FIELD OF THE INVENTION

The invention relates to a photoreactor assembly comprising a radiation generating device and a beam steering device. The invention further relates to a method for treating a fluid with device radiation.

BACKGROUND OF THE INVENTION

Photoreactor assemblies are known in the art. For instance,

US20100247401A1 describes a device for performing radiation assisted chemical processing including a fluid path, defined at least in part by a first surface of a wall transparent to radiation useful for performing radiation assisted chemical processing, and a gas discharge or plasma chamber arranged for producing the radiation, wherein the chamber is defined at least in part by a second surface of the transparent wall, opposite the first. It further describes a related method of forming a photocatalytic reactor comprising among other steps the step of wash-coating the fluid path so as to deposit a photocatalytic material therein, wherein the step of wash-coating includes depositing, and not depositing or removing photocatalytic material, respectively, on a first portion or from a second portion of the of non-circular cross section of the path, the second portion including at least some of the first surface of the wall of transparent material.

SUMMARY OF THE INVENTION

Photochemical processing or photochemistry relates to the chemical effect of light. More in general photochemistry refers to a (chemical) reaction caused by absorption of light, especially ultraviolet light (radiation), visible light (radiation) and/or infrared radiation (light). Photochemistry may for instance be used to synthesize specific products. For instance, isomerization reactions or radical reactions may be initiated by light. Other naturally occurring processes that are induced by light are, e.g., photosynthesis, or the formation of vitamin D with sunlight. Photochemistry may further, e.g., be used to degrade/oxidize pollutants in water or e.g. air. Photochemical reactions may be carried out in a photochemical reactor or “photoreactor”. One of the benefits of photochemistry is that reactions can be performed at lower temperatures than conventional thermal chemistry and partly for that reason thermal side reactions that generate unwanted by-products are avoided.

Furthermore, commonly used light sources in photochemistry may include low or medium pressure mercury lamps or fluorescent lamps. Alternatively, Light Emitting Diodes (LEDs), may be used for light sources for photochemistry. LEDs may provide higher fluxes from smaller surfaces compared to, e.g., mercury pressure lamps or fluorescent lamps.

In photochemical reaction, a chemical reaction is initiated or enhanced by the absorption of energy in the form of radiation (light). When certain molecules absorb radiation, transient excited states can be formed, changing the chemical and physical properties with respect to those of the original molecules. These new chemical species can disintegrate, adapt to a new molecular structure, combine with each other or other molecules, or exchange electrons, hydrogen atoms, protons, or their electronic excitation energy to other molecules.

To enable or enhance these reactions, the used radiation preferably has some specific properties. In some cases, e.g., the wavelength is not important whereas in other cases the wavelength of the radiation should preferably be very defined or he within a specific range. It also can be the case that multiple specific wavelengths preferably are to be applied, which can have an influence on different steps during the photochemical reactions. Furthermore, in these reactions, in general, the applied flux levels of the radiation that are introduced to the chemical reactor preferably is maximized to maximize the output yield of the chemical reaction.

In photochemical reactors the radiation should be delivered to the chemical process/the molecules to react, e.g., present in a transparent reactor vessel or in a transparent micro fluidic reactor plate. In prior art solutions, the applied radiation may not fully or efficiently be used because it is not accurately delivered in or to e.g., the reaction fluid, gas or catalytic converter. Radiation may hit areas or pass through the reactor at locations where no fluidic channels or chemical reaction chambers or catalytic membranes etc. are present.

In presently applied photochemical reactors, the radiation engine may especially be a monolithic source, illuminating the full module as homogeneous as possible. However, it might be beneficial for some reactions to excite the present substances with one specific wavelength, in one particular part of the reactor, in order to complete one of the reactions steps, after which another (different) wavelength would be beneficial for the next reaction step. This would enable a very efficient way of utilizing one reactor, to increase the yield, and it could suppress the formation of unwanted by-products.

Hence, there may be a need for exact radiation delivery, at the optimal position at the most beneficial time. This may further improve the reaction process. This may for instance have a great effect when fluidic module flow reactors are being used that comprise of a transparent matrix in which fluidic channels and, e.g., reaction chambers are present.

Hence, it is an aspect of the invention to provide an alternative photoreactor assembly, which preferably further at least partly obviates one or more of above-described drawbacks. Additionally or alternatively, it is an aspect of the invention to provide an alternative method for treating a fluid with device radiation, which preferably further at least partly obviates one or more of the above-described drawbacks.

