Title:
RESIST UNDERLAYER FILM-FORMING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2024/075733
Kind Code:
A1
Abstract:
[Problem] The purpose of the present invention is to provide a resist underlayer film-forming composition that can further improve properties of a resist underlayer film, such as curing properties, heat resistance, etching resistance, planarization properties and embedding properties. [Solution] Provided is a resist underlayer film-forming composition characterized by containing a solvent and a novolac resin containing a side chain having a structure represented by formula (D). In formula (D), Ar2 is an aromatic ring. Formula (D): -O-Ar2. The novolac resin contains a conjugated unit structure A-B represented by formula (AB). A unit structure A contains a phenol unit structure and/or an amine unit structure.
Inventors:
TOKUNAGA HIKARU (JP)
Application Number:
PCT/JP2023/036072
Publication Date:
April 11, 2024
Filing Date:
October 03, 2023
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G03F7/11; C08G10/04
Domestic Patent References:
| WO2021172295A1 | 2021-09-02 | |||
| WO2022270484A1 | 2022-12-29 | |||
| WO2023048021A1 | 2023-03-30 |
Foreign References:
| JP2020148891A | 2020-09-17 | |||
| JP2019218336A | 2019-12-26 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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