Title:
VACUUM PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/175743
Kind Code:
A1
Abstract:
This vacuum processing device comprises: a vacuum processing unit having a vacuum vessel in which a wafer to be processed conveyed to the depressurized inside of the vacuum vessel is processed; a lock chamber inside which a wafer before or after processing is conveyed; an atmospheric conveyance unit including a housing having an atmospheric conveyance chamber which is connected to the lock chamber and inside which the wafer is conveyed and a flow of gas is formed from top to bottom, the inside of the atmospheric conveyance chamber being set to atmospheric pressure; and a wafer storage vessel which has a processed wafer storage space therein, a part of which is connected to a wall surface of the housing, and the inside of which communicates with the atmospheric conveyance chamber through an opening disposed in the side wall, wherein the inside of the wafer storage vessel is provided with an exhaust port that is rear of the opening and forward of the storage space, disposed between an upper end and a lower end of the storage space, and discharges gas in the storage space to the outside, and a manifold that is disposed rear of the storage space and has a gas outlet which is disposed between the upper end and the lower end toward the opening and supplies a prescribed gas into the storage space.
Inventors:
HSU CHEN PIN (JP)
FUJITA MASATSUGU (JP)
YAMAMOTO SATOSHI (JP)
ISOZAKI MASAKAZU (JP)
FUJITA MASATSUGU (JP)
YAMAMOTO SATOSHI (JP)
ISOZAKI MASAKAZU (JP)
Application Number:
PCT/JP2022/011723
Publication Date:
September 21, 2023
Filing Date:
March 15, 2022
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01L21/677; H01L21/673
Foreign References:
| JP2008258188A | 2008-10-23 | |||
| JP2016086161A | 2016-05-19 | |||
| JP2018198332A | 2018-12-13 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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