CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of United States Provisional Application No. 63/110,312, filed November 5, 2020, which is incorporated herein in its entirety.

FIELD

The present disclosure relates to electrochromic lenses and their use in eyewear.

BACKGROUND

Eyewear generally consists of one or two lenses incorporated into a frame which positions the lenses in front of the wearer's eyes. Lenses may include optical coatings and/or filters which control the amount of light passing through the lens. Sunglasses, goggles, welding masks and other protective eyewear are designed to absorb a significant amount of visible light, thereby reducing the amount of light reaching the wearer's eye.

One such functional coating/filter used to control the passage of visible light through the lenses utilizes photochromic materials. Photochromic materials auto-darken in the presence of bright light and lighten in its absence. Limitations of this technology include: slow reversion from the dark state to the light state; reversion cannot be controlled manually; and photochromic materials tend to degrade upon exposure to ultraviolet light.

Another functional coating/filter which has been utilized in eyewear employs electrochromic materials. Traditional electrochromic coatings/filters involve an electrolyte material, which may be a liquid or a gel, sandwiched between thin electrochromic layers. Limitations of this this technology include breakdown of the electrolyte over time and manufacturing costs.

Thus, there is a need for optical coatings and/or filters with improved switching speeds, low manufacturing costs, and improved stability. SUMMARY

A lens for an electrochromic eyewear apparatus is described herein. The lenses herein comprise an all-solid-state electrochromic element with improved switching speed, durability and reduced cost for production. In some embodiments, the lens for an electrochromic eyewear apparatus can comprise a first (exterior relative to the viewer's eye) substrate layer; a first transparent conductive layer; an electrochromic element; and a second transparent conductive layer. In some embodiments, the electrochromic element may comprise an electrically insulating layer disposed between a first electrochromic layer and a second electrochromic layer. In some embodiments, the first electrochromic layer, the insulating layer and the second electrochromic layer are in electrical communication. The first electrochromic layer may comprise a p-type or doped p-type electrochromic material. In some embodiments, the insulating layer may comprise an electrically insulating material comprising a metal oxide and an inorganic compound. The second electrochromic layer may comprise an n-type electrochromic material. In some embodiments, the electrochromic layer can switch from a transparent state to a dark state in less than 5 seconds. Some embodiments include an additional second (interior) substrate layer and a coupling layer. In some embodiments, the lens for the eyewear apparatus may be a corrective lens.

Some embodiments include an eyewear assembly which may comprise a lens and a subframe assembly covering at least a portion of a peripheral edge about the top horizontal surface of the lens. In some embodiments, the subframe covers ablation cutouts on the lens which form ports for the attachment of busbars. In some embodiments, the eyewear assembly can further comprise an edge sealing material, wherein the edge sealing material seals the outer edge of the lens which is not enclosed within the subframe assembly. In some embodiments, the subframe assembly can further comprise a first and a second hingeably attached temple assembly. Some embodiments include a subframe assembly wherein the subframe assembly can comprise an optical sensor. In other embodiments, the subframe assembly can comprise metallic strips running through a portion of the subframe assembly. The metallic strips can be attached to the optical sensor and the first and second busbars and wherein the optical sensor and the first and second busbars are in electrical communication. In addition, the present disclosure provides methods for the preparation of electrochromic lenses and for electrochromic eyewear apparatuses.

These and other embodiments are described in greater detail below.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is an illustration of a perspective view an embodiment described herein.

FIG. 2 is a perspective view of one of the electrochromic layers utilized in the present disclosure.

FIG. 3 is a perspective view of one of the electrochromic layers utilized in the present disclosure.

FIG. 4 is a perspective view of one of the lenses for an eyewear apparatus described herein.

FIG. 5a is an illustration of the shapes of the lens for an eyewear apparatus described herein.

FIG. 5b is an illustration depicting a lens described herein with a cross-section depicting the layers of the lens.

FIG. 6a is an illustration of a cross-section of the lens for an eyewear apparatus described herein.

FIG. 6b is an illustration of a cross-section of the lens for an eyewear apparatus described herein.

FIG. 7a is a schematic illustration of an eyewear apparatus described herein.

FIG. 7b is a schematic illustration of a perspective view of an eyewear apparatus described herein.

FIG. 8 is an illustration of a front view of an embodiment of the lens incorporated into an eyewear apparatus. FIG. 9 is a graphic representation of the coloration time of one of the lens embodiments herein.

DETAILED DESCRIPTION

The present disclosure generally relates to an all solid-state electrochromic element comprising a p-type electrochromic material, an insulating material and a n-type material (also called a P-l-N structure) for use in a light filtering device such as a lens. This P-l-N element is sputter coated onto a lens substrate coated with a transparent electrode and then a second lens substrate with a second transparent electrode layer is disposed on top of the sputtered electrochromic element. By using sputter coated solid-state electrochromic films, the electrochromic coating/filter can be very thin and durable at the same time. Also, it can utilize a continuous manufacturing process of the electrochromic layers, further reducing production costs. With the combination of the P-l-N element materials, a fast coloration speed all solid-state electrochromic device can be achieved within several seconds.

As used herein, the term "transparent" includes a property in which the corresponding material transmits or allows light to pass through the material. In one aspect, the transmittance of light through the transparent material may be about 50-100%, such as at least about 50%, at least about 60%, at least about 70%, at least about 80%, at least about 90%, at least about 95%, at least about 99%, about 50-60%, about 60-70%, about 70-80%, about 80-90%, about 90-95%, or about 95%-99%.

The term "optically clear" as used herein, includes properties wherein the refractive index of a material is substantially constant through the entire material in a viewing direction and that the material is substantially free of opaque material (such as colorants) or areas of different refractive index which could result in noticeable refraction and scattering of light.

The term "light" as used herein includes light in a wavelength region targeted by the electrochromic element or device. For example, when the electrochromic material or device is used as a filter of an image pickup apparatus for a visible light region, light in the visible light region is targeted, and when the electrochromic material is used as a filter of an image pickup apparatus for an infrared region, light in the infrared region is targeted. When a forward voltage bias is applied to the electrochromic device, the light transmission percentage (T%) begins to decrease. The time required for the T% to be decreased by a factor of 10 is defined as "coloration time." For example, if the clear-state T% is 90%, and it takes 3 seconds to drop to a T% of 9%, the coloration time is 3 seconds. The coloration speed is the inverse of the coloration time: the shorter the coloration time, the higher coloration speed. In this disclosure, coloration time is used as a parameterto describe the coloration speed of the electrochromic device. In some cases, the time required to go from an off-state (transparent) to an on-state (colored or darkened), and vice versa, is referred to as a switching speed.

The present disclosure relates generally to electrochromic lenses and eyewear apparatuses incorporating the same. The eyewear apparatus may include, but is not limited to, spectacles, googles, welding helmets, glasses, and protective face shields. The eyewear apparatus may be useful within industrial safety, in the construction industry, in sports, in medicine and for recreational use. The lens for eyewear apparatuses may include at least one electrochromic element having one or more optical properties, such as transparency, absorption, or transmittance, that may be changed from a first state to a second state upon application of an electric potential. More particularly, but not exclusively, the present disclosure relates to lenses for eyewear apparatuses comprising ultrathin electrochromic layers, with fast on- and off-state switching speeds following application of the electric potential. The electrical potential may function automatically through the incorporation of components including, but not limited to, sensors, microprocessor-based controllers, electrical connections that allow for the communication between power components (e.g., power source, controller, sensor, etc.) and a flexible metal wire incorporated into the eyewear apparatus.

