Title:
PROCESS FOR ISOTHERMAL DIAMOND ANNEALING FOR STRESS RELAXATION AND OPTICAL ENHANCEMENT BY RADIATIVE HEATING
Document Type and Number:
WIPO Patent Application WO/2023/219953
Kind Code:
A3
Abstract:
A method anneals one or more diamonds. The method provides a furnace having a chamber with a heating element configured to radiatively heat a diamond. The diamond is positioned within the chamber, and levels of gas within the chamber are modulated to achieve a prescribed pressure. The diamond is heated to a prescribed temperature using a given heating ramp rate. The given heating ramp rate is greater than about 60 °C per minute and less than about 800 °C per minute. The prescribed temperature is greater than about 1,350 °C and less than about 2,200 °C. The prescribed pressure is greater than 1×10^-9 Torr and less than about 550 Torr.
Inventors:
CIRALDO JOHN P (US)
BLACKKETTER JOSHUA (US)
REMY JEAN-CLAUDE (US)
LEVINE-MILES JONATHAN (US)
BLACKKETTER JOSHUA (US)
REMY JEAN-CLAUDE (US)
LEVINE-MILES JONATHAN (US)
Application Number:
PCT/US2023/021362
Publication Date:
January 25, 2024
Filing Date:
May 08, 2023
Export Citation:
Assignee:
M7D CORP (US)
International Classes:
C30B33/02; C30B29/04; C30B25/10
Domestic Patent References:
| WO2010149775A1 | 2010-12-29 |
Foreign References:
| US20090110626A1 | 2009-04-30 | |||
| US20140103031A1 | 2014-04-17 | |||
| US5451430A | 1995-09-19 | |||
| US20100326135A1 | 2010-12-30 | |||
| US20040093904A1 | 2004-05-20 |
Attorney, Agent or Firm:
FILANDRIANOS, Emmanuel D. et al. (US)
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