STATEMENT OF GOVERNMENT RIGHTS

[0001] The United States Government has rights in this invention pursuant to

Contract No. DE-AC52-07NA27344 between the U.S. Department of Energy and Lawrence Livermore National Security, LLC, for the operation of Lawrence Livermore National Laboratory.

FIELD

[0002] The present disclosure relates generally to additive manufacturing systems and methods, often referred to as 3D printing, and more particularly to a method and apparatus and additive manufacturing of structures with submicron features using a multiphoton, non-linear photo-absorption process, wherein the system and method enables fabrication of features that are smaller than the diffraction-limited focused illumination spots.

BACKGROUND

[0003] The statements in this section merely provide background information related to the present disclosure and may not constitute prior art.

[0004] Two-photon polymerization, also sometimes referred to as two-photon lithography, is a popular present day technique to additively manufacture complex 3D structures with submicron building blocks. This technique uses a nonlinear photo- absorption process to polymerize submicron features within the interior of the photopolymer resist material. After illumination of the desired structures inside the photoresist volume and subsequent development (washing out the non-illuminated regions), the polymerized material remains in the prescribed three-dimensional form. One example of a system for two-photon polymerization is described in U.S. Patent Publication No. 2016/0199935 A1 , published July 14, 2016, the entire contents of which are hereby incorporated by reference into the present disclosure.

[0005] Two-photon polymerization is therefore a direct write technique that enables fabrication of macroscale complex 3D structures with submicron features. More specifically, the writing of complex structures is achieved through a serial writing technique wherein a high light intensity spot is sequentially scanned in 3D space to generate the entire structure. Due to the serial writing scheme, the rate of writing is fundamentally limited to such an extent that two-photon lithography of large volumes of functional parts is not feasible. Although attempts to increase the rate via parallelization have been made in the past, such attempts have failed to achieve the same degree of pattern complexity as that which can be accomplished with the point- scanning serial technique. Specifically, past parallelization efforts have either generated arrays of identical features or have been used to print 2D parts with no depth resolvability.

[0006] Although two-photon lithography enables fabricating features on a length scale that is not possible by other additive manufacturing techniques, the serial writing scheme that it uses limits this method to a low processing rate of ~ 0.1 mm ³ /hour. This prevents taking full advantage of its submicron geometric control to fabricate functional parts. Technical and scientific challenges in solving this low processing rate limitation arise because of the slow point-by-point serial illumination technique of the existing systems.

[0007] The problem of performing parallel two-photon lithography ("TPL") without adversely affecting the ability to fabricate arbitrarily complex 3 D parts has not been solved in the past. The following two general approaches exist in the prior-art that partly solve the problem of parallelization of TPL: (i) "splitting" a beam and simultaneously focusing at multiple spots to fabricate identical features at multiple spots, (ii) projecting an arbitrarily complex 2D image into the resist to generate 2D structures [4].

[0008] The first approach is unsuitable for TPL scale up because, in this approach, scale-up is achieved by simultaneously printing a structure over multiple spots in the form of a periodic array. As the same beam is split into multiple identical beams, identical features are generated by each beam. Thus, no scale-up is achieved during printing of arbitrarily complex non-periodic structures using this technique.

[0009] The second approach is unsuitable for printing of complex 3D structures because depth resolvability is lost in these projection techniques. In this scheme, when a 2D image is projected through the resist material, a single focal plane perpendicular to the 2D projected image cannot be uniquely registered. Instead, the same 2D image is "focused" at multiple planes so that a thick 3D cured volume is generated in the form of an extrusion of the 2D image. Thus, this scheme cannot be used to print 3D structures with depth resolved features such as those present in truss structures.

[0010] Temporal focusing of wideband femtosecond laser sources has been previously applied for fluorescence imaging of biomaterials. This technique has also been used to demonstrate material removal based fabrication processes. It has been suggested that such temporal focusing systems can also be used for multiphoton lithography. However, these teachings fail to enable high-quality 3D printing of structures without undue experimentation. Underlying this failure is the key difference between the physical mechanism of multiphoton lithography ("MPL") and that of imaging or material removal. Specifically, the dosage threshold behavior of resists used during MPL is distinct from that of material removal or imaging processes. In imaging and material removal, exposure dosage refers to the integrated photon energy; this is because the underlying physical processes are driven by the total amount of energy (dosage ~ intensity χ time). In contrast, the exposure dosage during MPL nonlinearly combines the light intensity and the exposure time (dosage ~ intensity(a) χ time(b)) due to the chain growth type polymerization process. As a result of this, prior art techniques that achieve dosage control by time averaging the light intensity are inappropriate for dosage control in MPL. If such techniques are used in MPL, either blobs of overexposed structures are generated or structures with underexposed regions are obtained. Herein, the tools and techniques for appropriate dosage control in parallelized MPL are presented.