A single lens for an eyewear apparatus, such as apparatus 10, is illustrated in FIG. 1. The blade lens is used herein is for illustrative proposes, and it is contemplated that the eyewear apparatus also may comprise two lenses. In some embodiments, the lens for an eyewear apparatus can be a corrective lens or a non-corrective lens. The lens can further comprise a peripheral (or outer) edge, wherein the peripheral edge may encompass the entire lens. In some embodiments, the lens for an eyewear apparatus may comprise a first/exterior substrate, such as substrate 11. The lens may incorporate a first transparent conductive layer (e.g., a first electrode), such as layer 12, an electrochromic element, such as element 13, a second transparent conductive layer (e.g., a second electrode), such as layer 14, an ablation cut, such as ablation cut 16 within the electrochromic element and the second transparent conductive layer, such as second transparent conductive layer 14. Some embodiments may further comprise a second/interior substrate, such as substrate 17, and an optically clear adhesive layer, such as layer 18. In examples wherein the lens is constructed with the second/interior layer and optically clear adhesive layer, these layers can have ablation cuts, such as ablation cuts 15 and 16. Additional layers, such as a protection layer or a functional coating, may also be present in some embodiments of the electrochromic lenses, elements and eyewear apparatuses disclosed herein.

The exterior substrate, such as substrate 11 may comprise an exterior lens. The exterior substrate may comprise a transparent polymer or glass. In some embodiments the exterior substrate may have an outer surface and an inner surface. In some embodiments, the exterior substrate may include a functional coating. The functional coating can be a protective coating and/or a UV-blocking coating disposed upon the outer surface of the exterior substrate. The protective coating may comprise a polycarbonate film. The coating may be bonded to the substrate with, for example, an optically clear adhesive or any other suitable method for bonding coatings to a transparent substrate.

Some embodiments include a coupling (or adhesive) layer, such as coupling or adhesive layer 18. In some embodiments, the coupling layer may couple the interior substrate layer, such as interior substrate layer 17 with the interior transparent conductive layer, such as the interior transparent conductive layer 14. The coupling layer may comprise an optically clear adhesive material. The optically clear adhesive (OCA) is not particular limited provided the OCA's refractive index is fairly constant throughout the material, and any suitable OCA may be selected. In some embodiments, the coupling layer may comprise an ultra-violet (UV) curable resin.

The first and second transparent conductive layers may be transparent to visible light.

The first and the second transparent conductive layers may be defined in their entirety by the transparent conductive substrates found in these layers, or it is possible that the transparent conductive substrates of these layers only partially define these layers. In some embodiments, the transparent conductive substrates of these layers may be formed on a bonding layer and/or substrate. In some examples, light can be efficiently taken in from the outside of the transparent conductive layers to interact with the electrochromic materials of the electrochromic element, e.g. electrochromic element 13.

In some embodiments, the first transparent conductive layer has an ablation cut, such as cut 15, in one corner of the top edge surface, and this cut forms the port for a busbar attachment with the cathode (or the anode in an alternative embodiment, depending on the orientation of the electrochromic materials of the electrochromic element). The electrochromic element and the second transparent conductive layer has an ablation cut, such as cut 16, on the top edge corner opposite of ablation cut 15, and this cut will form the port for a busbar attachment with the anode (or the cathode in an alternative embodiment, depending on the orientation of the electrochromic materials of the electrochromic element). In some embodiments, a first busbar (not illustrated) is attached to the first transparent conductive layer at cut 15. In some embodiment, a second busbar (not illustrated) is attached to the second transparent conductive layer at cut 16. The attached busbars form an anode and a cathode placing the first transparent conductive layer, the electrochromic element, and the second transparent conductive layer in electrical communication.

In some examples, the first and second transparent conductive layers may comprise a transparent conductive oxide dispersed on a transparent substrate, or by partly arranging metal wires on a transparent substrate, or combinations thereof. In some embodiments, the first and second transparent conductive layers may be formed from a transparent conductive oxide material having good transmissivity and conductivity, such as tin-doped indium oxide (also called indium tin oxide, or ITO), zinc oxide, gallium-doped zinc oxide (GZO), indium zinc oxide (IZO), aluminum-doped zinc oxide (AZO), tin oxide, antimony-doped tin oxide (ATO), fluorine-doped tin oxide (FTO), niobium-doped titanium oxide (TNO), a conductive polymer material, or a material containing Ag, Ag nanoparticles, carbon nanotubes or graphene. Of the transparent conductive oxide materials identified above, FTO may be selected for heat resistance, reduction resistance, and conductivity, and ITO may be selected for conductivity and transparency. One or both of the transparent conductive layers may contain one of these conductive materials, or one or both of the transparent conductive layers may have a multilayer structure containing a plurality of these conductive materials. In some embodiments, the first transparent conductive layer is indium tin oxide. In some embodiments, the second transparent conductive layer is indium tin oxide. In some embodiments, the first transparent conductive layer is a pre-learned patterned ITO-glass substrate.

In some embodiments, the first transparent conductive layer comprises indium tin oxide. In some examples, the thickness of the first transparent conductive layer (e.g., an ITO layer) is about 10 nm to about 150 nm, about 10-12 nm, about 12-14 nm, about 14-16 nm, about 16-18 nm, about 18-20 nm, about 20-22 nm, about 22-24 nm, about 24-26 nm, about 26-28 nm, about 28-30 nm, about 30-35 nm, about 35-40 nm, about 40-50 nm, about 50-60 nm, about 60-70 nm, about 70-80 nm, about 80-90 nm, about 90-100 nm, about 100-110 nm, about 110-120 nm, about 120-130 nm, about 130-140 nm, about 140-150 nm, about 15-25 nm, about 1-50 nm, about 50-100 nm, about 100-150 nm, about 80 nm, or about 20 nm, or about any thickness in a range bounded by any of the these values.

