented by the formula ...
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JP2023008957A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, and a resist composition containing the same.There are provided a carboxylate represented by formula (I) and a resist composition. [In the f...
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JP2023008964A |
To provide a carboxylate and a resist composition which allow a resist pattern having good line edge roughness (LER) to be produced.Specifically, there are provided: a carboxylate represented by, e.g., formula (I-1) and the like; and a r...
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JP2023008905A |
To provide a carboxylate which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided a carboxylate represented by formula (I) and a resist composition. (R1...
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JP2023008954A |
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.Specifically, there are provided a carboxylate represented by, e.g., formula (I-1),...
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JP2023008903A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a resist composition containing the same, and the like.There are provided a carboxylate represented by formula (I), a resist compositi...
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JP2023001918A |
To provide a resist composition from which a resist pattern having a good mask error factor can be produced.There are provided: a carboxylic acid generator which contains a carboxylate of a specific triphenylsulfonium having a substituen...
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JP2023001920A |
To provide a carboxylate which allows a resist pattern having a good focus margin to be produced, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and ...
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JP2023001095A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a resin, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a carboxylic acid generat...
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JP2022191202A |
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.Specifically, there are provided a carboxylate represented by, e.g., formula (I-1),...
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JP2022191200A |
To provide a carboxylate which allows a resist pattern having a good mask error factor (MEF) to be produced, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a carboxylic acid gene...
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JP2022191198A |
To provide a carboxylate which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a carboxylic acid generator,...
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JP2022189774A |
To provide a carboxylate which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.A carboxylic acid generator contains a salt of a sulfonium having a specific substituent ...
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JP2022189798A |
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a carboxylic acid gene...
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JP2022189791A |
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a carboxylic acid gene...
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JP2022183075A |
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.There are provided a carboxylate represented by a formula (I), a carboxylic acid ge...
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JP2022183076A |
To provide a carboxylate which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided a carboxylate represented by a formula (I), a carboxylic acid generato...
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JP2022173111A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided a carboxylate represented by a formula (I), a carboxylic acid ...
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JP7172788B2 |
To provide a method for producing a triterpene acid, which enables simple purification of triterpene acid from a mixture of triterpene acid and impurities.Provided is a method for producing triterpene acid, comprising the steps of: (a) m...
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JP2022169763A |
To provide triterpene glycoside saponin-derived adjuvants, syntheses thereof, and intermediates thereto, and also provide pharmaceutical compositions comprising compounds of the present invention and methods of using the compounds or com...
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JP2022164584A |
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.There are provided a carboxylate represented by a specific formula, a carboxylic ac...
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JP2022164586A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having a good pattern collapse margin (PCM) to be produced.The carboxylate represented by formula (I), the carboxylic acid gener...
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JP2022542238A |
The present invention provides compounds of the formulas (IA), (IB), (IC), (ID), (IE), (IF), (IG), (IH), (IJ), (IK), (IL), ( Provided are compounds of II), (III), (IIIA), and (IIIB), their pharmaceutically acceptable salts and solvates, ...
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JP2022142768A |
To provide a method for producing trans-cyclohexanecarboxylic acid salt at high yield.A method for producing trans-cyclohexanecarboxylic acid salt includes the step of heating cis-trans-cyclohexanecarboxylic acid salt and metalhydroxide ...
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JP2022141394A |
To provide a method for producing a benzotropolone skeleton-bearing compound that can simply and easily synthesize a benzotropolone skeleton-bearing compound, and a method for purifying a benzotropolone skeleton-bearing compound.A method...
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JP2022537543A |
The invention disclosed herein relates to compounds, combinations, kits and methods of their use for use in bioorthogonal release reactions. In particular, compounds, combinations and kits of the invention can be used to achieve rapid an...
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JP2022123840A |
To provide a carboxylate which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by a specific formula; a carboxylic acid ge...
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JP2022532619A |
Synthesis of novel Kaulan analogs, their preparation, and their use in cardioprotection and cerebral ischemia against ischemia, hypertrophy and chemotherapy-induced cardiomyopathy. In the formula, R1: Formylation, carboxylic acid (carbox...
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JP2022529615A |
In general, methods for regulating MRGPR X4, or more specifically, effective amounts of compounds having the structure of formula (I): (I) or its pharmaceutically acceptable isomers, racemates, respectively. Treat MRGPR X4 dependence by ...
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JP7058891B2 |
Provided is a method for producing shikimic acid, by which shikimic acid is able to be obtained with high yield. A method for producing shikimic acid, which comprises a step for collecting shikimic acid from a solution that contains shik...
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JP7044563B2 |
To provide a salt and a resist composition capable of producing a resist pattern having a good mask error factor.A carboxylate represented by formula (I), an acid generator containing the carboxylate, and a resist composition containing ...
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JP2022029431A |
To provide a carboxylate that makes it possible to produce a resist pattern having excellent line edge roughness.The present invention discloses a carboxylate represented by formula (I) [where R4, R5, R7 and R8 each represent a halogen a...
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JP2022028614A |
To provide a carboxylate that makes it possible to produce a resist pattern having excellent CD uniformity, a carboxylic acid generator, a resin and a resist composition.The present invention discloses a carboxylate represented by, for e...
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JP2022020563A |
To provide a carboxylate that makes it possible to produce a resist pattern having excellent line edge roughness, a carboxylic acid generator and a resist composition comprising the same.The present invention discloses, for example, a ca...
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JP2022019581A |
To provide a carboxylate that can produce a resist pattern having excellent line edge roughness (LER), a carboxylic acid generator and a resist composition comprising the same.The present invention discloses a carboxylate represented by ...
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JP2022019586A |
To provide a carboxylate that can produce a resist pattern having excellent mask error factors, a carboxylic acid generator and a resist composition comprising the same.The present invention discloses a carboxylate illustrated by formula...
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JP2022019582A |
To provide a carboxylate that can produce a resist pattern having excellent CD uniformity (CDU), a carboxylic acid generator and a resist composition comprising the same.The present invention discloses a carboxylate represented by the fo...
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JP2022019579A |
To provide a carboxylate that can produce a resist pattern having excellent CD uniformity (CDU), a carboxylic acid generator and a resist composition comprising the same.The present invention discloses, for example, a carboxylate represe...
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JP2022013737A |
To provide a carboxylate, a carboxylic acid generator and a resist composition including the same that enable production of a resist pattern with excellent line edge roughness (LER).Provided are a carboxylate having a specific structure ...
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JP2022008153A |
To provide a salt, an acid generator and a resist composition including the same that enable production of a resist pattern with excellent line edge roughness (LER).For instance, a carboxylate of a structural formula below is presented.S...
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JP2022502463A |
The present disclosure relates to a process for preparing functionalized cyclooctene, and synthetic intermediates prepared thereby.
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JP2021183596A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).A carboxylate represented by formula (I), a carboxylic acid generator, and a resist com...
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JP2021183598A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having a good mask error factor.A carboxylate represented by formula (I), a carboxylic acid generator, and a resist com...
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JP2021183600A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good line edge roughness (LER).A carboxylate represented by formula (I), a carboxylic acid generator, and a resi...
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JP2021183602A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity.A carboxylate represented by formula (I), a carboxylic acid generator, and a resist compositi...
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JP2021183594A |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), a carboxylic acid generator, and a resist composition containing the same.A carboxylate represented by formula (I), a carboxylic acid g...
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