The present invention may have as object to overcome or ameliorate at least one of the disadvantages of the prior art, or to provide a useful alternative.

Hence, in a first aspect, the invention provides a photoreactor assembly (also “reactor assembly” or “assembly”). The photoreactor assembly may in embodiments comprise a radiation generating device. The photoreactor assembly may in further embodiments comprise a beam steering device. The photoreactor assembly may in embodiments comprise a fluidic reactor (also: “reactor”). In further embodiments, the photoreactor assembly may further comprise a control system. Additionally or alternatively, the photoreactor assembly may functionally be coupled to a control system. Especially, in specific embodiments, the photoreactor assembly comprises the fluidic reactor, the radiation generating device, the beam steering device, and the control system. The radiation generating device is configured to generate device radiation. In embodiments, the device radiation may comprise UV radiation. In further embodiments, the device radiation may (also) comprise visible radiation. In yet further embodiments, the device radiation may (also) comprise IR radiation. In specific embodiments, the radiation generating device is configured to generate device radiation, wherein the device radiation comprises one or more of UV radiation, visible radiation, and IR radiation. Further, the radiation generating device may in embodiments comprise a solid state light source, e.g., one or more of a laser diode and a superluminescent diode. The radiation generating device may in further embodiments comprise an excimer lamp (or “excilamp”). In embodiments, the solid state light source comprises a laser diode. In further embodiments the solid state light source (further) comprises a superluminescent diode. Further, especially, the fluidic reactor may comprise a fluidic system for hosting a fluid (also: “reactor fluid”). The fluidic system may in further embodiments be configured for the (reactor) fluid comprising one or more liquids. The (reactor) fluid may especially comprise one or more gases. In yet further embodiments, the fluid may comprise a mixture of gas(es) and liquid(s). In further specific embodiments the fluidic system comprises one or more reactor channels and/or one or more reactor cavities. In embodiments, the fluidic system comprises one or more reactor channels. In further embodiments, the fluidic system comprises one or more reactor cavities. In specific embodiments, the fluidic system may comprise one or more reactor channels (“channels”) and one or more reactor cavities (“cavities”). The reactor may in embodiments comprise a single reactor channel and optionally one or more reactor cavities. The reactor may in further embodiments comprise a plurality of reactor channels and optionally one or more reactor cavities. The reactor may in embodiments (only) comprise one or more reactor channels (and no cavities). The one or more cavities may in further embodiments be fluidly connected to (the) one (or more of the) reactor channel(s). Yet, in other embodiments, the reactor (only) comprises one or more reactor cavities (and no reactor channel(s)). In specific embodiments, (the fluid system is configured such that) the fluid may flow through the fluid system, especially through the reactor channel. The reactor may comprise one or more reactor walls. Especially, at least (part of) one of the one or more reactor walls is radiation transmissive, especially radiation transmissive for the device radiation. The fluidic system may in embodiments at least partly be defined by a radiation transmissive reactor wall. In embodiments (at least part of the) the radiation transmissive reactor wall is radiation transmissive for the device radiation. In further embodiments, the beam steering device is configured in a radiation receiving relationship with the radiation generating device. The beam steering device is especially configured to provide in an operational mode (the) device radiation, especially a beam of device radiation (also: “device radiation beam” or “radiation beam”), to a (controlled) location of the fluidic system, especially to a (spatially) controlled location of the fluidic system. In further embodiments, the beam steering device may provide the beam of the device radiation temporarily to a first (spatially controlled) location of the fluid system and successively (especially sequentially) to one or more, especially to a plurality, further (spatially controlled) locations. The one or more further locations may comprise the first location. Moreover, the beam may in embodiments be provided one or more times to the same (spatially controlled) (further) location. The assembly is especially configured for radiating device radiation to one or more locations at the radiation transmissive reactor wall. In embodiments, the control system is configured to control the radiation generating device.

In further embodiments, the control system is configured to control the beam steering device. In further specific embodiments, the control system is configured to control the radiation generating device and the beam steering device.

Hence, the invention may allow providing radiation specifically at locations of the reactor assembly where a photochemical reaction takes place (or should take place). In embodiments active beam-steering enables directing the radiation to such specific location. The invention may allow to provide a predetermined amount of energy (radiation) to one or more controlled locations. In specific embodiments (see further below), properties of the radiation/beam may be controlled to further optimize the delivery of radiation to a specific location of the fluidic system (comprising specific molecules/reagents). In such photoreactor, controlled radiation may be delivery at an optimal location and especially at a desired time and desired duration. The reactor may enable spatiotemporal irradiating fluid in the reactor. The controlled radiation may facilitate controlled reactions or reaction steps. This may improve the reaction process and efficiency and may, e.g., minimize the production of unwanted by-products.

The present reactor assembly may in embodiments allows to “follow” reagents throughout their travel through the reactor channel(s) and/or being present in the one or more cavities, while the radiation is substantially not provided to areas/regions of the fluidic system not comprising the fluid (during operation) or not in need of the radiation (at the specific moment).

Hence, in specific embodiments, the invention provides a photoreactor assembly comprising (i) a radiation generating device, (ii) a beam steering device, and (optionally) (iii) a control system (or wherein the assembly is configured to functionally couple to a control system), wherein (i) the radiation generating device is configured to generate device radiation, wherein the device radiation comprises one or more of UV radiation, visible radiation, and IR radiation, especially wherein the radiation generating device comprises a solid state light source comprising one or more of a laser diode and a superluminescent diode; (ii) the beam steering device is configured in a radiation receiving relationship with the radiation generating device and is configured to provide in an operational mode a beam of device radiation to a spatially controlled location of a fluidic system of a fluidic reactor (comprising the fluidic system) for hosting a fluid, wherein the fluidic system comprises one or more reactor channels and/or one or more reactor cavities, wherein the fluidic system is at least partly defined by a radiation transmissive reactor wall, wherein the radiation transmissive reactor wall is radiation transmissive for the device radiation; and (iii) the control system is configured to control the radiation generating device and the beam steering device.

In further specific embodiments, the invention provides a photoreactor assembly comprising (i) a fluidic reactor, (ii) a radiation generating device, (iii) a beam steering device, and (optionally) (iv) a control system (or wherein the assembly is configured to functionally couple to the control system), wherein (i) the radiation generating device is configured to generate device radiation, wherein the device radiation comprises one or more of UV radiation, visible radiation, and IR radiation, wherein the radiation generating device comprises a solid state light source comprising one or more of a laser diode and a superluminescent diode; (ii) the fluidic reactor comprises a fluidic system for hosting a fluid, wherein the fluidic system comprises one or more reactor channels and/or one or more reactor cavities, wherein the fluidic system is at least partly defined by a radiation transmissive reactor wall, wherein the radiation transmissive reactor wall is radiation transmissive for the device radiation; (iii) the beam steering device is configured in a radiation receiving relationship with the radiation generating device and is configured to provide in an operational mode a beam of device radiation to a spatially controlled location of the fluidic system; and (iv) the control system is configured to control the radiation generating device and the beam steering device.

The term ’’spatially controlled” such as in a spatially controlled location especially refers to a (predetermined or controlled) location in a (3D) space, such as in an x- y-z space or an x-y space, e.g. a (predetermined) location in a 2D plane. The spatially controlled location is especially based on a (progress ol) a chemical reaction in the fluidic system, especially in the one or more reactor channels and/or the one or more reactor cavities. The spatially controlled location may in embodiments change over time. The term “spatially controlled” location may refer to a spatiotemporally controlled location.

Hence, the invention may provide a photoreactor assembly. The photoreactor assembly may be used for treating a (reactor) fluid with device radiation, such as in the method of the invention. The term “treating the fluid (with device radiation)”, and similar phrases, may especially relate to irradiating the fluid with the device radiation. The fluid especially comprises a photosensitive reactant or reagent (including photocatalyst and/or photosensitizer), especially sensitive to the device radiation (see below).

The term “(reactor) fluid” may relate to a plurality of (different) fluids. Further, the fluid may comprise a liquid and/or a gas. Moreover, the fluid may in embodiments enter the reactor as a liquid and may in specific embodiments (partly) become gaseous when being heated in the reactor. The plurality of different fluids may be mixed and (configured to) provide a homogenous flow in the reactor during operations. In further embodiments the plurality of different fluids may be selected to provide a segmented flow in the reactor during operations. The plurality of fluids may further be selected for providing slug flow in the reactor during operations. The fluid may in embodiments be stagnant.