[0011] Accordingly, the need still exists for a system and method which is able to dramatically increase the rate of two-photon lithography without adversely affecting the ability to fabricate arbitrarily complex 3D structures.

SUMMARY

[0012] This section provides a general summary of the disclosure, and is not a comprehensive disclosure of its full scope or all of its features.

[0013] In one aspect the present disclosure relates to a method for performing an additive manufacturing operation to form a part, wherein the part is comprised of a photopolymer resist material. The method may comprise generating a laser beam, directing the laser beam at a digital mask, and controlling the digital mask to selectively create a beam having a subplurality of beam lets from the laser beam which form an image, and which have sufficient intensity to cause polymerization of portions of the photopolymer resist material which are illuminated by the subplurality of beamlets. The method may further involve collimating the beam and directing the collimated beam with the subplurality of beamlets at the photopolymer resist material to cause simultaneous polymerization of the select portions of the photopolymer resist material.

[0014] In another aspect the present disclosure relates to a method for performing an additive manufacturing operation to form a part, wherein the part is comprised of a photopolymer resist material. The method may comprise generating a pulsed laser beam, directing the pulsed laser beam at a digital mask, the digital mask including a plurality of independently controllable pixels that may be turned on or off. The method may further comprise controlling the digital mask to split the pulsed laser beam into a plurality of beamlets each corresponding to an associated single pixel of the digital mask, a first subplurality of the beamlets created from pixels of the digital mask that are turned off and which have insufficient optical energy to induce polymerization of the photopolymer resist material, and a second subplurality of the beamlets being created from pixels that are turned on and which have sufficient optical energy to induce polymerization. The method may further involve collimating the beam to produce a collimated beam having the first and second subpluralities of beamlets, and using only the second subquantity of beamlets to induce, in parallel fashion, polymerization of select areas of the photopolymer resist material in a given X-Y plane within the photopolymer resist material. The method may further comprise using the digital mask to control the subsequent application of additional second subpluralities of beamlets to additional layers of the part to form each said layer of the part in a layer-by- layer fashion.

[0015] In still another aspect the present disclosure relates to an apparatus for performing an additive manufacturing operation to form a part, wherein the part is comprised of a photopolymer resist material. The apparatus may comprise a laser for generating a laser beam, and a digital mask for receiving the laser beam. The digital mask may be configured to split the laser beam into a plurality of beamlets, a first subplurality of the beamlets having insufficient optical energy to induce polymerization of the photopolymer resist material, and a second subplurality of the beamlets having sufficient optical energy to induce polymerization, and the first subplurality of beamlets forming an image. The system may further include a collimator for collimating the first subplurality of beamlets, and wherein the first subplurality of beamlets simultaneously write out a layer of the photopolymer resist material.

[0016] Further areas of applicability will become apparent from the description provided herein. The description and specific examples in this summary are intended for purposes of illustration only and are not intended to limit the scope of the present disclosure.

BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The drawings described herein are for illustration purposes only and are not intended to limit the scope of the present disclosure in any way.

[0018] Figure 1 is a high level block diagram of an apparatus in accordance with one embodiment of the present disclosure for performing an additive manufacturing operation to produce a sample part having submicron features;

[0019] Figure 2 is a high level block diagram of another embodiment of the present disclosure, somewhat similar to the apparatus of Figure 1 , but which also makes use of a power meter and a beam power control unit for controlling a power of a machining beam in real time;

[0020] Figure 3 is a graph illustrating the beam average power versus threshold exposure time, to thus control the dosage applied by the beam, for machining features having differing spacings;

[0021] Figure 4 is a high level flowchart illustrating basic operations that may be performed using the methodology of the present disclosure; and

[0022] Figures 5a and 5b illustrate exemplary DMD patterns for grayscale control, with Figure 5a illustrate a pattern with both vertical bars and horizontal bars, Figure 5b illustrating a pattern with only horizontal bars.