In some examples, the thickness of the second transparent conductive layer (e.g., an ITO layer) is about 10 nm to about 400 nm, about 10-12 nm, about 12-14 nm, about 14-16 nm, about 16-18 nm, about 18-20 nm, about 20-22 nm, about 22-24 nm, about 24-26 nm, about 26-28 nm, about 28-30 nm, about 30-35 nm, about 35-40 nm, about 40-50 nm, about 50-60 nm, about 60-70 nm, about 70-80 nm, about 80-90 nm, about 90-100 nm, about 100- 110 nm, about 110-120 nm, about 120-130 nm, about 130-140 nm, about 140-150 nm, about 150-160 nm, about 160-170 nm, about 170-180 nm, about 180-190 nm, about 190-200 nm, about 200-210 nm, about 210-220 nm, about 220-230 nm, about 230-240 nm, about 240-250 nm, about 250-260 nm, about 260-270 nm, about 270-280 nm, about 280-290 nm, about 290- 300 nm, about 300-310 nm, about 310-320 nm, about 320-330 nm, about 330-340 nm, about 340-350 nm, about 350-360 nm, about 360-370 nm, about 370-380 nm, about 380-390 nm, about 390-400 nm about 75-85 nm, about 15-25 nm, about 1-50 nm, about 50-100 nm, about 100-150 nm, about 80 nm, about 20 nm, about 185 nm, about 220 nm, about 250 nm, about 300 nm, about 350 nm, about 400 nm, or about any thickness in a range bounded by any of the above values. In some embodiments wherein the second transparent conductive layer is thicker, e.g., about 100 nm to 400 nm thick, the layer may perform a dual function of both an electrical conducting electrode layer and as a protective layer for the lens structure.

Traditionally, the use of electrochromic lenses used in eyewear have been limited due to their switching speeds. Some examples of the present disclosure describe lenses which may utilize an electrochromic element with a fast-switching speed of 5 seconds or less to switch from a 90% transparent state to a 90% dark state.

The electrochromic element, such as element 13, may comprise a first electrochromic material, such as electrchromic material 21, a second electrochromic material, such as electrochromic material 23, and an insulating material, such as insulating material 22 sandwiched between the first and second electrochromic materials, as illustrated in FIGS. 2 and 3. The first and the second electrochromic material of the electrochromic element described herein can comprise charge sensitive materials. In some embodiments, the first and second electrochromic materials may comprise one or more optical properties that may change from a first state (clear or transparent) to a second state (colored or darkened) upon the application of an electric potential. In some embodiments, the first electrochromic material may include n-type electrochromic materials. In other embodiments, the first electrochromic material may comprise a doped n-type electrochromic material. The dopant of the doped n-type electrochromic material may comprise an inorganic oxide selected from aluminum oxide, silicon oxide or titanium oxide. As used herein, the term "n-type electrochromic material" means the refers to a material in which its Fermi energy level (E/) is closer to the conductance band energy level.

In some embodiments, the first electrochromic material 21 may include n-type electrochromic materials. N-type electrochromic materials allow electrons to be injected from the transparent conductive material of the first transparent conductive layer (cathode). The injection of electrons into the n-type electrochromic material enhances the reduction of the n-type electrochromic material resulting in transformation of the material from a first optical state (transparent) to a second optical state (dark). In some embodiments, the n-type electrochromic materials can comprise cathodic electrochromic materials. The term "cathodic electrochromic material" as used herein means a material that undergoes changes in optical properties by a reduction reaction thereof in which electrons are given to the material. In other embodiments, the first electrochromic material may comprise a doped n- type electrochromic material. In cases where the first electrochromic material is a doped n- type electrochromic material, the dopant can be an inorganic material. The dopant inorganic oxide material can include aluminum oxide (AI2O3), silicon oxide (SiOz), titanium oxide (TiO?), vanadium oxide (V2O5), or a combination thereof.

Non-limiting examples of cathodic electrochromic materials include tungsten oxide (WO3-X, where x is 0 < x <1), titanium oxide (TiC ), niobium oxide (Nb20s), molybdenum (VI) oxide (MoOs), tantalum(V) oxide (Ta2Os), and vanadium oxide (V2O5). In some embodiments, the first electrochromic material comprises tungsten oxide. In other embodiments, the first electrochromic material comprises aluminum-tungsten oxide (Al-W-O). In still other embodiments, the first electrochromic material may comprise silicon-tungsten oxide (Si-W- O). In still other embodiments, first electrochromic material may comprise titanium-tungsten oxide (Ti-W-0).

The first electrochromic material (e.g., comprising WO3-X, where 3-x refers to an atomic ratio of oxygen to tungsten and x is between 0 < x <1, another metal oxide compound, doped WO3-X or another doped metal oxide compound described in the paragraph above) may have any suitable thickness, such as about 100-500 nm, about 100-110 nm, about 110- 120 nm, about 120-130 nm, about 130-140 nm, about 140-150 nm, about 150-160 nm, about 160-170 nm, about 170-180 nm, about 180-190 nm, about 190-200 nm, about 200-210 nm, about 210-220 nm, about 220-230 nm, about 230-240 nm, about 240-250 nm, about 250-260 nm, about 260-270 nm, about 270-280 nm, about 280-290 nm, about 290-300 nm, about 300- 310 nm, about 310-320 nm, about 320-330 nm, about 330-340 nm, about 340-350 nm, about 350-360 nm, about 360-370 nm, about 370-380 nm, about 380-390 nm, about 390-400 nm, about 400-410 nm, about 410-420 nm, about 420-430 nm, about 430-440 nm, about 440-450 nm, about 450-460 nm, about 460-470 nm, about 470-480 nm, about 480-490 nm, about 490- 500 nm, about 100-300 nm, about 200-400 nm, about 300-500 nm, about 150-250 nm, about 250-350 nm, about 350-450 nm, about 100 nm, about 150 nm, about 200 nm, about 250 nm, about 300 nm, about 350 nm, about 400 nm, or any thickness in a range bounded by any of these values, although other variations are contemplated. Of particular interest for the thickness of the first electrochromic layer include 100 nm, 200 nm, and 400 nm, ±10 nm.

In some embodiments, the second electrochromic material, such as material 23, may comprise a p-type electrochromic material. In some embodiments, the second electrochromic material may comprise a doped p-type electrochromic material. As used herein, the term "p-type electrochromic material" refers to a material in which its Fermi energy level (E/) is closer to the valence band energy level (E _v ) than its conductance band energy level (E _c ). As used herein, the term "doped p-type electrochromic material" refers to a p-type electrochromic material doped with an inorganic oxide selected from aluminum oxide or silicon oxide. It is believed that the doping of the p-type electrochromic materials either change the band gap or by forming a state which will promote hole injections from the second transparent conductive layer (the anode). The injection of holes into the p-type or doped p-type electrochromic material significantly enhances the oxidation of the p-type or doped p-type electrochromic material causing a transformation from a first state (transparent) to a second state (darkened). In some embodiments, the p-type electrochromic material can comprise an anodic electrochromic material and at least one inorganic oxide material. The term "anodic electrochromic material" as used herein means a material that undergoes changes in optical properties by an oxidation reaction thereof in which electrons are removed from the material. In some embodiments, the p-type (anodic electrochromic) material may comprise, for example, nickel oxide (NiO), iridium(IV) oxide (IrC ), chromium oxide (C^Os), manganese dioxide (MnC ), iron oxide (FeC ), and cobalt(ll) peroxide (CoO?). In some embodiments, the p-type electrochromic material may comprise nickel oxide. In some embodiments the doped p-type electrochromic material can comprise a trivalent cation dopant inorganic material. Examples of trivalent cations that may be used as the inorganic doping material can include, but not limited to, aluminum (III) (Al ³⁺ ), boron (B ³⁺ ), chromium (Cr ³⁺ ), or iron (III) (Fe ³⁺ ). It is believed that the doping of nickel oxide with a trivalent cation blocks the formation of Ni ³⁺ which improves Ni's electrochemical performance. It is further believed that this enhancement electrochemical performance leads to faster oxidation rates when a positive electrical potential is applied across the layer and faster reduction rate when a negative electrical potential is applied. In other embodiments, the dopant inorganic material may comprise silicon (Si), vanadium (V), or titanium (Ti).