Hence, the fluid may have a liquid phase, a gaseous phase or a combination of liquid and gaseous phases. The fluid may comprise a mix of different fluids. The fluid may in embodiments comprise a homogenous mixture of different fluids. In further embodiments, the fluid may comprise a heterogenous mixture of fluids.

In embodiments, a fluid reactor is comprised by the photoreactor assembly. Alternatively, the photoreactor assembly may be used in combination with a (further) fluid reactor. Furthermore, in further embodiments, the control system is comprised by the photoreactor assembly. In further embodiments, the photoreactor is configured to functionally couple to the control system.

The photoreactor assembly may in embodiments comprise a (fluidic) reactor.

The term “reactor” may especially relate to a (photo)chemical reactor. The term especially relates to an enclosed (reactor) chamber or a plurality of (reactor) chambers (such as a channel or a cavity) in which a (photochemical) reaction may take place. The reactor chamber(s) may especially have a reactor volume. In embodiments, the reactor may comprise one or more reactor walls defining the reactor chamber, especially enclosing the reactor chamber. Moreover, especially the fluidic reactor comprises the fluidic system for hosting the fluid. The fluidic system may comprise the one or more reactor channels and/or one or more reactor cavities. In embodiments, the fluidic system is at least partly defined by the radiation transmissive reactor wall. The fluid may in embodiments (be enabled to) flow through the one or more reactor channels. In further embodiments, the fluid may (be enabled to) be hosted in one or more of the one or more cavities. Further, the cavities may in embodiments be fluidly connected to one or more of the channels, and the fluid may e.g. be flown via the channel to a cavity and successively leave the cavity again and further flow through the channel. The cavity may in embodiments be configured as a side (reaction) chamber of the channel. Herein the terms “channel” and “cavity” may in embodiments refer to one of the one or more channels and one of the one or more cavities, respectively.

Herein the term “hosting the fluid” such as in the phrase “the fluidic system is configured for hosting the fluid”, may in embodiments (also) include moving of the fluid, e.g., when the fluid is hosted by the fluidic system, the fluid may flow in embodiments through the fluidic system.

The reactor assembly may further comprise a radiation generating device. The term “radiation generating device” may herein especially refer to a device for generating one or more of UV radiation, visible radiation, and IR radiation. The term may relate to more than one (different) radiation generation devices.

The radiation generating device may in embodiments be configured for providing a (substantially) parallel beam of device radiation. In further specific embodiments, the radiation generating device may be configured for providing polarized device radiation. Especially, the device generation device may be configured for providing monochromatic device radiation. In specific embodiments, the device generating device is configured for providing device radiation comprising one or more of a (substantially) parallel beam (of the device radiation/light), polarized radiation (light), and monochromatic radiation (light).

The radiation generating device may comprise one or more radiation sources or light sources for (jointly) providing the device radiation. In embodiments, the radiation generating device comprises one or more solid state light sources. In embodiments, the radiation generating device (or “radiation device”) may (further) comprise an excimer lamp. The term ’’excimer lamp” may refer to more than one excimer lamps.

The terms “radiation source” and “light source” may be used interchangeably herein. The radiation source (light source) may in embodiments comprise one or more of a solid state light source, especially a laser diode and/or a superluminescent diode, and an excimer lamp. The light source may in further embodiments comprise a laser (system). The light source may especially comprise one or more light sources selected from the group consisting of a laser diode and a superluminescent diode. The laser especially comprises a solid state laser or a semiconductor laser. A semiconductor laser diode, may be very compact, and easy to integrate in the assembly, Further, a laser diode may easily be modulated to frequencies up to 2Ghz.

The radiation generating device may in embodiments comprise a laser diode.

In further embodiments, the radiation generating device may comprise a superluminescent diode. The radiation generating device, especially the solid state light source, may especially comprise one or more of a laser diode and a superluminescent diode. The radiation generating device may in embodiments comprise a plurality of solid state light sources. The radiation generating device may for instance comprise two (different) solid state light sources. A first solid state light sources may e.g. provide a first radiation comprising a first wavelength. A second (further) solid state light source may provide a second (further) radiation comprising a second (further) wavelength (different from the first wavelength). The radiation generating device may e.g. comprises two laser diodes, or two superluminescent diodes. The radiation generating device may in further embodiments comprise a mix of one or more laser diodes and one or more superluminescent diodes. In embodiments, the radiation generating device may comprise more than two solid state light sources and/or an excimer lamp.

