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JP6544694B2 |
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JP6538168B2 |
A flexible polishing apparatus for granulated grains is provided. The flexible polishing apparatus includes a housing, a feeding device, at least one flexible polishing unit, a bran discharging device, and a rice outlet. The flexible pol...
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JP2019090689A |
To provide an end detecting device for a strip that can precisely detect an end of the strip and also save the labor for maintenance, and a brushing device for strip comprising the same.An end detecting device moves reciprocally along a ...
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JP6529210B2 |
A pad for supporting an abrasive disc by being fixed with the abrasive disc to a shaft of a grinder, the pad including a supporting surface opposing the abrasive disc. In a radial direction, an outer edge of the supporting surface is loc...
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JP6529611B2 |
An object is to provide a working method capable of efficiently deburring and polishing a workpiece and making the life of a brush in use long in a machine tool not having power to directly rotate a tool and capable of working the workpi...
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JP6528286B2 |
Embodiments described relate to a method and apparatus for reducing lithographic distortion. A backside of a semiconductor substrate may be texturized. Then a lithographic process may be performed on the semiconductor substrate having th...
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JP6504262B2 |
An edge processing device includes: conveying means (2) that convey a molded powder compact (1), a first rotating tool (31) disposed on one side and a second rotating tool (32) disposed on the other side and rotating in a direction ident...
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JP6502526B2 |
By, according to the invention, designing a surface treatment tool with a grinding head (16, 17) with cylindrical rollers (18), so that the tool (16, 17, 18) is balanced by weight because the tool's centre of gravity is close to the tool...
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JP6496872B1 |
To provide a polishing machine capable of performing polishing with good contact even in the case of a continuous irregular non-horizontal surface to be polished. In a non-horizontal polishing machine for a surface to be polished, a defo...
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JP6493253B2 |
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JP6488446B1 |
To disclose a new type of automatic buffing equipment. The base includes a base and a pedestal fixedly installed on the bottom of the base, a placement groove is installed in the base, and a first cavity is installed in the inner top wal...
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JP2019042923A |
To perform finish processing of a processing object after main polishing while suppressing lowering of throughput of a polishing device.A polishing device includes: a polishing unit 3 for polishing a processing object by relatively movin...
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JP6481928B2 |
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JP6468147B2 |
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JP6465404B2 |
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JP6464290B1 |
To clean a cleaning tool and an inner surface of a pipe which can easily perform a work of uniformly brushing the inside of a pipe, have high work efficiency, are suitable for precision processing, and can improve economy. Provide a meth...
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JP6448977B2 |
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JP6444646B2 |
A method and apparatus for sanding a number of surface features on a surface of an object. A first type of operation may be performed on the number of surface features on the surface of the object using a first end effector. Feedback las...
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JP6443793B2 |
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JP6438024B2 |
The application relates to a manufacture method (200) of a surface-passivated high-resistivity silicon wafer (100) for a radio frequency integrated passive device. The method comprises a step of slicing (210) the high-resistivity silicon...
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JP6432105B1 |
To disclose an automatic buffing facility. The base includes a base and a pedestal fixedly installed at the bottom of the base, a placement groove is installed in the base, a first cavity is installed in the inner top wall of the placeme...
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JP6430177B2 |
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JP6426123B2 |
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JP6426403B2 |
A polishing method capable of removing waviness on a resin-coated surface having a curved surface is provided. The resin-coated surface having the curved surface is polished by using a polishing pad (10) having a polishing surface (30) f...
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JP6423935B2 |
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JP6421291B2 |
A polishing brush (1) includes a plurality of linear abrasive members (32) each formed by hardening an aggregated yarn of inorganic filaments by a resin binder, and a holder (2) that holds the linear abrasive members (32). The linear abr...
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JP6421267B1 |
To propose a polishing method of a polishing brush capable of obtaining a desired grinding force when the surface to be polished of a work is a curved surface. A polishing brush 1 has a plurality of abrasive material bundles 7 arranged i...
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JP3218604U |
To provide a polishing apparatus capable of polishing a work having a groove portion extending in the longitudinal direction. A work W that has reached a polishing area WG is supported by a first support roller 11 and a second support ro...
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JP2018165062A |
To provide a method of manufacturing an automotive skin plate capable of removing surface defects while reducing the generation of surface distortion by a simple method.The method of manufacturing an automotive skin plate includes: a pol...
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JP6399147B2 |
The present invention provides a system for inspecting equipment to enable an operator to carry out an inspection of parts of equipment at locations where the parts of the equipment are located. Equipment 12, which is the object to be in...
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JP2018149612A |
To easily remove slugs or the like in the vicinity of the base of a weld bead part.A removing device comprises a wire brush having a cylindrical rotor and a plurality of wires radially arranged on the rotor, rotation driving means for ro...
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JP6388251B2 |
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JP6386878B2 |
To surely suppress stress corrosion cracking within a range including a welded part.The welding method includes the welding step of executing welding, a buff processing range determination step of determining a range in which the surroun...
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JP6378418B2 |
A device including a turning unit for turning a workpiece, the turning unit including a drivably movable turning body with a contact member that is movable along a curved movement path with the movement of the turning body, as well as a ...
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JP2018122371A |
To provide a coating film polishing device which can polish a coating film, such as a shop primer, of a welding portion of a die steel material when a long die steel material such as an L shaped die steel material is moved and inhibit oc...
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JP6357719B2 |
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JP2018099749A |
In order to electrically connect a second conductive part in a tip part of a branch electric wire to a first conductive part of an overhead electric wire in which a coating member of an insulator is stripped off, an electric wire polishi...
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JP2018099739A |
To provide a polishing device which can quickly polish many work-pieces.A polishing device comprises: an index table 9 which is stopped at an indexing position of each prescribed pitch angle θ around a vertical axis L9; a pedestal membe...
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JP6346510B2 |
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JP2018085820A |
To efficiently polish a wire surface in indirect hot-line work.A tip tool 10 includes: a wire gripping portion 11 having a gripping structure for gripping an electric wire 5 to be polished and having polishing member layers 114a, 114b fo...
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JP6329655B2 |
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JP2018060859A |
To provide a method for manufacturing an electrostatic chuck that is excellent in adsorption characteristics in the atmosphere.A method for processing an adsorption surface of an electrostatic chuck according to the present invention inc...
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JP6301122B2 |
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JP6300055B1 |
A method for cleaning a transparent resin material that does not require a polishing process and can easily and speedily improve transparency and aesthetics. At least an aliphatic amine, a glycol ether, a nonionic surfactant, After perfo...
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JP6299369B2 |
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JP2018030218A |
To provide a tool holding device which can hold a tool so as to be capable of further removing a burr in deburring work.A tool holding device 1 comprises: a first rotary member 10 which is rotatably fitted to a processor X; a second rota...
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JP6276184B2 |
A method for producing a wear-resistant and corrosion-resistant stainless steel part for a nuclear reactor is provided. This method comprises steps of providing a blank in stainless steel; shaping the blank; finishing the blank to form t...
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JP6273818B2 |
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JP2018001289A |
To provide the polishing method of a composite substrate suppressing the polishing unevenness, the manufacturing method of a MEMS device, and the manufacturing method of a liquid jet head.In polishing methods of a composite substrate (40...
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JP6259415B2 |
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