When the second electrochromic material comprises a doped p-type material, the atomic ratio, the ratio of the dopant inorganic material to the metal oxide (Ni), may be between about 0.01 to 0.2, about 0.01 to 0.05, about 0.05 to 0.1, about 0.1 to about 0.15, or about 0.15 to 0.2. In some embodiments, the atomic ratio of dopant inorganic material to metal oxide may be 0.01. In otherembodiments the atomic ratio of dopant inorganic material to metal oxide may be 0.05. In still other embodiments, the atomic ratio of dopant inorganic material to metal oxide may be 0.1. In other embodiments, the atomic ratio of dopant inorganic material to metal oxide may be 0.15. In still other embodiments, the atomic ratio of dopant inorganic material to metal oxide may be 0.2.

The second electrochromic material (e.g., material comprising a metal oxide or a doped metal oxide compound from the paragraph above) may have any suitable thickness, such as about 40-500 nm, about 40-50 nm, about 50-60 nm, about 60-70 nm, about 70-80 nm, about 80-90 nm, about 90-100 nm, about 100-110 nm, about 110-120 nm, about 120- 130 nm, about 130-140 nm, about 140-150 nm, about 150-160 nm, about 160-170 nm, about 170-180 nm, about 180-190 nm, about 190-200 nm, about 200-210 nm, about 210-220 nm, about 220-230 nm, about 230-240 nm, about 240-250 nm, about 250-260 nm, about 260-270 nm, about 270-280 nm, about 280-290 nm, about 290-300 nm, about 300-350 nm, about 350- 400 nm, about 400-450 nm, about 450-500 nm, about 80-100 nm, about 100-125 nm, about 125-150 nm, about 0.1-50 nm, about 50-100 nm, about 100-150 nm, about 0.1-60 nm, about 60-120 nm, about 120-180 nm, about 0.1-100 nm, about 100-300 nm, about 200-400 nm, about 300-500 nm, about 60 nm, about 80 nm, about 100 nm, about 125 nm, about 150 nm, about 200 nm, about 400 nm, or any thickness ±10 nm in a range bounded by any of these values, although other variations are contemplated.

In some embodiments, an insulating layer, such as insulating layer 22, comprises an electrically insulating material characterized by a relative dielectric constant (K) of at least 10 (e.g., 15 (yttrium oxide (Y2O3)), 25 (hafnium oxide (HfCh)), 25 (Zirconium oxide (ZrC )), and/or -500 (barium titanate (BaTiCh))). In other embodiments, the insulating layer comprises an electrically insulating material characterized by a relative dielectric constant (K) of at least 15. In still other embodiments, the insulating layer comprises an electrically insulating material characterized by a relative dielectric constant (K) of at least 20. In the illustrated form (FIGs. 2 and 3), the first and second electrochromic materials of the electrochromic element are electrically isolated by the insulating layer. In some embodiments, the insulating layer blocks electronic charges (e.g., electrons and holes) from moving through the device from one transparent conductive layer to the other transparent conductive layer, while retaining the injected electrons from the cathode within the second electrochromic material and retaining the injected holes from the anode within the first electrochromic material, for the coloration or darkening of the electrochromic layers. In some embodiments, the insulating layer can reduce or prevent charge leakage between the first and second electrochromic materials. In some embodiments, the insulating layer can increase coloration efficiency. Further, the first transparent conductive layer can also be electrically isolated or separated from the second transparent conductive layer by the insulating layer, which includes an electrically insulative material. The term "electrically insulative" refers to the reduced transmissivity of the layer to electrons and/or holes. In one form, the electrical isolation or separation between these the first and the second electrochromic materials may result from increased resistivity within the insulating layer. In addition, it should be appreciated that first transparent conductive layer can be in electrical communication with the first electrochromic material, which can be in electrical communication with the insulating layer, which can be in electrical communication with the second electrochromic material, which can be in electrical communication with the second transparent conductive layer. As indicated above, the insulating layer may include one or more electrically insulative materials, including inorganic and/or organic materials, which exhibit electrically insulative properties. It is believed that the electrically insulative properties of the insulating layer comes from the materials high dielectric constant (K) (the ability of the material to insulate charges from each other, e.g., the ability of the material to stabilize charges). It is believed that the electrically insulative properties of the insulating layer comes from materials with a dielectric constant (K) of at least 10. It is believed that the coloration/switching speed is exponentially proportional to the capacitance of the insulating layers thickness and dielectric constant (K). When the insulative material has a dielectric constant of at least 10 it results in higher charge storage within the p-type and n-type electrochromic material or composites. It is believed that this increase in the stored charge leads to enhanced reduction of the n-type electrochromic material resulting in a darker second state and enhanced oxidation of the p-type electrochromic materials, also resulting in a darker second state. It is further believed that the higher charge storage results in a lower light transmittance. It is the cumulative effect of blocking both the holes and the electrons from passing into the insulative layer and increasing the stored charge within the electrochromic element, that allows for the use of ultrathin layers comprising the first and second electrochromic material and the insulative layer within the electrochromic element of the present disclosure. However, if the insulating layer is too thin, the current may leak through the layer, resulting in reduced coloration/switching speeds. Thus, there is a balance between the dielectric constant and the thickness of the insulating layer to provide increased coloration/switching speeds within the electrochromic element.

In some embodiments, the insulating layer may be formed, in whole or in part, by oxide, nitride, and/or fluoride compounds, such as, for example, aluminum oxide (AI2O3), yttrium oxide (Y2O3), hafnium oxide (HfC ), zirconium oxide (ZrCh), titanium oxide (TiCh), barium titanate (BaTiOs) and/or Si3N4, AIN and lithium fluoride. In some embodiments, the insulating layer comprises aluminum oxide, yttrium oxide, hafnium oxide, zirconium oxide or tantalum oxide. In another embodiment, the insulating layer comprises a stoichiometric metal oxide compound, such as Y2O3, HfO2, TiC>2, or ZrC>2. In some embodiments, the insulating layer comprises non-stoichiometric metal oxide compounds. In some embodiments, the non-stochiometric metal oxide compounds may comprise a ferroelectric material. A ferroelectric material may be barium titanate (BaTiOs). In some embodiments, the insulating layer can comprise aluminum oxide (AI2O3). In some embodiments, the insulating layer can comprise yttrium oxide (Y2O3). In some embodiments, the insulating layer can comprise hafnium oxide (HfC ). In some embodiments, the insulating layer can comprise zirconium oxide (ZrCh).

