Title:
SUBSTRATE TREATMENT APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/045629
Kind Code:
A1
Abstract:
The present invention relates to a substrate treatment apparatus and, more specifically, to a substrate treatment apparatus for depositing a thin film on a substrate. A substrate treatment apparatus according to an embodiment of the present invention comprises: a plurality of material gas supply parts for supplying a plurality of material gases in which at least one of the plurality of material gases comprises (3-dimethylaminopropyl)dimethylindium (DADI); a gas mixing part to which the plurality of material gas supply parts are connected, and which has an inner space so that a passing speed is lower than the feed speed of the plurality of material gases; and a chamber connected to the gas mixing part, and having a reaction space in which material gases that have been mixed in the inner space are provided.
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Inventors:
KIM DUCK HO (KR)
KOO HYUN HO (KR)
MHA CHANG SU (KR)
PARK AE JUNG (KR)
LEE SANG DU (KR)
CHAE MIN SEOK (KR)
KOO HYUN HO (KR)
MHA CHANG SU (KR)
PARK AE JUNG (KR)
LEE SANG DU (KR)
CHAE MIN SEOK (KR)
Application Number:
PCT/KR2021/010455
Publication Date:
March 03, 2022
Filing Date:
August 06, 2021
Export Citation:
Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
C23C16/40; C23C16/455; C23C16/448; H01L21/02
Foreign References:
| KR20190098533A | 2019-08-22 | |||
| JP2013518989A | 2013-05-23 | |||
| JP2001234348A | 2001-08-31 | |||
| JP2009129963A | 2009-06-11 | |||
| KR20130024296A | 2013-03-08 |
Attorney, Agent or Firm:
NAM, Seung-Hee (KR)
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