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JP2023540661A |
The present invention provides compounds of formula (I) as CCR8 inhibitors, which can be used to treat or prevent cancer using CCR8 inhibitors that target tumor-specific regulatory T cells. can be done. Formula (I): [Selection diagram] None
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JP7349981B2 |
In one aspect, compounds of Formula AA, or a pharmaceutically acceptable salt thereof, are featured. The variables shown in Formula AA are as defined in the claims. The compounds of formula AA are NLRP3 activity modulators and, as such, ...
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JP2023132684A |
To provide a resist material which exhibits high sensitivity and improved LWR and CDU regardless of whether it is positive or negative, and a pattern forming method using the same.The resist material contains a quencher containing a sulf...
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JP2023131576A |
To provide a resist composition achieving higher sensitivity and having good lithographic characteristics, a resist pattern forming method using the resist composition, a polymer compound usable for producing the resist composition, and ...
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JP2023131148A |
To provide a material that has excellent anion conductivity and shows excellent durability even at high temperatures and under alkaline conditions.A sulfonium-containing polymer includes a cation structure represented by the general form...
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JP7345544B2 |
The present invention discloses a triphenylsulfonium salt compound as shown in the general formula (I), wherein R1 represents an electron-withdrawing group and R2 represents an amplification group. Said compound shows significantly enhan...
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JP2023126636A |
To provide methods for treating diseases.The present disclosure provides methods for preparing MCL1 inhibitors or a salt thereof and related key intermediates. The present disclosure relates to methods and intermediates for the synthesis...
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JP2023123183A |
To provide a resist composition capable of forming a resist pattern which achieves higher sensitivity and exhibits good roughness reduction.The resist composition contains a base component (A) and a compound (B0) represented by general f...
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JP7338877B2 |
A compound represented by formula (1), a salt thereof or a solvate of the same [in formula (1), R1 represents a linear or branched alkyl group having 2 to 10 carbon atoms, a linear or branched alkyl group having 1 to 10 carbon atoms in w...
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JP7337790B2 |
Provided herein are compounds, compositions, and methods useful for modulating the integrated stress response (ISR) and for treating related diseases; disorders and conditions.
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JP2023121152A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided: a salt represented by formula (I); and an acid generator and a resist composit...
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JP2023121151A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided: a salt represented by formula (I); and an acid generator and a resist composit...
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JP2023117394A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided: a salt represented by formula (I); an acid generator comprising the salt; and ...
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JP7332347B2 |
To provide a salt, an acid generator and a resist composition that make it possible to produce a resist pattern having excellent mask error factor (MEF).The present invention provides a salt represented by formula (I), an acid generator ...
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JP2023117397A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided: a salt represented by formula (I); an acid generator containing the salt; and ...
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JP2023117395A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided: a salt represented by formula (I); an acid generator containing the salt; and ...
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JP2023117396A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having a good pattern collapse margin to be produced.There are provided: a salt represented by formula (I); an acid generator containing the salt...
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JP7331333B2 |
To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), and a resist composition containing the salt.The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or the l...
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JP2023110696A |
To provide an aromatic sulfonium salt compound that has high solubility in resin and can be used as an acid generator.The invention provides a compound represented by the general formula (I) in the figure, where X1- represents a monovale...
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JP2023109729A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023109728A |
To provide a salt which allows a resist pattern having a good mask error factor to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP7317524B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good line edge roughness.The salt is represented by formula (I), and the resist composition contains the salt. [In the formula, Q, Q, Qand Qeach repres...
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JP2023103182A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by a formula (I...
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JP7310724B2 |
An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of goo...
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JP2023100659A |
To provide a salt which allows a resist pattern to be produced with good line edge roughness (LER).Specifically, there is provided a salt represented by, e.g., formula (I-1).SELECTED DRAWING: None
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JP2023100758A |
To provide a carbamoyl phenylalaninol analog, and a method using the same material for treating the fault.A compound of formula I or a pharmaceutically acceptable salt thereof is provided. (Wherein, X is CH2, O, NH, S; Y is C=O, C=S, SO2...
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JP2023100005A |
To provide a resin and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided: a resin containing a structural unit represented by formula (I1) and a structural unit represente...
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JP2023100006A |
To provide a resist composition from which a resist pattern having good CD uniformity can be produced.The resist composition contains a resin (A1) containing a structural unit represented by formula (I1) and a resin (A2) containing a str...
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JP2023100003A |
To provide a resin and a resist composition which allow a resist pattern having good resolution to be produced.There are provided: a resin containing structural units of formula (I1) and formula (I2); and a resist composition.SELECTED DR...
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JP2023100004A |
To provide a resist composition from which a resist pattern having good pattern collapse resistance can be produced.The resist composition contains a resin (A1) containing a structural unit represented by formula (I1) and a resin (A2) co...
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JP7306434B2 |
To provide a salt capable of producing a resist pattern with a good mask error factor (MEF) and a resist composition containing the salt.The salt has an anion represented by formula (aa2) [where Xa and Xb each independently represent an ...
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JP2023096529A |
To provide a resist composition that exhibits excellent lithography properties such as CDU and LWR without impairing its sensitivity in photo-lithography using high-energy rays, an acid diffusion inhibitor for use therein, and a patterni...
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JP2023088870A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I); and a carboxylic acid generator a...
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JP2023088869A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, and a resist composition containing the same.There are provided: a salt represented by formula (I); and an acid generator and a resist compos...
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JP2023086690A |
To provide a salt allowing a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.A salt is represented by a formula (I), and an acid generator and a resist composition ...
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JP7295691B2 |
To provide a resist composition with which a resist pattern having good line edge roughness (LER) can be produced.The resist composition comprises: an acid generator; a resin containing at least one structural unit selected from the grou...
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JP2023081849A |
To provide salt, an acid generator, and a resist composition including the same, with which it is possible to manufacture a resist pattern having good CD uniformity (CDU).Salt has a specific structure that triphenylsulfonium cation has, ...
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JP7289669B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).A carboxylate is represented by formula (I), and the resist composition contains the carboxylate. [In the formula, Xrepresents...
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JP2023081337A |
To provide a salt that enables production of a resist pattern having good resistance to pattern collapse, an acid generator, and a resist composition including the same.Salt represented by formula (I), an acid generator including the sal...
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JP7288814B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity.The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or the like; Rand Reach independently represent a hydrogen...
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JP7285695B2 |
To provide a novel compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition containing the acid generator, and a resist pattern forming method using the resist composition....
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JP2023076402A |
To provide a salt, a resin, and a resist composition which allow a resist pattern having a good focus margin (DOF) to be produced.There are provided: a salt having an ethylenically polymerizable group represented by a specific formula, a...
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JP2023076400A |
To provide a carboxylate and the like which allow a resist pattern having a good mask error factor to be produced, and a resist composition.There are provided: a substituted triphenylsulfonium carboxylate having a polymerizable group rep...
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JP7285126B2 |
To provide a salt, an acid generator and a resist composition that make it possible to produce a resist pattern having excellent CD uniformity (CDU).The present invention provides a salt, an acid generator and a resist composition, repre...
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JP2023076401A |
To provide a carboxylate and the like which allow a resist pattern having a good pattern collapse margin to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I) and the li...
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JP7285141B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity.The salt is represented by the following formula. [Qand Qeach independently represent a fluorine atom or the like; Rand Reach independently represent a hyd...
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JP7284622B2 |
To provide a salt capable of manufacturing a resist pattern having good CD uniformity (CDU), an acid generator containing the salt, and a resist composition.There are provided a salt represented by the formula (I), an acid generator cont...
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JP7283883B2 |
wherein R1 and R2 each represent a chain hydrocarbon group which may have a substituent, an alicyclic hydrocarbon group which may have a substituent or an aromatic hydrocarbon group which may have a substituent, or R1 and R2 are bonded e...
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JP2023070656A |
To provide a carboxylic acid generator, a resin, and a resist composition which contain a carboxylate or the like allowing a resist pattern having good line edge roughness to be produced.There are provided: a carboxylic acid generator be...
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JP2023070655A |
To provide a salt and the like and a resist composition which allow a resist pattern having good CD uniformity to be produced.An acid generator contains: (I) a specific sulfonate having an unsaturated group of a specific triphenylsulfoni...
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