Title:
TITANIUM TARGET FOR SPUTTERING
Document Type and Number:
WIPO Patent Application WO/2013/105283
Kind Code:
A1
Abstract:
A titanium target for sputtering, which is a high-purity titanium target characterized by containing 0.5 to 5 ppm by mass of S as an additive component, wherein the purity of the target excluding the additive component and a gaseous component is 99.995 mass% or more. The purpose is to provide a high-quality titanium target for sputtering, which does not undergo cracking or breaking during high-power sputtering (high-speed sputtering) and can have stabilized sputtering properties.
Inventors:
TSUKAMOTO SHIRO (JP)
MAKINO NOBUHITO (JP)
FUKUSHIMA ATSUSHI (JP)
YAGI KAZUTO (JP)
HINO EIJI (JP)
MAKINO NOBUHITO (JP)
FUKUSHIMA ATSUSHI (JP)
YAGI KAZUTO (JP)
HINO EIJI (JP)
Application Number:
PCT/JP2012/061412
Publication Date:
July 18, 2013
Filing Date:
April 27, 2012
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
TSUKAMOTO SHIRO (JP)
MAKINO NOBUHITO (JP)
FUKUSHIMA ATSUSHI (JP)
YAGI KAZUTO (JP)
HINO EIJI (JP)
TSUKAMOTO SHIRO (JP)
MAKINO NOBUHITO (JP)
FUKUSHIMA ATSUSHI (JP)
YAGI KAZUTO (JP)
HINO EIJI (JP)
International Classes:
C23C14/34; C22B34/12; C22C14/00
Domestic Patent References:
| WO2012057057A1 | 2012-05-03 | |||
| WO2001038598A1 | 2001-05-31 |
Foreign References:
| JP2010235998A | 2010-10-21 | |||
| JP2001509548A | 2001-07-24 | |||
| JP2012067386A | 2012-04-05 | |||
| JP2001509548A | 2001-07-24 | |||
| JP2010235998A | 2010-10-21 |
Other References:
See also references of EP 2738285A4
Attorney, Agent or Firm:
OGOSHI Isamu et al. (JP)
Isamu Ogoshi (JP)
Isamu Ogoshi (JP)
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Claims:
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