Using such solid state light sources, low etendue radiation source radiation (light source light) may be provided, especially wherein substantially all of the radiation (beam) may be provided to the beam steering device.

Hence, in specific embodiments, the solid state light source comprises a laser (diode). Lasers may be modulated very fast and can be switched at very high frequencies. In embodiments of the invention different lasers may be applied at the same time/position (spatiotemporal location) applying wavelength multiplexing. Moreover, laser light is polarized, laser beams with the same color (or different colors as well) and different (perpendicular) polarization may in embodiments be combined/overlayed substantially completely. Laser light (radiation) may be focused into very small optical spots (such as having a width or diameter of less than 10 micrometer). In embodiments, optics may be used to provide the focused laser beam. Further, beam positioning accuracy of the beam steering device may in embodiments be extremely high (such as under 10 microns) while drifts over time are very small.

In further specific embodiments, the radiation source may be configured to provide radiation source radiation directly to the reactor. In embodiments a direct optical path may be configured from the radiation source to the reactor , and especially no beam steering device is configured in the direct optical path. In specific embodiments the radiation generating device is configured to provide device radiation to the reactor, wherein a beam of the device radiation is not directed to any beam steering device.

The radiation generating device (and/or radiation/light source) may especially be configured to generate device radiation (or radiation source radiation), especially device radiation (radiation source radiation) selected from one or more of UV radiation, visible radiation, and IR radiation.

Herein the terms “solid state light source”, “laser diode”, “superluminescent diode”, and “light (radiation) source” may in embodiments independently from each other refer to a plurality of (different) solid state light sources, laser diodes, superluminescent diodes, and “light (radiation) sources”, respectively.

The term “ UV radiation” is known to the person skilled in the art and relates to “ultraviolet radiation”, or “ultraviolet emission”, or “ultraviolet light”, especially having one or more wavelengths in the range of about 10-400 nm, or 10-380 nm. In embodiments, UV radiation may especially have one or more wavelength in the range of about 100-400 nm, or 100-380 nm. Moreover, the term “UV radiation” and similar terms may also refer to one or more of UVA, UVB, and UVC radiation. UVA radiation may especially refer to having one or more wavelengths in the range of about 315-400 nm. UVB radiation may especially refer to having one or more wavelengths in the range of about 280-315 nm. UVC radiation may further especially have one or more wavelengths in the range of about 100-280 nm. In embodiments, the radiation generating device/light sources may be configured to provide device radiation/radiation source radiation having wavelengths larger than about 190 nm.

The terms “visible”, “visible light”, “visible emission”, or “visible radiation” and similar terms refer to light having one or more wavelengths in the range of about 380- 780 nm.

The term “IR radiation” especially relates to “infrared radiation”, “ infrared emission”, or “infrared light”, especially having one or more wavelengths in the range of 780 nm to 1 mm. Moreover, the term “IR radiation” and similar terms may also refer to one or more of NIR, SWIR, MWIR, LWIR, FIR radiation. NIR may especially relate to Near- infrared radiation having one or more wavelength in the range of about 750-1400 nm, especially 780-1400 nm. SWIR may especially relate to Short- wavelength infrared having one or more wavelength in the range of about 1400-3000 nm. MWIR may especially relate to Mid- wavelength infrared having one or more wavelength in the range of about 3000-8000 nm. LWIR may especially relate to Long-wavelength infrared having one or more wavelength in the range of about 8-15 pm. FIR may especially relate to Far infrared having one or more wavelength in the range of about 15-1000 pm. Especially, in embodiments the term “IR radiation” may refer to radiation having one or more wavelength in the range of about 780-1400 nm.

In embodiments, the (solid state) light source may comprise a (respective) light emitting surface. The term “light emitting surface” may herein refer to the surface of the light source from which light (or radiation) source radiation is emitted. Especially, in embodiments the light emitting surface may be the (top) surface of a diode, such as an LED, a laser, or a superluminescent diode. In embodiments, the light emitting surface may be planar. In further embodiments, the light emitting surface may be curved, especially convex, or especially concave.

The term “light” may in embodiments refer to “radiation”. Further, the term “radiation” may in embodiments refer to “light”.

In embodiments, each radiation source may have an optical axis, wherein the radiation source emits essentially all of the radiation source radiation, such as at least 90% of the light source radiation, especially at least 95% of the radiation source radiation, such as at least 99% of the radiation source radiation, including 100%, at angles less than 120°, such as less than 100°, especially less than °90, from the optical axis.

In embodiments, each radiation source may have essentially Lambertian emission characteristics, i.e., the radiation source emits essentially all of the radiation source radiation at angles less than 90° with respect to the optical axis.

Especially, the optical axis may be defined as an imaginary line that defines the (weighted average) path along which radiation propagates through the system starting from the radiation generating device, here especially the radiation source. Hence, the optical axis may especially coincide with a weighted average path of the emitted radiation source radiation. In general, the optical axis may coincide with the normal to a central position of the radiation emitting surface.

The beam steering device is especially configured in radiation receiving relationship with the radiation source(s) (in an operational mode). Further, especially, the radiation source(s) is (are) especially configured in radiation receiving relationship with the fluidic system (in the operational mode).

The beam steering device may in embodiments enable a fast change in direction of the radiation/of the beam. In embodiments, a speed of the beam moving between locations may be over 10 m/s. In the assembly of the invention the movement between two spatially controlled locations may be significantly higher than a speed at which fluids may travel through the fluidic system. The fast beam steering device may allow beam switching and may for instance be used for radiating the reagents initially with a first specific wavelength and after a predetermined period, especially when the fluid has travelled along the reactor channel, a second wavelength may be applied to enable a next step in the reaction.

The radiation source is especially configured for providing the radiation source radiation, especially the device radiation, to the beam steering device (in an operational mode). Hence, in embodiments, the assembly especially comprises the beam steering device configured in a radiation receiving relationship with the radiation generating device. Further, especially in an operational mode, device radiation, especially a device radiation beam, may temporarily be provided to a (controlled) location of the fluid system, especially a spatially controlled location of the fluidic system. The device radiation (beam) may (temporarily) be provided to a fluid flowing through the one or more reactor channels (if present) and/or hosted by the one or more reactor cavities (if present). The device radiation (of the radiation beam) may be provided to and absorbed by substance/molecules (temporarily) located at the spatially controlled location (in the channel and/or cavity). Moreover, by (controlling and) changing the spatially controlled location over time, the device radiation beam may be provided to a (controlled) location of the fluidic system, wherein the (controlled) location is a spaciotemporal controlled location.

The beam steering device is especially configured to steer or direct radiation provided by the light source(s) (in an operational mode) to the fluidic system, especially to the spatially controlled location of the system. The beam steering device may for instance comprise a reflective element, e.g., a mirror or an element comprising a reflective surface, for directing the radiation towards the fluidic system. The mirror may be at least partly rotatable allowing to direct the radiation to a location of the fluidic system along an imaginary (one dimensional) line of the fluidic system. Using at least two (at least partly) rotatable mirrors may allow to steer the radiation towards a location of the fluidic system across an imaginary (two-dimensional) plane of the fluidic system, especially if an axis of rotation of a first mirror is configured at an angle with an axis of rotation of a further mirror. In further embodiments, a single mirror may be configured (at least partly) rotatable in three dimensions, e.g. around two axes of rotations or a (single) point or rotation. Hence, in embodiments, the mirror may rotatable over one (imaginary) axis of rotation and/or over two (imaginary) axes of rotation. The term “mirror” may in embodiments refer to a plurality of (different) mirrors. The term may further in embodiments refer to a specular mirror and to a diffuse mirror.

The beam steering device may in further embodiments comprise a transmissive element (transmissive for the device radiation, especially the radiation source radiation). The transmissive element may comprise one or more faces that may in embodiments reflect (device) radiation. In further embodiments, radiation may pass the face and travel through the transmissive element. The beam steering device may comprise a reflective element and a transmissive element. In embodiments a (further) face of the transmissive element comprises a reflective element. A radiation path (or optical path) may e.g. in embodiments be configured such that the radiation travels through the transmissive element to the reflective element and via de reflective element again through the transmissive element. Additionally or alternatively, the beam steering device may comprise a refractive element.

The term “at least partly” in relation with rotating elements, such as an at least partly rotating mirror, especially refers to a mirror that may rotate at least a few degrees around the axis of rotation of the mirror. Such element is especially not statically fixed and may rotate over more than zero degrees, over the axis of rotation, such as over at least 5°, especially over at least 15°, even more at least 30°, such as at least 45°, or at least 60°, or even at least 90°. Especially, such element may rotate (over the axis of rotation) over more than 90°, such as at least 180°, or in embodiments at least 270° or almost 360°. Such element may further especially rotate in two directions of rotation. In embodiments, a rotating element may rotate over more than 360°. In further embodiments the element may rotate, especially in two (opposite) directions, over less than 45°, such as less than 25° (in both directions).

