Title:
SEMICONDUCTOR PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/207332
Kind Code:
A1
Abstract:
The present application relates to a semiconductor processing device. In one embodiment of the present application, the semiconductor processing device comprises a process chamber, a vaporization device and a gas pipe. The vaporization device is used for vaporizing a liquid reaction source substance entering the vaporization device via a first pipe. The gas pipe is coupled between the vaporization device and the process chamber and is used for conveying to the process chamber a vaporized reaction source substance generated by the vaporization device.
Inventors:
ZHANG GE (CN)
Application Number:
PCT/CN2023/079561
Publication Date:
November 02, 2023
Filing Date:
March 03, 2023
Export Citation:
Assignee:
PIOTECH INC (CN)
International Classes:
C23C16/448
Domestic Patent References:
| WO2022026271A1 | 2022-02-03 |
Foreign References:
| US6204204B1 | 2001-03-20 | |||
| CN101143873A | 2008-03-19 | |||
| CN103688339A | 2014-03-26 |
Attorney, Agent or Firm:
LEE AND LI - LEAVEN IPR AGENCY LTD. (CN)
Download PDF: