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JP5959284B2 |
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JP5947221B2 |
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JP2016119368A |
To provide a compact conditioning device capable of performing the conditioning of more than one type.A conditioning device for conditioning a buff pad for use in buff processing includes a base plate configured rotatably, a first condit...
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JP2016117144A |
To provide a polishing device that is suitable for polishing an end surface of a rod-shaped abrasive sample made of fiber-reinforced polymer composite materials, without using adhesives and an embedding process.A polishing jig 40 include...
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JP3205051U |
[Subject] A polish unit which can be adjusted and a polish device of polish power are provided. [Means for Solution] A principal axis with which it is polish unit 10 attached to a deburring machine or a polish device and which rotational...
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JP5928373B2 |
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JP5926078B2 |
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JP5918799B2 |
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JP2016078232A |
To provide a polishing device which can freely set a width and position of polishing on the inner peripheral surface of a tire.A polishing device comprises a polishing mechanism 401 that polishes the inner peripheral surface of a tire, a...
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JP5911750B2 |
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JP5911674B2 |
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JP5913559B2 |
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JP2016055364A |
To provide a polishing pad capable of obtaining sufficient polishing accuracy, when being used for mirror finish polishing.A polishing pad 1 is pasted with a polishing film 9 on an outer peripheral surface of a circular center base mater...
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JP5906335B1 |
[Subject] It is high precision, and it is efficient and performs polish processing to various-shaped parts to be polish. [Means for Solution] A polish device of the present invention is provided with the following. A base metal member wh...
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JP5902000B2 |
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JP2016043471A |
To provide a substrate processing apparatus which enables improvement of a washing degree of a table to which a substrate is attached during polishing and a backing material.A buff processing module 300A is an apparatus for performing bu...
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JP2016043472A |
To provide a substrate processing apparatus and a substrate processing method which enable improvement of a washing degree of a table to which a substrate is attached during polishing and a backing material.A buff processing module 300A ...
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JP5896131B2 |
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JP5889471B1 |
To provide a surface treatment apparatus capable of linearly moving a machining tool for deburring, edge finishing of a cut end, or polishing the surface of a product. A machining tool 35 is attached to an attachment 41a of an endless ro...
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JP5882947B2 |
The invention is directed to a chemical-mechanical polishing pad substrate comprising a porous material having an average pore size of about 0.01 microns to about 1 micron. The polishing pad substrate has a light transmittance of about 1...
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JP5873785B2 |
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JP3202507U |
To provide an apparatus for processing a flat glass surface to a different degree of opacity or correcting a sandblasted glass surface. A device for modifying a flat glass surface 5, a means for supplying water for cooling and washing th...
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JP5843155B2 |
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JP5842920B2 |
Provided is a system for grinding/polishing hard and brittle materials, said system being provided with a grinding function for making cross-sectional dimensions of a subject to be processed composed of hard and brittle materials within ...
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JP5840210B2 |
A method for adjusting a predetermined contour of a turbine blade root including a main salient edge defined by a determined interior angle. The method includes: chamfering the main edge of the contour to obtain two auxiliary salient edg...
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JP2015221408A |
To provide a method for coating an automotive body, capable of reducing dust and particle failure by removing foreign objects adhering to the automotive body before an intermediate/finish coating step.A method for coating an automotive b...
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JP5813532B2 |
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JP2015196202A |
To reduce contact resistance between a cathode beam and a bus-bar provided above a tank wall of an electrolysis tank.In the polishing device, a polishing part 40 polishes only a part of the cathode beam 136 coming into contact with the b...
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JP3200289U |
To provide a highly efficient steel pipe polishing sander machine. The upper rack 1, the lower rack 10, and the support 9 installed between the upper rack and the lower rack are included. There is a first screw 4 in the upper rack, and a...
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JP5771551B2 |
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JP5758005B2 |
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JP2015131362A |
To provide a processing method and a processing tool of a work piece reducing a period of time of a production cycle and improving productivity.A processing tool 1 comprises: a plurality of brushes 3 and 3 rotationally driven so as to de...
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JP5749420B2 |
A method of manufacturing a chemical-mechanical polishing (CMP) pad comprises the steps of (a) forming a layer of a polymer resin liquid solution (i.e., a polymer resin dissolved in a solvent); (b) inducing a phase separation in the laye...
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JP5741227B2 |
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JP5738232B2 |
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JP2015091610A |
To provide a glass plate end surface treatment method capable of polishing an end surface of a glass plate efficiently, and improving intensity of the end surface of the glass plate.Plural glass substrates 10 are laminated for forming a ...
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JP5708899B2 |
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JP5704242B2 |
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JP2015071213A |
To provide a buff polishing device which can achieve stabilization of polishing quality and improvement in productivity by preventing the uneven wear of a buff roll in advance.A buff control device 1 comprises: a holding base 10 for hold...
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JP2015066643A |
To provide a mirror polishing method and a mirror polishing device in which generation of buff burning can be avoided and in which time needed for mirror polishing becomes too long can be avoided.At a polishing stand table 6, provided ar...
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JP5697912B2 |
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JP5678898B2 |
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JP5675136B2 |
The invention is directed to a chemical-mechanical polishing pad substrate comprising a porous material having an average pore size of about 0.01 microns to about 1 micron. The polishing pad substrate has a light transmittance of about 1...
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JP2015024481A |
To provide a rust removing unit capable of greatly reducing labor and time, compared to a conventional technique of manually removing rust on the outer peripheral surface of a bolt and the vicinity of the bottom with a wire brush.A rust ...
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JP2015016532A |
To provide a stranded wire polishing machine capable of sufficiently removing an oxide film of a metal stranded wire in a short time.A stranded wire polishing machine 1 has a brush 2, a drive part 3, a body 4, and a support part 5. The d...
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JP2015011743A |
To provide a method of manufacturing a glass substrate for an information recording medium capable of obtaining a glass substrate for an information recording medium whose inner peripheral end surface and outer peripheral end surface are...
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JP5649499B2 |
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JP2014231025A |
To provide a cleaning brush for a print circuit board which can clean a print circuit board without abrasion by rotation, needs no meander of the print circuit board on a transportation passage, and further can be replaced in low cost.Br...
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JP5630219B2 |
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JP5628563B2 |
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