DETAILED DESCRIPTION

[0023] The following description is merely exemplary in nature and is not intended to limit the present disclosure, application, or uses. It should be understood that throughout the drawings, corresponding reference numerals indicate like or corresponding parts and features. [0024] The present disclosure overcomes the above-described manufacturing rate limitations with two-photon lithography with a system and method which implements a parallel illumination technique. The parallel illumination technique simultaneously projects an entire plane of ~ 1 million points, rather than the single-point illumination technique of existing commercial systems to increase the rate by at least 50 times.

[0025] The present disclosure is also distinguished from other popular 3D printing techniques through its use of high peak-power pulsed laser sources, and its ability to generate features in the interior of materials being processed ("resist material"). High peak-power pulsed sources are used in this technique to ensure that nonlinear photo-absorption is observed in exclusion to single-photon linear photo- absorption. Resist materials may be selected such that they exhibit a "thresholding" behavior, i.e., they undergo a phase transition (commonly from liquid to solid) only when the exposure dosage exceeds a minimum threshold value. As the dosage in nonlinear photo-absorption scales nonlinearly with the light intensity in the exposed material, steeper dosage gradients can be generated in the material during nonlinear absorption than in linear absorption. This steeper dosage gradient leads to a processed feature that is smaller than the illumination spot; the steeper gradient also enables generation of individual, spot-like voxel features (or volumetric pixels) within the interior of the resist material by focusing a laser spot at an interior spot. Thus, the present apparatus and method differs from conventional micro-stereolithography in both form and function. The form differs in the use of pulsed laser sources (with the present apparatus and method, during multiphoton lithography) versus non-collimated sources (in conventional micro-stereolithography); whereas, the function differs in the ability to fabricate submicron features in the interior of the resist (i.e., the present apparatus and method) vs diffraction-limited features on the surface of the resist (as with conventional micro-stereolithography).

[0026] Within the area of multiphoton lithography (MPL), the apparatus and method of the present disclosure is distinguished from existing implementations in its ability to simultaneously focus a collection of points (i.e., focus a "projected image") in the interior of the resist material. Thus, this technique significantly increases the processing rate by parallelizing the generation of submicron features. It is important to note that with the apparatus and method described herein, the dosage at each individual focused spot can be independently tuned to generate arbitrarily complex patterns. Thus, the apparatus and method of the present disclosure differs from, and significantly improves upon, previously existing MPL implementations that split the same beam into multiple focal spots with identical intensity distribution. In addition, by incorporating features for nonlinear dosage gradients, the apparatus and method of the present disclosure differs from, and significantly improves upon, those previously existing multi-point MPL implementations that fail to preserve the steep dosage gradients experienced during single-point focusing. With the present apparatus and method, steep spatial gradients in the dosage are achieved by taking advantage of the time-dependence of intensity in beams that are generated by pulsed laser sources. Specifically, steep dosage gradients are achieved through temporal focusing of wideband femtosecond pulsed lasers.

[0027] The apparatus and method of the present disclosure takes advantage of a technique known as "temporal focusing." Temporal focusing refers to the phenomenon wherein the duration of a femtosecond pulse (nominally 100 fs or less) is spatially varied in conjunction with spatial focusing of the beam. As the peak-intensity during a pulse depends on both the size of the beam and the duration of the pulse, the intensity can be independently tuned by changing either of these two. The apparatus and method of the present disclosure implements an optical projection scheme wherein the pulse duration is progressively reduced in proportion to the size of the beam such that the location of spatial and temporal focused spots overlaps. This ensures that steep dosage gradients are achieved at the projected image plane even when the projected image is large (due to multiple focused spots). It is important to note that this projection scheme differs in form and function from that of conventional projection micro-stereolithography implementations due to the reliance on temporal properties of the wideband femtosecond pulsed laser source to achieve the focusing described herein.

[0028] Temporal focusing of wideband femtosecond laser sources has been previously applied for fluorescence imaging of biomaterials. This technique has also been used to demonstrate material removal based fabrication processes. It has been suggested that such temporal focusing systems can also be used for multiphoton lithography. However, these teachings fail to enable high-quality 3D printing of structures without undue experimentation. Underlying this failure is the key difference between the physical mechanism of multiphoton lithography (MPL) and that of imaging or material removal. Specifically, the dosage threshold behavior of resists used during MPL is distinct from that of material removal or imaging processes. In imaging and material removal, exposure dosage refers to the integrated photon energy; this is because the underlying physical processes are driven by the total amount of energy (dosage ~ intensity χ time). In contrast, the exposure dosage during MPL nonlinearly combines the light intensity and the exposure time (dosage ~ intensity(a) χ time(b)) due to the chain growth type polymerization process. As a result of this, prior art techniques that achieve dosage control by time averaging the light intensity are inappropriate for dosage control in MPL. If such techniques are used in MPL, either blobs of overexposed structures are generated or structures with underexposed regions are obtained. Herein, the tools and techniques for appropriate dosage control in parallelized MPL are presented.