In some embodiments, wherein the insulating layer comprises a metal oxide compound, the metal oxide compound further comprises an inorganic doping material. In some embodiments, the inorganic doping material may be silicon oxide (SiCh). In other embodiments, the inorganic doping material may be aluminum oxide (AI2O3). In still other embodiments, the inorganic doping material may be titanium oxide (TiO?). In some embodiments, the atomic ratio, the ratio of inorganic doping material to metal oxide may be between about 0.01 to 0.2, about 0.01 to 0.05, about 0.05 to 0.1, about 0.1 to about 0.15, about 0.15 to 0.2. In some embodiments, the atomic ratio of dopant inorganic material to metal oxide can be 0.01. In other embodiments the atomic ratio of dopant inorganic material to metal oxide can be 0.05. In still other embodiments, the atomic ratio of dopant inorganic material to metal oxide can be 0.1. In other embodiments, the atomic ratio of dopant inorganic material to metal oxide can be 0.15. In still other embodiments, the atomic ratio of dopant inorganic material to metal oxide can be 0.2.

The insulating layer can have any suitable thickness, such as about 40 nm to about 150 nm, about 40-50 nm, about 50-60 nm, about 60-70 nm, about 70-80 nm, about 80-90 nm, about 90-100 nm, about 100-110 nm, about 110-120 nm, about 120-130 nm, about 130-140 nm, about 140-150 nm, about 60-65 nm, about 65-70 nm, about 70-75 nm, about 75-80 nm, about 80-85 nm, about 85-90 nm, about 60 nm, about 80 nm, about 100 nm, or any thickness ±10 nm in a range bounded by any of these values, although other variations are contemplated. In some embodiments, the insulating layer may have a thickness which is less than, equal to, and/or greater than the thickness of the first electrochromic layer or the second electrochromic layer. In some examples, the insulating layer comprises materials and/or structures that are effective in confining, on a selective basis, electrons and/or holes within the adjacent electrochromic layers. It is believed that confining the electrons and/or holes within their respective electrochromic layers can significantly increase the reduction and/or oxidation of the metal oxide electrochromic material leading to a lower percentage of transmittance (T%) in the second (darkened) state.

In some embodiments, the insulating layer may be effective for maintaining (in whole or in part) charges injected in the first and second electrochromic materials, to be stored under a no bias condition; i.e., without continued application of an electric potential.

In some embodiments, the electrochromic material comprises a metal oxide such as WO3-X, where 3-x refers to an atomic ratio of oxygen to tungsten and x is between 0 < x <1. However, it should be appreciated that the electrochromic material can include any electrochromic material or compound that changes optical transmittance and/or absorption when an applied voltage pulse above a critical value is applied.

In some embodiments, the layers of the electrochromic element (e.g., 21, 22, 23) are disposed in that order from exterior to interior, see FIG. 2. In some embodiments, the layers of the electrochromic element are disposed in the alternate order (e.g., 23, 22, 21) from interior to exterior, see FIG. 3. Alternative arrangements of the layers of the electrochromic element are also contemplated. In some embodiments, the second electrochromic material 23 is the exterior material and the first electrochromic material 21 is the interior material as illustrated in FIG. 3. Depending on the order of electrochromic material (first p-type electrochromic material, electrically insulating material, then n-type electrochromic material or the opposite with n-type material first, electrically insulating material and then p-type material) the first transparent conductive material may be the anode or may be the cathode. In examples wherein the first electrochromic material is a p-type electrochromic material, the first transparent conductive layer is the anode. In examples wherein the first electrochromic material is an n-type electrochromic material, the first transparent conductive layer is the cathode.

The interior substrate may comprise an interior lens. The interior substrate may comprise a transparent polymer or glass. In some embodiments the interior substrate may have an outer surface and an inner surface. In some embodiments, the interior substrate may include a functional coating. In some embodiments, the functional coating can be an antireflective and/or an anti-fog coating disposed upon the outer surface of the interior substrate. In some embodiments, the functional coating can be an antireflective and/or an anti-fog coating disposed upon the inner surface of the interior substrate. The coating may be bonded to the substrate with, for example, an optically clear adhesive or other suitable method for bonding coatings to a transparent substrate.

Some embodiments include a method for making a lens for an eyewear apparatus. In some embodiments, the method may comprise a) forming a layer (or sheet) as an anode electrode comprising depositing a layer of transparent conductive material (e.g., ITO) on a sheet of substrate material (e.g., glass or a transparent polymer); b) cutting a small port on an area which will comprise an upper corner of the cut lens; c) depositing a first layer of electrochromic material (e.g., NiO or doped NiO) upon the transparent conductive material layer; d) depositing a layer of electrically insulative material (e.g., ZrO?) upon the first layer of electrochromic material; e) depositing a layer of a second electrochromic material (e.g., WO3 or doped WO3) upon the layer of electrically insulative material; f) depositing an additional layer of transparent conductive material (e.g., ITO) upon the layer of second electrochromic material, wherein the additional transparent layer comprises the cathode electrode; g) cutting the prepared layered substrate into individual lens shapes, wherein the individual lens shapes comprise an edge around the circumference of the lens; h) scribing the edges of the lens shapes removing a portion of the transparent conductive layer from the sheet with the anode electrode; i) ablating a corner of the lens, which is not the same corner which was removed in step h), wherein the ablation removes the corner of the cathode electrode and the second electrochromic layer, but does not remove the anode electrode, exposing the anode electrode to form a contact area; j) laser scribing in the area around the ablated edge; k) applying another substrate layer, wherein the substrate layer comprises an interior and exterior surface, wherein the interior surface has a coupling film coated thereon, and wherein the coupling layer is bonded to the cathode electrode. In some embodiments, the coupling film may comprise a clear adhesive film. The clear adhesive film may be any suitable clear adhesive films, such as for example, as cross-linkable material such as epoxy, UV-curable or an A-B epoxy mixed together and cured at room temperature in short period of time such as 5 minutes or longer.

Some embodiments include a method for making a lens for an eyewear apparatus. As shown in FIG. 4, the method may comprise: a) forming a first sheet, such as sheet 430; b) forming a second sheet, such as sheet 431; c) fusing the first sheet and the second sheet together forming a final lens sheet, such as lens 410; and d) cutting the final lens sheet into the desired lens shape.

In some embodiments of the method, forming the first sheet 430 may comprise depositing an optically clear adhesive layer, such as layer 418, onto a surface of an external substrate sheet, such as sheet 417, which includes a first and a second surface. The substrate material may comprise a transparent polymer or glass. In some embodiments, the optically clear adhesive may be any of those described above. In some embodiments, the optically clear adhesive layer can further comprise hydroxyl groups (-OH). It is believed that the addition of hydroxyl groups can enhance the amount of moisture contained within the laminated layers of the lens, which may lead to longer durability of the lens.

The method for making a lens for an eye wear apparatus further includes forming the second sheet, such as 431. The method may comprise providing an external substrate sheet

411. The external substrate sheet 411 can comprise a first surface and second surface. The substrate material may comprise a transparent polymer or glass.

In some embodiments, a first layer of transparent conductive material, such as layer

412, is disposed upon the first surface of the external substrate sheet 411. The first layer of transparent conductive material may be formed from a transparent conductive oxide material having good transmissivity and conductivity, such as tin-doped indium oxide (also called indium tin oxide, or ITO), zinc oxide, gallium-doped zinc oxide (GZO), indium zinc oxide (IZO), aluminum-doped zinc oxide (AZO), tin oxide, antimony-doped tin oxide (ATO), fluorine-doped tin oxide (FTO), niobium-doped titanium oxide (TNO), a conductive polymer material, or a material containing Ag, Ag nanoparticles, carbon nanotubes or graphene. Of the transparent conductive oxide materials identified above, FTO may be selected for heat resistance, reduction resistance, and conductivity and ITO may be selected for conductivity and transparency. One or more of the transparent conductive layers may contain one of these conductive materials, or one or more of the transparent conductive layers may have a multilayer structure containing a plurality of these conductive materials. In one aspect of the present disclosure, the transparent conductive material is indium tin oxide.

Once the external substrate and the first transparent conductive layer are formed, a corner on the lens top leading edge is ablated, such as ablation 415, and this ablation will function as the attachment point for the busbar (not illustrated) to form the cathode (or the anode in an alternative embodiment, depending on the orientation of the electrochromic materials of the electrochromic element). Next, an electrochromic element, such as element 413 may be deposited upon and in electrical communication with the first layer of transparent conductive material 412. The electrochromic element 413 may comprise a first layer of electrochromic material, such as Iayer 421, an layer of electrically insulating material, such as layer 422, and a layer of a second electrochromic material, such as layer 423. The electrochromic element may be formed by first disposing a first electrochromic material upon the first transparent conductive layer, then disposing a layer of electrically insulative material upon the first electrochromic material, and finally depositing a layer of a second electrochromic material upon the electrically insulative material. In some embodiments, wherein the first layer of conductive material serves as the cathode, the first layer of electrochromic material may comprise an n-type (cathodic) material and the second layer of electrochromic material may comprise a p-type (anodic) or doped p- type electrochromic material. In some embodiments wherein the first layer of conductive material serves as the anode, the first layer of electrochromic material may comprise an p- type or doped p-type electrochromic material and the second layer of electrochromic material may comprise an n-type electrochromic material. In some aspects, the n-type electrochromic material may be the first layer of electrochromic material and the p-type or doped p-type electrochromic material may be the second layer of electrochromic material, while in other aspects the p-type or doped p-type electrochromic material may be the first layer of electrochromic material while the n-type electrochromic material may be the second layer of electrochromic material. Is should be recognized that the order of the first and second electrochromic material is not limiting, as long as the electrically insulative material is positioned between the first and second electrochromic materials.

The method of making the second sheet further includes the deposition of a second layer of transparent conductive material, such as layer 414, upon and in electrical communication with the second layer of electrochromic material. The second layer of transparent conductive material may be formed from a transparent conductive oxide material. This transparent conductive material may comprise the same material, discussed above, as the first transparent conductive material.

The method further includes fusing together the first sheet 430 and the second sheet

431. The fusing process is dependent on the type of material chosen for the optically clear adhesive layer, for example, cross-linking, UV-curing etc., dependent upon the optically clear adhesive chosen.

After sheets 430 and 431 are fused together, a second ablation, such as ablation 416, is cut along the top edge of the lens opposite of ablation 415. The ablation removes material from the second transparent conductive layer and the electrochromic element but leaves the material from the first transparent conductive layer 412 unablated. This ablation is used as the contact point for a second busbar (not illustrated) which will form the anode. The method of ablating is not limiting as long as the method does not cause the respective layers to bleed into one another, this will prevent premature shorting of the electrochromic stack and increase the durability of the device. Any suitable method for ablating, e.g., laser ablation, may be employed.

The final step in the method is the cutting of the sheet 510 (See FIG. 5a) into the desired lens shape. The cutting of the sheet may be by a mechanical cut or a laser cut. The method of cutting is not limiting, so long as the cutting process does not introduce bleeding of a layer into another layer which could introduce shorting across the unit. Any suitable method of cutting the sheet may be chosen. FIG. 5b illustrates a cross section of an envisioned final lens structure, comprising the optional interior substrate 517, the exterior substrate 511, the coupling layer 518, the first transparent conductive layer 512, the electrochromic element 513, and the second transparent conductive layer 514.

In some aspects of the present disclosure, the optional interior (second) substrate and the exterior (first) substrate may further comprise a functional coating. The functional coating may be a polarizing coating, a protective coating of polycarbonate, an anti-reflective coating an anti-fog coating, or any combination thereof.

Some embodiments include a lens for an eyewear apparatus. Generally, an eyewear apparatus comprises at least one lens as described above, a frame assembly, an optical sensor, metallic/metal strips, a power source, and a control unit, wherein the optical sensor power source and control unit are all in electrical communication with one another through the metallic/metal strips, housed within the frame assembly. There are many potential configurations for the eyewear apparatus. One potentially useful configuration is depicted in FIG. 7b. The eyewear assembly may comprise at least one lens, such as 710 (as described herein above for lens 510), and a frame assembly, such as assembly 720, which may comprise a first subframe, such as subframe 621, and a second subframe, such as subframe 622 (see FIGs. 6a and 6b). Referring to FIG. 7b, some aspects of the present disclosure can include an optical sensor, such as sensor 760, contained within the frame assembly. The optical sensor can be in electrical communication with the first and second busbars (such as busbars 740 and 741, respectively), via a first and second metal/metallic wire/strips (such as 761 and 762, respectively) which run through a channel encased within either the first or second subframe assembly of the frame assembly (not illustrated). In some embodiments, the frame assembly can further comprise a first and a second hingeably attached temple assembly, such as assembly 750. Either the first or the second temple assembly may house a control unit, such as control unit 765, a power supply, such as power supply 766, a charging/communication port, such as port 767, and an optional on/off switch, such as switch 768. The control unit and the power supply are connected and in electrical communication via the metal/metallic strips. In embodiments wherein the eyewear assembly does not comprise hingeably attached temple assemblies, the control unit, power supply and the charging port may be housed within the main frame assembly.

In some embodiments, the first subframe housing (see FIGs. 6a & 6b) 621 is configured to securely fasten (e.g., screws, riots, or the like) to the second subframe housing 622 so that the lens is mechanically clamped to the frame assembly 620. The frame assembly can comprise a full frame, semi-rimless or rimless (e.g. shield) structure. When frame assembly comprises a semi-rimless or rimless structure, the exposed edges of the lens may be sealed. In this way, the lens layers are protected from the environment. For example, the edge seal, such as edge seal 619, can form a barrier against water, moisture, dust, etc. When the lens is incorporated into a full frame, the use of an edge seal may not be needed because the frame itself acts as the seal for the peripheral edge of the lens. In some embodiments, the first and second sub-frames are configured to securely fasten so that the lens is mechanically clamped into the frame assembly. Further, first and second sub-frame housings may include additional design elements that can improve the rigidity of the frame. In some embodiments, the optical sensor of FIG. 7b may be connected to a metal/metallic strip. The metal or a metal strip may comprise a wire bundle or wires of any material which are flexible and able to allow electrical communication across the substrate. The metal strips may include a metal or metal strip or a plurality of wires that provide electrical communication between the power supply, the control unit, the busbars, the electrochromic element (not illustrated), the optical sensor, the charging/communication port, and the optional on/off switch. Accordingly, the metal strips provide a circuit that allows the control unit to receive a signal from the optical sensor and provide a voltage to the electrochromic element through the first and the second busbars, and wherein the control unit is powered by the power supply. The control unit may be configured to deliver an electrical potential to the electrochromic element in response to an optical sensor potential that is generated by the optical sensor. In general, the control unit includes an amplifier, a voltage regulator, a microcontroller, and memory.

