Title:
POLYSILICON RESISTOR AND MANUFACTURING METHOD THEREFOR, AND SUCCESSIVE APPROXIMATION ANALOG-TO-DIGITAL CONVERTER
Document Type and Number:
WIPO Patent Application WO/2022/262061
Kind Code:
A1
Abstract:
A polysilicon resistor and a manufacturing method therefor, and a successive approximation analog-to-digital converter. When a polysilicon resistor is formed, the features of silicon-on-insulator processing are used to divide an upper silicon substrate layer of a silicon-on-insulator substrate into individual insulatedly isolated substrate isolation regions, and a silicon oxide layer and a polysilicon resistance layer are sequentially formed on the upper silicon substrate layer; the polysilicon resistor layer is divided into a plurality of polysilicon resistor blocks, and the plurality of polysilicon resistor blocks are arranged on the plurality of substrate isolation regions in one-to-one correspondence, so that the potentials of the substrate isolation regions closely follow the potentials of the polysilicon resistor blocks, and thus a strong electrical field cannot be formed between the polysilicon resistor blocks and the underlying substrate isolation regions, thereby eliminating the carrier edge clustering effect on the polysilicon resistor. When the polysilicon resistor is applied to a front-end resistor voltage division network of a successive approximation analog-to-digital converter, the linearity of the resistance voltage division network can be effectively improved, and the integral nonlinearity of the successive approximation analog-to-digital converter is reduced.
Inventors:
HU RONGBIN (CN)
ZHU CAN (CN)
WANG JIANAN (CN)
CHEN GUANGBING (CN)
FU DONGBING (CN)
ZHANG ZHENGPING (CN)
YU ZHOU (CN)
YANG ZHIMEI (CN)
GONG MIN (CN)
ZHU CAN (CN)
WANG JIANAN (CN)
CHEN GUANGBING (CN)
FU DONGBING (CN)
ZHANG ZHENGPING (CN)
YU ZHOU (CN)
YANG ZHIMEI (CN)
GONG MIN (CN)
Application Number:
PCT/CN2021/107427
Publication Date:
December 22, 2022
Filing Date:
July 20, 2021
Export Citation:
Assignee:
CHONGQING GIGACHIP TECH CO LTD (CN)
International Classes:
H01L49/02
Foreign References:
| CN109786216A | 2019-05-21 | |||
| CN110729402A | 2020-01-24 | |||
| CN112864321A | 2021-05-28 | |||
| US20080185678A1 | 2008-08-07 |
Attorney, Agent or Firm:
JZMC PATENT AND TRADEMARK LAW OFFICE (GENERAL PARTNERSHIP) (CN)
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