[0029] Figure 1 shows an apparatus 10 in accordance with one embodiment of the present disclosure. The apparatus 10 may include a pulsed laser source in the form of a laser amplifier 12, an optical parametric amplifier ("OPA") 14, a beam expander 16, a first high reflective ("HR") mirror 18, a beam homogenizer 20, a second HR mirror 22, a second beam expander 24, a digital mask 26, an electronic digital mask control system 27 (which includes processor, memory and I/O), a concave mirror 30, a neutral density ("ND") filter 32, a dichroic mirror 36, a charge coupled display ("CCD") 4, an electrically tunable lens ("ETL") 42, an objective lens 44 a sample (also referred to as a "photopolymer resist material") 48, a movable stage 50 and a lamp 50 projecting a beam 52 toward the sample 48.

[0030] In operation the laser source 12 may be a pulsed laser source that provides the laser light that drives the writing process. A key feature of this laser source 12 is that it generates pulses with a broad wavelength spectrum instead of a single wavelength. One example of a suitable laser source is a femtosecond Ti- sapphire regenerative laser amplifier with a center wavelength of 800 nm and a bandwidth of 40 nm. As shown in Fig. 1 , light from the laser source 12 has its wavelength modified by the OPA 14, in one example from 800nm to either 200nm or 400nm, before being further modified by the first beam expander 14, the beam homogenizer 20 and the second beam expander 22. Beam expanders 16 and 24 essentially control the diameter of a beam 25 that illuminates the digital mask 26.

[0031] The digital mask 26, in one example, may be a digital micro-mirror device ("DMD"). This component is commercially available from various manufacturers, for example Texas Instruments Inc. of Dallas, TX. Alternatively, the digital mask 26 may be formed by a spatial light modulator. For the following discussion, it will be assumed that the digital mask 26 is formed by a DMD.

[0032] With a DMD used as the digital mask 26, a key feature is that each micro mirror of the DMD may be viewed as forming a pixel point, and each pixel point can be individually switched on or off. This is accomplished by rotating the mirror by a small angular amount between two predetermined positions. In one predetermined position the pixel (i.e., micro mirror) forms an "on" state where the intensity of light reflected (and diffracted) from the micro mirror emerging from the point is sufficient high to effect polymerization, and forms a diverging beam let. In the other predetermined position the pixel forms "off" state, and the intensity of the beamlet being reflected (and diffracted) from the micro mirror is too low to effect polymerization. The thresholds for low and high are determined by the parameters of the writing process. The beam lets created from each of the micro mirrors in the digital mask 26 form a diverging beam which is denoted by reference number 28 and collectively form an image created using the digital mask 26. However, only the beamlets created from an "on" pixel within the digital mask 26 are used to effect polymerization of material within the sample 48. The rest of the beamlets from the beam 28 (i.e., all low illumination intensity beams which have insufficient power to cause polymerization) may be used either for diagnostics or may be re-directed into one or more light sinks. The collimating optics (i.e., concave mirror 30) converts the diverging beam 28 into a collimated beam 34. While the collimating optics in this example is shown as the concave mirror 30, a suitable lens could also be used to provide the needed collimation of the diverging beam 28.

[0033] The collimated beam 34 then passes through the ND filter 32, the objective lens 44, through the dichroic mirror 36, through the ETL 40, and is focused onto an X-Y plane inside the sample 48, as indicated by focused beam 46. The sample 48, as noted above, may comprise a photopolymer resist material. This focused plane is the conjugate plane of the digital mask 26. An example of an objective lens suitable for use as the object lens 42 is a high numerical aperture but low-moderate magnification oil immersion infinity objective lens (such as a 40X 1 .4 NA lens).

[0034] At the focused image plane on or within the sample 48, the intensity of each beamlet at each point that corresponds to the "on" pixel in the digital mask 26 is higher than the threshold writing intensity of the material comprising the sample 48; whereas, the intensity of each beamlet of the beam 34 emanating from an "off" pixel is below the threshold writing intensity. Thus, a pixelated image of the digital mask 26 is formed in an X-Y plane within the sample 46. This enables an entire layer within the sample 48 to be written out in one operation, as the beamlets of the beam 34 from "on" pixels are able to simultaneously write, in parallel, to a large plurality of points (i.e., on the order of 1x10 ⁶ or more) in one operation. Thus, the ability to form each layer of the sample 48 with a plurality of beamlets that write in parallel enables a dramatic reduction in the time needed to create a finished part from the photopolymer resist material of the sample 48.

[0035] Three dimensional structures may be fabricated by moving the focused image plane relative to the sample 48 using the movable stage 50. In actual practice, the motion of the movable stage 50 in the X-Y plane may be controlled by an electronic control system 54. Alternatively, the movable stage 50 could be a fixedly supported stage (i.e., not movable) while the objective lens 44 is moved within an X-Y plane as needed. Still further, possibly both the movable stage 50 and the objective lens 44 could be moved. However, it is anticipated that for the majority of applications, it will be preferred to move only one or the other of the movable stage 50 or the objective lens 44.

[0036] With the apparatus 10 described above, important features are thus the conditioning of the laser light from the laser source 12, the digital mask 26, the axis of the concave mirror 30 (i.e., the collimating optics), and the relative size of the collimating optics. The three elements (laser light, mask, collimating optics) are arranged such that a blazed grating condition is obtained for the digital mask 26. A blazed grating condition requires that the light is incident on the digital mask 26 at a specific angle that is determined by the pixel spacing on the digital mask, the center wavelength of the laser light beam and the blaze angle of the grating. In addition, the concave mirror 30 (i.e., collimating optics) is arranged such that only the diffracted order that corresponds to the blaze condition is collected. Typically, this requires one to place the concave mirror 30 (i.e., collimating optics) at a predetermined angle to the face of the digital mask 26 and to block the other orders by introducing apertures. This sets a condition on the maximum angular aperture. Additionally, one must ensure that all of the wavelengths (within the bandwidth of the laser source 12) are collected by the concave mirror 30 (i.e., the collimating lens). As the different wavelengths emerge at (slightly) different angles, this condition sets a minimum angular aperture. Thus, the angular aperture over which the beamlets of the beam 28 must be collected onto the concave mirror 30 (i.e., collimating optics) must lie within a small band. Outside this band, the performance of the apparatus 10 may drop significantly to such an extent that depth resolvability for 3D printing is lost.

[0037] The apparatus 10 also facilitates the implementation of a grayscale printing method that ensures that high-quality parts can be fabricated. The grayscale printing method was developed by the assignee of the present application and comprises the sequence of operations and the selection of writing conditions in these operations that leads to a non-uniform "dosage" during printing. The term "dosage" refers to the combined effect of light intensity and duration of light exposure (in the form dosage ~ [intensity]m χ duration of exposure). Writing occurs when the dosage is above a threshold value for a given photopolymer resist material. The maximum amount any pixel is switched "on" is determined by the maximum duration of exposure required for fabrication. The shortest duration that a pixel can be switched "on" is determined by the pulse repetition rate of the laser source 12. Grayscale control enables tuning the total exposure time of each pixel between zero and the maximum duration in steps of the reciprocal of pulse repetition rate. For example, if a projection field requires 20 pulses at a pulse repetition rate of 1 kHz, the exposure time can be discretely tuned between 0 and 20 ms in steps of 1 ms. This is achieved by loading a new single-bit image onto the DMD 26 every 1 ms. It is important to note that this scheme for exposure control is distinct from the intensity control of commercial DMD masks (i.e., projectors). In commercial DMD projectors, time-averaged intensity of a pixel can be controlled over several levels by changing the ratio of rate at which the mirrors are switched between on and off states while the mirrors are continuously cycled between on and off states.

