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Title:
SPUTTERING TARGET, MAGNETIC FILM, AND PERPENDICULAR MAGNETIC RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2020/031460
Kind Code:
A1
Abstract:
This sputtering target contains at least 0.05 at% of Bi, wherein the total contained amount of metal oxides is 10-60 vol%, and the remaining portion includes Co and Pt.

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Inventors:
MASUDA MANAMI (JP)
SHIMIZU MASAYOSHI (JP)
IWABUCHI YASUYUKI (JP)
Application Number:
PCT/JP2019/020556
Publication Date:
February 13, 2020
Filing Date:
May 23, 2019
Export Citation:
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Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; G11B5/64; G11B5/851; H01F10/16; C22C1/04; C22C19/07; C22C32/00
Domestic Patent References:
WO2014141737A12014-09-18
Foreign References:
JP2001256631A2001-09-21
JP2006155861A2006-06-15
JP2016115379A2016-06-23
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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