PROCESSING FLUID SUPPLY DEVICE, SUBSTRATE PROCESSING DEVICE, PROCESSING FLUID SUPPLY METHOD, SUBSTRATE PROCESSING METHOD, PROCESSING FLUID PROCESSING DEVICE, AND PROCESSING FLUID PROCESSING METHOD

WIPO Patent Application WO/2014/050941

A1

A processing fluid supply device (100) is a processing fluid supply device (100) for discharging processing fluid from a discharge opening (53) and supplying this processing liquid to an article (W) being processed. The device includes: a first pipe (51) that is a first pipe (51) within which processing fluid can flow and the inside thereof is connected to the discharge opening (53); and an x-ray irradiation means (62) that irradiates the processing fluid present within the first pipe (51) with x-rays. The first pipe (53) has an opening (52) in the pipe wall thereof, and the opening (52) is closed with a window member (71) formed using materials through which x-rays can pass. The x-ray irradiation means (62) irradiates x-rays through the window member (71) into the processing fluid present within the first pipe (51).

MIYAGI MASAHIRO (JP)
ARAKI HIROYUKI (JP)
SUZUKI MASANORI (JP)
SATO TOMOKATSU (JP)
KAWASE NOBUO (JP)

PCT/JP2013/076006

April 03, 2014

September 26, 2013

Click for automatic bibliography generation  

DAINIPPON SCREEN MFG (JP)

H01L21/304; B01J4/00; B05C11/08; B05C11/10; B08B3/02; G21K5/00; G21K5/02; G21K5/10; H05F1/00; H05F3/06

JP2002184660A	2002-06-28
JP2000277476A	2000-10-06
JP2012084437A	2012-04-26
JP2006162535A	2006-06-22
JPH06313800A	1994-11-08
JPH1190302A	1999-04-06
JPS6047400A	1985-03-14
JP2001334219A	2001-12-04
JP2012094659A	2012-05-17
JPH10254146A	1998-09-25
JP2011181795A	2011-09-15
JP2002203783A	2002-07-19
JP2007018769A	2007-01-25
JPH11214341A	1999-08-06
JP2001332398A	2001-11-30

INAOKA, Kosaku et al. (JP)
Kosaku Inaoka (JP)

View/Download PDF      PDF Help

Previous Patent: GENERATOR

Next Patent: SWEET COMPOSITION