[0038] It has also been experimentally observed that the threshold dosage depends on the proximity of features within the sample 48. In a sample part that contains closely spaced and sparsely spaced features, providing a uniform dosage leads to over or under exposure based defects. The grayscale dosage control of the grayscale printing method mentioned above allows for non-uniform control of dosage in the same focused plane. This is implemented by taking advantage of the pulsed nature of the laser light from the laser source 12 and the multi-pulse exposure threshold behavior of the material that makes up the sample 48. Traditionally, one would keep projecting one image per focused plane within the sample 48 until the desired uniform dosage is obtained at the particular plane within the sample. But with the present method, an important distinction is that instead of projecting the same image, multiple images may be sequentially projected at the same image plane. The digital image being created is altered so that the pixels of the digital mask 26 at which the local dosage exceeds the non-uniform dosage threshold are switched off in the subsequent images. This tuning of the sequential images at the same image plane in the sample 48 may either be performed by prior experimental calibration of dosage laws or in realtime by optically sensing the curing process.

[0039] Thus, the grayscale dosage control technique described herein, as implemented by producing a plurality of sequential images at the same image plane, but with different dosages for each pixel of the image, enables printing of non-uniform parts without generating defects due to over or under-exposure. In particular, the printing of non-uniform parts having closely but differing features, is now possible. Representative grayscale digital masks are shown in Figures 5a and 5b.

[0040] It should also be noted that time-averaged intensity is generally not a reliable measure of the exposure dosage during multiphoton lithography. As a consequence, commercial intensity control techniques that rely on time-averaging the intensity cannot be used for reliable dosage control. In addition, the grayscale technique presented, while being used to tune the total exposure time, is not capable of tuning the instantaneous or peak intensity. Although the intensity can be tuned by controlling the net power of the incident beam, feedback for such tuning is often not available in real time. As the diffraction efficiency of the DMD 26 is prone to change with the spatial frequency of the image, a one-time calibration of the transmitted power is not accurate for all images. This issue has been solved with another embodiment of the present disclosure which is shown in Figure 2 as apparatus 100. The apparatus 100 is somewhat similar to the apparatus 10 in that it includes a pulsed laser source 102, a half wave plate 104, a polarizing beam splitter 106, a mirror 108, a digital mask 1 10, an electronic control system 1 12 for controlling the digital mask 1 10, a pair of collimating lenses 1 14 and 1 15 each used to collimate the beam it receives, a beam monitoring power meter 1 16, a beam power control unit 1 17, a camera 1 18 (the electronic control system 1 12 also controlling the camera 1 18 in this example), a lens 120, a beam splitter 122, a lamp 124, a dichroic mirror 126, an objective lens 128, a movable stage 130 positioned elevationally adjacent the objective lens (e.g., below the objective lens 128) for supporting a sample 132 (i.e., photopolymer resist) thereon, and an electronic control system 134 for controlling at least one of (or possibly both of) the motion of the movable stage 130 or the objective lens 128. Optionally a single electronic subsystem (e.g., system 1 12 or system 134) may be used to perform all the control operations for the apparatus 100.

[0041] The apparatus 100 differs from the apparatus 10 principally in its ability to continuously monitoring one of the non-machining diffracted beamlets (i.e., the "m ^Th order" beamlet 1 1 1 ' in Fig. A2) from the digital mask 1 10, and using the beam monitoring power meter 1 16 to monitor for changes in the diffraction efficiency. The beam performing the machining, which may be termed the "machining beam" emitted from the digital mask 1 10, is designated by reference number 1 1 1 . The beam power control unit 1 17, which may be formed, for example, by a rotating half-wave plate followed by a polarizing beam splitter, is coupled to the power meter 1 16 for real-time beam intensity control of the machining beam 1 1 1 .

[0042] Figure 3 illustrates the average power (in milliwatts) versus the threshold exposure time (in milliseconds) for different feature spacings. Figure 3 thus illustrates how closely the dosage is able to be controlled by the apparatuses 10 and 100 described herein when used in connection with the greyscale control methodology described herein.

[0043] Referring briefly to Figure 4, a high level flowchart 200 is shown of various operations that may be performed by the apparatus 10 or 100 in carrying out the methodology of the present disclosure. At operation 202 a pulsed laser beam is generated. At operation 204 the digital mask (26 or 1 10) may be used to digitize the beam and selectively turn on only specific ones of the pixels within the mask to create the "machining beam" (i.e., beam 28' or 1 1 1 ). Optionally, one of the "off" beamlets not being used for machining (i.e., the "mth beam") may be selected and its power monitored, as indicated at operation 206. Also optionally, if operation 206 is performed, then at operation 208 the power of the machining beam may be adjusted in real time based on the measured power of the mth beamlet.

[0044] At operation 210 the machining beam may be collimated. At operation 212 the collimated machining beam may be used to begin/continue machining an entire n ^th layer within the sample (i.e., the photopolymer resist) in one operation. At operation 214 the movable stage (50 or 130) and/or the objective lens (44 or 128) may be controlled as needed during the machining process. At operation 216 a check is made if the machining has been completed, and if not operations 210-216 may be repeated. If machining of the n ^th layer of the sample part is completed, then digital information for writing the n+1 layer of the part may be obtained, as indicated at operation 218, and operations 204-216 may be repeated to write out the next layer. If the check at operation 216 indicates that all layers of the part have been machined, then the process ends.

[0045] The various embodiments and methodology of the present disclosure described herein presents a new parallel, two-photon lithography technique that ensures depth resolvability on the order of a single micron, and an in-plane feature size less than about 350 nm. Arbitrarily complex structures may thus be generated by projecting a series of patterned "light sheets" that are dynamically tuned through the digital mask (26 or 1 10). Although the method described herein may appear functionally similar to conventional DMD-based parallelization used in present day projection micro-stereolithography systems, the apparatus and method of the present disclosure implements a fundamentally different optical system that ensures that the light sheet (i.e., the beam 34) is both spatially and temporally focused. By overcoming this barrier to depth resolvability in femtosecond projection optics, the present disclosure successfully increases the scale-up of rate by a factor of 50X while still maintaining the < 350 nm feature size resolutions of high-quality serial techniques. Thus, the apparatus and method of the present disclosure eliminates a fundamental barrier to scaling up submicron additive manufacturing and transforms two-photon lithography into a viable system for high-volume additive manufacturing of functional parts with nanoscale features.

[0046] The various embodiments and methodology of the present disclosure are expected to have a wide range of applicability, for example in 3D printing applications in the microelectronics industry, in fabrication of high energy laser targets; in 3D printing applications for printing photonic crystals (i.e., sensors), in mechanical metamaterials (e.g., low density, high strength engineered metamaterials), and in microfluids (e.g., for biomedical diagnostic strips), just to name a few examples of potential applications.

[0047] While various embodiments have been described, those skilled in the art will recognize modifications or variations which might be made without departing from the present disclosure. The examples illustrate the various embodiments and are not intended to limit the present disclosure. Therefore, the description and claims should be interpreted liberally with only such limitation as is necessary in view of the pertinent prior art. [0048] Example embodiments are provided so that this disclosure will be thorough, and will fully convey the scope to those who are skilled in the art. Numerous specific details are set forth such as examples of specific components, devices, and methods, to provide a thorough understanding of embodiments of the present disclosure. It will be apparent to those skilled in the art that specific details need not be employed, that example embodiments may be embodied in many different forms and that neither should be construed to limit the scope of the disclosure. In some example embodiments, well-known processes, well-known device structures, and well-known technologies are not described in detail.

[0049] The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting. As used herein, the singular forms "a," "an," and "the" may be intended to include the plural forms as well, unless the context clearly indicates otherwise. The terms "comprises," "comprising," "including," and "having," are inclusive and therefore specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof. The method steps, processes, and operations described herein are not to be construed as necessarily requiring their performance in the particular order discussed or illustrated, unless specifically identified as an order of performance. It is also to be understood that additional or alternative steps may be employed.

[0050] When an element or layer is referred to as being "on," "engaged to," "connected to," or "coupled to" another element or layer, it may be directly on, engaged, connected or coupled to the other element or layer, or intervening elements or layers may be present. In contrast, when an element is referred to as being "directly on," "directly engaged to," "directly connected to," or "directly coupled to" another element or layer, there may be no intervening elements or layers present. Other words used to describe the relationship between elements should be interpreted in a like fashion (e.g., "between" versus "directly between," "adjacent" versus "directly adjacent," etc.). As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

[0051] Although the terms first, second, third, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections should not be limited by these terms. These terms may be only used to distinguish one element, component, region, layer or section from another region, layer or section. Terms such as "first," "second," and other numerical terms when used herein do not imply a sequence or order unless clearly indicated by the context. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the example embodiments.

[0052] Spatially relative terms, such as "inner," "outer," "beneath," "below," "lower," "above," "upper," and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. Spatially relative terms may be intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as "below" or "beneath" other elements or features would then be oriented "above" the other elements or features. Thus, the example term "below" can encompass both an orientation of above and below. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.