Title:
PLASMA DEVICE FOR POWDER SURFACE TREATMENT USING HORIZONTAL ELECTRODES
Document Type and Number:
WIPO Patent Application WO/2023/229313
Kind Code:
A1
Abstract:
A plasma device for powder surface treatment using horizontal electrodes, according to the present invention, is advantageous in that, by placing powder on flat plate-shaped horizontal electrodes arranged in the horizontal direction and treating same with plasma, there is almost no loss of powder, and more rapid and uniform surface treatment is possible. It is also advantageous in that, by applying vibration to the horizontal electrodes during plasma treatment to give the effect of tapping the horizontal electrodes, the position of powder located relatively closer to the surface of the horizontal electrodes and the position of powder located further away therefrom are repeatedly changed, thereby enabling more uniform surface treatment of powder. In addition, by vertically stacking a plurality of horizontal electrodes, the volume that can be treated at one time is adjustable.
Inventors:
LEE DEUK YEON (KR)
LEE CHANG YOUNG (KR)
LEE JA EUN (KR)
HAN YEON BI (KR)
LEE CHANG YOUNG (KR)
LEE JA EUN (KR)
HAN YEON BI (KR)
Application Number:
PCT/KR2023/006908
Publication Date:
November 30, 2023
Filing Date:
May 22, 2023
Export Citation:
Assignee:
INOPLAZTECH CO LTD (KR)
International Classes:
B01J19/08; B01J2/18; B01J19/10; H05H1/46
Foreign References:
| KR102196481B1 | 2020-12-29 | |||
| JP6270032B2 | 2018-01-31 | |||
| JP6994241B2 | 2022-01-14 | |||
| JP4812404B2 | 2011-11-09 | |||
| KR20090068005A | 2009-06-25 | |||
| JP2007220486A | 2007-08-30 | |||
| JP2018052788A | 2018-04-05 | |||
| KR102465656B1 | 2022-11-11 |
Attorney, Agent or Firm:
JEON, Yong Joon (KR)
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