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Patent Searching and Data


Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/063049
Kind Code:
A1
Abstract:
Provided is a substrate processing device that makes it possible to synchronize a plurality of clamp pins to stably position a substrate at a center of rotation. A substrate processing device 1 according to an embodiment of the present invention comprises: a clamp lever 12 that, in accordance with rotation about a horizontal axis, moves at least three clamp pins 11 between an open position away from the outer peripheral edge We of a substrate W and a closed position for contacting the outer peripheral edge We and holding the substrate W; a rising/lowering ring 15 that rotates the clamp lever 12 in accordance with rising and lowering; a rotating body 30 that rotates the substrate W held by the clamp pins 11; a rotation mechanism 40 that rotates the rotating body 30 about an axis Ax; a raising/lowering mechanism 50 that raises and lowers the rising/lowering ring 15; a biasing member 56 that biases the clamp lever 12 in a direction for achieving the closed position; a synchronization ring 61 that is provided so as to be rotatable about the axis Ax and incapable of rising and lowering; a conversion mechanism 62 that converts rising and lowering of the rising/lowering ring 15 into rotation of the synchronization ring 61, while maintaining the orientation of the rising/lowering ring 15 in a horizontal state; and a supply unit 70 that supplies a processing liquid to the substrate W.

Inventors:
FURUYA MASAAKI (JP)
KOBAYASHI HIROAKI (JP)
MORI HIDEKI (JP)
Application Number:
PCT/JP2023/033901
Publication Date:
March 28, 2024
Filing Date:
September 19, 2023
Export Citation:
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Assignee:
SHIBAURA MECHATRONICS CORP (JP)
International Classes:
H01L21/306; H01L21/304
Foreign References:
JP2021106237A2021-07-26
JP2016192545A2016-11-10
JP2016096256A2016-05-26
JP2010130021A2010-06-10
JP2008034553A2008-02-14
JPH10335287A1998-12-18
Attorney, Agent or Firm:
KIUCHI Mitsuharu et al. (JP)
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