Title:
SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE TRANSFER METHOD
Document Type and Number:
WIPO Patent Application WO/2022/185428
Kind Code:
A1
Abstract:
This substrate transfer apparatus is provided with a transfer unit that transfers a substrate from an inlet end of a transfer path to a predetermined stopping position, a substrate passing sensor that projects a detection light toward the substrate passing through a prescribed position closer to the inlet end side of the transfer path than the stopping position and detects the presence of the substrate at the prescribed position on the basis of a passing amount or a reflected amount of the detection light, a setting unit that, when the transfer unit transfers the substrate, sets a future transfer distance for transferring the substrate to the stopping position at a time when the detection result of the substrate passing sensor goes from "no substrate", to "substrate detected", and then to "no substrate", a monitoring unit that monitors whether or not the detection result once again changes to "substrate detected" until the substrate reaches the stopping position, and a resetting unit that, when the detection result once again changes to "substrate detected", at the time when the detection result then changes to "no substrate", resets the previously set transfer distance and sets the future transfer distance again.
Inventors:
ITO TARO (JP)
Application Number:
PCT/JP2021/008069
Publication Date:
September 09, 2022
Filing Date:
March 03, 2021
Export Citation:
Assignee:
FUJI CORP (JP)
International Classes:
H05K13/02; H05K13/04
Domestic Patent References:
| WO2004093514A1 | 2004-10-28 |
Foreign References:
| JP2013225627A | 2013-10-31 | |||
| JPH0537187A | 1993-02-12 | |||
| JP2007225323A | 2007-09-06 | |||
| JP2017183630A | 2017-10-05 | |||
| JP2011071345A | 2011-04-07 |
Attorney, Agent or Firm:
KYORITSU INTERNATIONAL (JP)
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