Title:
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2024/084987
Kind Code:
A1
Abstract:
This substrate processing apparatus comprises: a processing vessel that has a carry in/out opening for substrates, and that accommodates the substrates; a lid that opens/closes the carry in/out opening; a gate opening/closing part that moves the lid; a substrate transfer part that holds and passes the substrate through the carry in/out opening; a first open/close valve that opens/closes a first flow path for supplying a purge gas to the processing vessel; and a control unit. The control unit determines whether carrying out of one of the substrates is followed by carrying in of another substrate. If carrying out of said one substrate is followed by carrying in of said another substrate, the control unit performs the carrying in of said another substrate after the carrying out of said one substrate, without switching the carry in/out opening from open state to closed state, and without switching the first flow path from closed state to open state.
Inventors:
NAKASHIMA MIKIO (JP)
UMEZAKI SHOTA (JP)
HAYASHIDA TAKAHIRO (JP)
UMEZAKI SHOTA (JP)
HAYASHIDA TAKAHIRO (JP)
Application Number:
PCT/JP2023/036392
Publication Date:
April 25, 2024
Filing Date:
October 05, 2023
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/304
Foreign References:
| JP2020198389A | 2020-12-10 | |||
| JP2002336675A | 2002-11-26 | |||
| JP2019195789A | 2019-11-14 | |||
| JP2016139665A | 2016-08-04 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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