Furthermore, when omitting the phrase “at least partly” in relation to rotating and the like, this does not necessarily imply that the rotation may be 360° or more. For instance, the term “a rotatable element”, and terms like that may refer to an at least partly rotatable element. The (at least partly) rotatable element may especially be rotated between a first position and one or more further positions. Based on the first position, the beam steering device may steer the beam (of radiation) to a first location of the fluidic system, and based on the one or more further positions, the beam steering device may steer the beam (of radiation) to one or more further locations of the fluidic system (in an operational mode).

Herein, configurations of elements of the assembly may especially be explained for applying in an operating mode. Phrases such as “in an operational mode” may have been omitted in the description. However, it will be understood by the skilled person, that especially if configurations relating to traveling of radiation, modulation of radiation, steering of radiation, dynamic elements, etc. are explained, such configuration may refer to configurations during operation, especially in an operational mode.

The beam steering device may thus especially comprise an at least partly rotatable element. The at least partly rotatable element especially comprises one or more of a reflective element and a transmissive element. Further, especially the control system is configured to control a rotation of the rotatable element, especially around an axis of rotation (of the rotatable element). In further embodiments, the beam steering device comprises (at least) two (at least partly) rotatable elements. The axis of rotation of the two rotatable elements may define a non-zero angle. Such angle may in embodiments be about 90°. Yet, other angles are possible as well. Especially the angles may be selected to allow steering the beam over a large part of a total area of the fluidic system. Such as over at least 75%, especially over at least 98%, such as substantially 100%. Especially the rotatable elements are configured such that radiation source radiation provided to the first mirror is directed to the second rotatable element and optionally via further rotating elements steered to (the spatially controlled location ol) the fluidic system. In embodiments, the beam steering device comprises a galvo- scanner comprising the rotatable elements. Galvo-scanners are known to the skilled person and may also be referred to as galvanometer (optical) scanners, or, e.g., galvos. A galvo- scanner may especially enable fast beam movement, a fast jumping speed, may allow precise positioning. Further, especially in combination with an f-theta lens (see below) a galvo- scanner may provide a constant focal point across a large area, especially across substantially the full fluidic system. Yet also other beam-steering devices, e.g. comprising rotating mirrors or octagons etc. might be used.

In embodiments the beam steering device comprises a galvo-scanner, wherein the galvo-scanner comprises two at least partly rotatable elements.

It may in embodiments be desirable to focus a beam of the device radiation provided by the steering device to the fluidic system. This may for instance be true if the beam being provided to the reactor channel also is provided to a location adjacent to the channel. This may, e.g., further be desirable to focus energy provided by the beam.

Therefore, the assembly may comprise focus optics, such as a lens. The lens may comprise a spherical lens. A spherical lens may especially be used for a fluidic reactor comprising a concave plane (focusing the lens). In embodiments, the fluidic reactor comprises a concave plane. In further embodiments, the fluidic reactor comprises a substantially flat plane (see also below). For focusing the beam of device radiation, the focusing optics may especially comprise an F-q lens. The F-q lens (f-theta lens) may allow rather precise focusing the beam over a two-dimensional plane. In embodiments, the galvo is combined with an f-theta lens, especially enabling a constant focal point throughout an entire scanning area. Using an f-theta lens may in embodiments focus (the cross section ol) the beam down to less than 10 microns. Standard lenses may in embodiments be used to focus the device radiation on a spherical surface (in contrast to a flat or plane field). An f-theta lens may provide a plane focusing surface and an almost constant spot size over the entire two-dimensional flat plane. A position of the spot on the plane is directly proportional to the scan angle (Q). Especially, a spot height created by such lenses is linearly proportional to the focal length (1) and the scanning angle (Q).

Hence, in further embodiments, the photoreactor assembly further comprises focusing optics configured downstream of the beam steering device and upstream of the fluidic reactor.

