PLASMA-RESISTANT GLASS, INNER CHAMBER COMPONENT FOR SEMICONDUCTOR MANUFACTURING PROCESS, AND METHODS FOR MANUFACTURING GLASS AND COMPONENT

WIPO Patent Application WO/2024/080530

A1

The present invention relates to a plasma-resistant glass, an inner chamber component for a semiconductor manufacturing process, and methods for manufacturing the glass and the component, and specifically, to a plasma-resistant glass, an inner chamber component for a semiconductor manufacturing process, and methods for manufacturing the glass and the component, wherein the contents of plasma-resistant glass components in the plasma-resistant glass are adjusted to achieve a lower melting temperature, the thermal expansion coefficient of the plasma-resistant glass is reduced to prevent damage from thermal shock during high-temperature use, and the plasma-resistant glass has improved light transmittance and durability, as well as an appropriate dielectric constant.

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JEON SEO YEON (KR)
LEE KYUNG MIN (KR)
SEOK HYE WON (KR)
KIM DAE GEAN (KR)

PCT/KR2023/012281

April 18, 2024

August 18, 2023

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HANSOL IONES CO LTD (KR)

C03C3/087; C03B11/12; C03C3/062; C03C4/00; H01J37/32; H01L21/67

KR20180080429A	2018-07-12
KR20220047136A	2022-04-15
KR20080085087A	2008-09-22
KR20110009862A	2011-01-31
EP1180835A2	2002-02-20

IPCJ PATENT & LAW FIRM (KR)

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