Title:
PLASMA TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/013383
Kind Code:
A1
Abstract:
This plasma treatment device generates plasma with suppressed electrostatic coupling components inside a vacuum container. A plasma treatment device (1) comprises a vacuum container (2), an antenna (7) generating a high-frequency magnetic field, and a magnetic field introduction window (3) introducing the high-frequency magnetic field into the vacuum container (2). The magnetic field introduction window (3) includes a metal plate (4) on which a plurality of slits (41) are formed, and a dielectric plate (5) overlaid on the metal plate (4) to cover the plurality of slits (41) and on which a metal layer (6) is formed, the metal layer (6) being maintained at a predetermined potential.
Inventors:
MATSUO DAISUKE (JP)
ANDO YASUNORI (JP)
ANDO YASUNORI (JP)
Application Number:
PCT/JP2022/027816
Publication Date:
February 09, 2023
Filing Date:
July 15, 2022
Export Citation:
Assignee:
NISSIN ELECTRIC CO LTD (JP)
International Classes:
H05H1/46; C23C16/505; H01L21/3065; H01L21/31
Foreign References:
| JP2021012861A | 2021-02-04 | |||
| JP2008109155A | 2008-05-08 | |||
| JP2004153209A | 2004-05-27 | |||
| JP2010251064A | 2010-11-04 |
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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