Title:
PHOTORESIST FILTER SERVICE CYCLE MONITORING METHOD AND SYSTEM, AND PHOTORESIST SUPPLY SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/019783
Kind Code:
A1
Abstract:
The present application discloses a photoresist filter service cycle monitoring method and system, and a photoresist supply system. The monitoring method comprises: providing a photoresist filter, the photoresist filter trapping a particulate matter in a photoresist to filter the photoresist; running the photoresist filter; acquiring a filtering state of the photoresist filter, and determining whether the filtering state reaches a preset first threshold; if not, returning to continue running the photoresist filter; if yes, acquiring a state of the particulate matter in the photoresist filter; determining whether the state of the particulate matter reaches a preset second threshold; if not, returning to continue running the photoresist filter; and if yes, stopping running the photoresist filter, and capturing a current filtering state of the photoresist filter as a service cycle of the photoresist filter. The monitoring method of the present application is simple in process, and can accurately detect the service cycle of the filter.
Inventors:
LI YULING (CN)
Application Number:
PCT/CN2021/131988
Publication Date:
February 23, 2023
Filing Date:
November 22, 2021
Export Citation:
Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G01D21/00; B01D35/00; G03F7/16
Foreign References:
| CN208984111U | 2019-06-14 | |||
| JP2003315461A | 2003-11-06 | |||
| CN101271276A | 2008-09-24 | |||
| TW422719B | 2001-02-21 |
Attorney, Agent or Firm:
BEIJING LINKAW PATENT ATTORNEY LAW FIRM (CN)
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