In some embodiments, as illustrated in FIG.8, the control unit allows for electrical potential applications only to achieve the desired % transmission (%T) of the electrochromic layer after which the potential ceases and the control unit reverts to a monitoring-only mode (monitoring the amount of ambient light levels via the optical sensor signaling), thus conserving power. It is envisioned that the %T desired by the wearer may first be set using an optional port which can serve a dual function as a charging port and a communication port for the control unit. In some embodiments, the power supply unit is a battery. In some examples, the battery may be rechargeable. In some embodiments, the power supply may be connected to a port. The charging port can be connected to an external power supply for charging of the power supply unit. In other embodiments, the power supply unit may be a piezoelectric unit, a photovoltaic, a triboelectric or any other suitable energy harvesting power source.

The embodiments described above are examples of the present embodiments and should not be considered limiting.

Embodiments

Embodiment 1. A lens for an eyewear apparatus comprising: An exterior substrate layer;

A first transparent conductive layer

An electrochromic layer; a first electrochromic material; an insulating layer; a second electrochromic material; and

A second transparent conductive layer; wherein the exterior substrate layer is distal to the wearer, Wherein the electrochromic layer comprises a layer of a first electrochromic material, a layer of insulating layer, and a layer of a second electrochromic material, wherein the first electrochromic material comprises a p-type or dope p-type electrochromic material, wherein the insulating layer comprises an electrically insulative material comprising a metal oxide and an inorganic compound, wherein the insulating layer comprises an electrically insulating material, wherein the second electrochromic material comprises a n-type electrochromic material, and wherein the electrochromic layer switches from a transparent state to a dark state in less than 5 seconds..

Embodiment 2. The lens for an eyewear apparatus of embodiment 1, wherein the metal oxide of the electrically insulative material is selected from zirconium oxide (ZrC ), hafnium oxide (HfC ), yttrium oxide (Y2O3) or barium titanate (BaTiOs).

Embodiment s. The lens for an eyewear apparatus of embodiment 1, wherein the inorganic material of the electrically insulative material is selected from aluminum oxide (AI2O3), silicon oxide (SiC>2), or titanium oxide (TiO2).

Embodiment 4. The lens for an eyewear apparatus of embodiments 1 to 3, wherein the electrically insulative materials has an atomic ratio of inorganic material to metal oxide is 1 to 20%.

Embodiment s. The lens for an eyewear apparatus of embodiment 1, further comprising an interior substrate layer.

Embodiment s. The lens for an eyewear apparatus of embodiment 1 or 2, further comprising a coupling layer. Embodiment 7. The lens for an eyewear apparatus of embodiment 3, wherein the coupling layer comprises an optically clear adhesive film, an epoxy, a UV-curable resin or another optically clear adhesive.

Embodiment 8. The lens for an eyewear apparatus of embodiment 1, wherein the lens forms a corrective lens.

Embodiment 9. The lens for an eyewear apparatus of embodiment 1, wherein the lens forms a non-corrective lens.

Embodiment 10. The lens for an eyewear apparatus of embodiment 1, wherein the substrate layer comprises a transparent polymer or glass.

Embodiment 11. The lens for an eyewear apparatus of embodiment 1, wherein the exterior substrate comprises an exterior lens.

Embodiment 12. The lens for an eyewear apparatus of embodiment 1, wherein the exterior substrate further comprises a functional coating,

Embodiment 13. The lens for an eyewear apparatus of embodiment 12, wherein the functional coating is a protective coating and/or a UV-blocking coating.

Embodiment 14. The lens for an eyewear apparatus of embodiment 5, wherein the interior substrate layer comprises an interior lens.

Embodiment 15. The lens for an eyewear apparatus of embodiment 5, wherein the interior substrate further comprises a functional coating,

Embodiment 16. The lens for an eyewear apparatus of embodiment 15, wherein the functional coating is an anti-reflective coating and/or an anti-fog coating.

Embodiment 17. The lens for an eyewear apparatus of embodiment 1, wherein the transparent conductive layers are transparent to visible light and are comprise of indium tin oxide (ITO), fluorine doped oxide (FTO) of aluminum zinc oxide (AZO).

Embodiment 18. The lens for an eyewear apparatus of embodiment 1, wherein the lens comprises a peripheral edge encompassing the entire lens.

Embodiment 19. A method for making a lens for an eyewear apparatus comprising:

A. Providing a sheet of substrate, the sheet of substrate forming an external substrate with a first surface and a second surface; B. Depositing a first layer of transparent conductive material on the first surface of the sheet of substrate;

C. Removing a port of the first layer of transparent conductive material from the sheet, the removed portion is relative to a corner of the lens which is on the top portion of the lens when worn by a person;

D. Depositing a first electrochromic material upon and in electrical communication with the first layer of transparent conductive material;

E. Depositing a layer of insulative material upon the layer of electrochromic material;

F. Depositing a layer of a second electrochromic material upon the layer of electrically insulative material;

G. Depositing a second layer of transparent conductive material upon and in electrical communication with the layer of second electrochromic material, wherein the second transparent conductive layer is between 20 and 400 nm thick;

H. Cutting the sheet into the desired lens shape, wherein the lens shape has an edge around the entire lens circumference;

I. Laser scribing around the entire outer circumference's edge of the cut lens from step H, for removal of a section of the second transparent conductive layer;

J. Laser ablate a port on the cut lens which on the top edge of the lens opposite of the port cut in step C;

K. Laser scribing the edge of the ablated port from step J;

Embodiment 20. The method for making a lens for an eyewear apparatus of embodiment 19, further comprising adding a second substrate material to the lens for an eyewear apparatus, wherein the second substrate material is bonded to the second transparent conductive layer with a coupling layer.

Embodiment 21. A method for making a lens for an eyewear apparatus comprising: a. Forming a first sheet comprising the steps of; i. Providing an external substrate sheet, wherein the external substate sheet comprise a first surface and a second surface; ii. Depositing a coupling layer onto the first surface of the external substrate sheet; b. Forming s second sheet comprising the steps of; i. Providing an internal substrate sheet, wherein the internal substate sheet comprises a first surface and a second surface; ii. Depositing a first layer of transparent conductive material to the first surface of the internal substrate sheet; iii. Depositing a first layer of electrochromic material upon and in electrical communication with the first transparent conductive material layer; iv. Depositing a layer of electrically insulative material upon the layer of electrochromic material; v. Depositing a layer of a second electrochromic material upon the layer of electrically insulative material; vi. Depositing a second layer of transparent conductive material upon and in electrical communication with the layer of second electrochromic material; vii. Ablating a first and a second section form second sheet, wherein the ablating removes material from the second transparent conductive material, the second electrochromic material, the electrically insulative material and the first electrochromic material; c. Combining the first (a) sheet and the second (b) sheet, wherein the coupling layer of the first sheet is in physical contact with the second transparent conductive material of the second sheet; d. Fusing the first (a) sheet and the second (b) sheet together to form a final lens sheet; and e. Cutting the desired lens shape (d).

