VALVE DEVICE, AND FLOW CONTROL METHOD AND SEMICONDUCTOR MANUFACTURING METHOD USING SAID VALVE DEVICE

WIPO Patent Application WO/2018/100968

A1

[Problem] To provide a valve device having a widened range of flow rate control and improved versatility. [Solution] This valve device has: a valve body 10 for defining flow passages 12, 13; a diaphragm 20 provided to the valve body 10 so as to be capable of opening and closing the flow passages 12, 13; an operating member 40 for operating the diaphragm 20 so that the diaphragm 20 can move in opening and closing directions A1, A2 in which the diaphragm 20 opens and closes the flow passages 12, 13; a main actuator 60 for applying a drive force to the operating member 40, the drive force corresponding to operating pressure applied in the opening direction A1 or the closing direction of the opening and closing directions; and a switching mechanism capable of selectively switching, according to the magnitude of operating pressure, the position of the operating member 40 which defines the degree of opening of the flow passages, to a first open position P1 or a second open position P2, the first and second open positions P1, P2 being different from each other; and adjustment mechanisms 70, 80 capable of independently adjusting the first open position P1 and the second open position P2.

YOSHIDA TOSHIHIDE (JP)
NAKATA TOMOHIRO (JP)
SHINOHARA TSUTOMU (JP)
INADA TOSHIYUKI (JP)
FUNAKOSHI TAKASHI (JP)
SATO HIDENOBU (JP)
YUHARA TOMOKO (JP)

PCT/JP2017/039732

June 07, 2018

November 02, 2017

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FUJIKIN KK (JP)

F16K1/00; F16K7/14; F16K31/122; H01L21/205; F16K31/02

JPH07217767A	1995-08-15
JP2007078144A	2007-03-29

FUJIMOTO Kenji (JP)

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