Embodiment 22. The method for making a lens for an eyewear apparatus of embodiment 21, wherein the first substrate material can further comprise a functional coating.

Embodiment 23. : The method for making a lens for an eyewear apparatus of embodiment 21, wherein the second substrate material can further comprise a functional coating. Embodiment 24. The method for making a lens for an eyewear apparatus of embodiment 21, wherein lens can be a prescription lens.

Embodiment 25. The method for making a lens for an eyewear apparatus of embodiment 21, wherein

Embodiment 26. The method for making a lens for an eyewear apparatus of embodiment 21, wherein the coupling layer comprises a clear adhesive film.

Embodiment 27. An eyewear assembly comprising:

The lens of embodiments 1-20; and

A frame assembly comprising a subframe assembly with at least a first and a second subframe, wherein the subframe assembly cover at least a portion of the peripheral edge located about the top surface of the lens edge, including the ablation cutout and the first and second busbars.

Embodiment 28. The eyewear assembly of embodiment 27, further comprising an edge sealing material, wherein the edge sealing material seals the outer edge of the lens which is not enclosed within the subframe assembly.

Embodiment 29. The eyewear assembly of embodiment 27, wherein the subframe assembly further comprises a first and second hingeably attached temple assemblies.

Embodiment 30. The eyewear assembly of embodiment 27, wherein the subframe assembly comprises an optical sensor and metallic strips running through a portion of the either the first or second subframe, and wherein the metallic strips attach to the optical sensor and the first and second busbars, and wherein the optical sensor and the first and second busbars are in electrical communication.

Embodiment 31. The eyewear assembly of embodiment 27-30, wherein one of the first or second temple assemblies house a control unit and a power source.

Embodiment 32. The eyewear assembly of embodiment 27-31, wherein the control unit and power source are in electrical communication.

Embodiment 33. The eyewear assembly of embodiments 27-32, wherein the metallic strips run through the subframe assembly and at least the temple which houses the control unit and power source, and wherein the busbars, optical sensor, control unit and power source as all in electrical communication. Embodiment 34. The eyewear assembly of embodiments 27-33, wherein the power source further comprises a rechargeable battery.

Embodiment 35. The eyewear assembly of embodiment 27-34, wherein the at least one temple assembly with the power source, further comprises a port for connecting the rechargeable battery to a power supply for recharging.

EXAMPLES

It should be appreciated that the following Examples are for illustration purposes and are not intended to be construed as limiting the subject matter disclosed in this document to only the embodiments disclosed in these examples.

Preparing Electrochromic Lens EC-1

A pre-learned patterned ITO-glass substrate (first electrode) was loaded onto a hybrid sputtering/thermal vacuum deposition chamber (Angstrom Engineering, Inc.) with the based vacuum pressure less than 4 x IO ^-6 torr. First, a 100 nm layer of a AI(10%)-Ni-O, doped p-type, electrochromic layer was deposited from an Al-Ni target under a working gas of Ar-O?, where O2 concentration was set at 30% with a deposition rate of 2 A/s. Next, a 100 nm insulating layer of Zr-0 (100 nm) was deposited from a Zr target under a working gas of Ar-O?, where the O2 concentration was set at 15% with a deposition rate of 3 A/s. Next, a 400 nm layer of WO3-X (where x refers to an atomic ratio of oxygen to tungsten and x is between 0 < x<l), the n-type electrochromic layer was deposited from a W target under a working gas of Ar-Ch, where O2 concentration was set at 35% with a deposition rate of 3 A/s. Next, the ITO electrode (second electrode/cathode) was deposited at a deposition rate of 1.5 A/s. Electrical connections were connected between a power source (Tektronix, Inc., Beaverton, OR, USA, Kethley 2400 source meter) and switched electrical connections with the electrodes to enable selective application of potential to the first electrode (on) or to the bottom or second electrode (off). Post annealing was carried out at 300 °C for 30 minutes.

The devices of Comparative Example CE-1 was made in a manner similar to that described above with respect to the device of Example EC-1, except as indicated in Table 2 below. TABLE 2. Electrochromic Devices

Coloration Time Coloration time was measured as described in co-pending United States Provisional

Patent Application Number 63/067,192 and incorporated herein by reference in its entirety. Coloration times (c), the time required for an electrochromic device to darken from 90% transmittance to 10% transmittance was calculated by dividing time at 90% transparent (T _c iear) by time at 10% transparent (Tdark). The results are listed in Table 3 below. The coloration times forTciear to Tdarkas a function of time for the devices can be shown in the graphical representation. Where %T(norm) is calculated by ( _{dear state)} and plotted as a function of time. FIG. 9 illustrated the increase in coloration speed of device EC-1 (ZrO ₂ insulation layer).

Table 3. For the processes and/or methods disclosed, the functions performed in the processes and methods may be implemented in differing order, as may be indicated by context. Furthermore, the outlined steps and operations are only provided as examples, and some of the steps and operations may be optional, combined into fewer steps and operations, or expanded into additional steps and operations.

This disclosure may sometimes illustrate different components contained within, or connected with, different other components. Such depicted architectures are merely examples, and many other architectures can be implemented which achieve the same or similar functionality.

The terms used in this disclosure, and in the appended claims (e.g., bodies of the appended claims) are generally intended as "open" terms (e.g., the term "including" should be interpreted as "including, but not limited to," the term "having" should be interpreted as "having at least," the term "includes" should be interpreted as "includes, but is not limited to," etc.). In addition, if a specific number of elements is introduced, this may be interpreted to mean at least the recited number, as may be indicated by context (e.g., the bare recitation of "two recitations," without other modifiers, means at least two recitations, or two or more recitations). As used in this disclosure, any disjunctive word and/or phrase presenting two or more alternative terms should be understood to contemplate the possibilities of including one of the terms, either of the terms, or both terms. For example, the phrase "A or B" will be understood to include the possibilities of "A" or "B" or "A and B."

The terms and words used are not limited to the bibliographical meanings but are merely used to enable a clear and consistent understanding of the disclosure. It is to be understood that the singular forms "a," "an," and "the" include plural referents unless the context clearly dictates otherwise. Thus, for example, reference to "a component surface" includes reference to one or more of such surfaces.

By the term "substantially" it is meant that the recited characteristic, parameter, or value need not be achieved exactly, but that deviations or variations, including for example, tolerances, measurement error, measurement accuracy limitations and other suitable factors, may occur in amounts that do not preclude the effect the characteristic was intended to provide.

Aspects of the present disclosure may be embodied in other forms without departing from its spirit or essential characteristics. The described aspects are to be considered in all respects illustrative and not restrictive. The claimed subject matter is indicated by the appended claims rather than by the foregoing description. All changes, which come within the meaning and range of equivalency of the claims, are to be embraced within their scope.