The terms “upstream” and “downstream”, such as in the context of propagation of light, may especially relate to an arrangement of items or features relative to the propagation of the light from a light generating element (here the especially the light generating device), wherein relative to a first position within a beam of light from the light generating element, a second position in the beam of light closer to the light generating element (than the first position) is “upstream”, and a third position within the beam of light further away from the light generating element (than the first position) is “downstream”. For instance, instead of the term “light generating element” also the term “light generating means” may be applied.

The term “optical path” may relate to an imaginary path or track along which radiation or light may propagate (or propagates). The optical path may have an upstream end, especially a location where radiation/light is generated. The optical path may have a downstream side, especially where the radiation/light is “used”; in embodiments, e.g., comprising the reactor. In further embodiments, at least part of the radiation may be transmitted through the reactor and e.g. the optical path may continue. The optical path may in embodiments be infinitely long and especially have no downstream end.

The terms "radiationally coupled" or “optically coupled” may especially mean that (i) a light generating element, such as a light source, and (ii) another item or material, are associated with each other so that at least part of the radiation emitted by the light generating element is received by the item or material. In other words, the item or material is configured in a light-receiving relationship with the light generating element. At least part of the radiation of the light generating element will be received by the item or material. This may in embodiments be directly, such as the item or material in physical contact with the (light emitting surface of the) light generating element. This may in embodiments be via a medium, like air, a gas, or a liquid or solid light guiding material. In embodiments, also one or more optics, like a lens, a reflector, an optical filter, may be configured in the optical path between light generating element and item or material. The term “in a light-receiving relationship” does, as indicated above, not exclude the presence of intermediate optical elements, such as lenses, collimators, reflectors, dichroic mirrors, etc. In embodiments, the term “light receiving relationship” and “downstream” may essentially be synonyms.

In embodiments, the device generating device comprises a single (solid state) light source. The light source may provide a defined spectral power distribution. During use of the photoreactor assembly, it may be beneficial to temporally and/or spatially vary the spectral power distribution of the device radiation. For instance, different spectral power distributions may be successively provided to the reactor, more especially to the fluid, for successive chemical reaction(s) steps. Similarly, it may be beneficial to temporally and/or spatially vary the intensity of the device radiation. In embodiments, the light source may be configured for providing a plurality of spectral power distributions. The device generating device may in further embodiments comprise a plurality of (different) radiation sources. The radiation generating device may especially be configured to generate device radiation having a controllable spectral power distribution. For instance, a first spectral power distribution may be provided by a first light (radiation) source, a second power distribution may be provided by a second radiation source, and a further power distribution may be provided by a combination of the first radiation source and the second radiation source. Or, the first spectral power distribution may be provided by the first radiation source, and the further power distribution may be provided by the second radiation source, et cetera, et cetera. Therefore, the assembly may in embodiments comprise a beam combiner, especially for combining beams of radiation source radiation of a plurality of radiation sources (to provide a (single) beam of device radiation). The beams may e.g. be combined using a dichroic mirror or a dichroic cube. The beam combiner may in embodiments comprise a dichroic mirror or a dichroic cube.

The controllable spectral power distribution may in embodiments be temporarily changed. For instance, during a first period the first spectral power distribution may be provided to the reactor, especially to the fluid (at a first spatially controlled location) and during a further period the further power distribution may be provided to the reactor, especially the fluid (at a second spatially controlled location). The first spectral power distribution may e.g. facilitate starting a reaction (at the first location), wherein the further spectral power distribution may facilitate terminating the reaction. Yet many other reasons may be known to the skilled person for providing different spectral power distributions to different locations in the reactor (or to the same location in the reactor, e.g., for stagnant fluids). Hence, in embodiments a first radiation source may provide a first radiation source radiation having a first spectral power distribution. Further, a second radiation source may provide a second radiation source radiation having a second spectral power distribution. Especially the device radiation may comprise the first spectral power distribution, or the second spectral power distribution, or a combination of the first and the second spectral power distribution.

In embodiments, the beam steering device may (therefore) be configured to provide, in an operational mode the beam of device radiation having the controllable spectral power distribution to the spatially controlled location of the fluidic system.

Hence, in embodiments the radiation generating device comprises two or more solid state light sources; wherein the radiation generating device is configured to generate device radiation having a controllable spectral power distribution; wherein the beam steering device is configured to provide (in an operational mode) the beam of device radiation having the controllable spectral power distribution to the spatially controlled location of the fluidic system; and especially wherein the control system is configured to control the spectral power distribution (of the device radiation.

Hence, in specific embodiments the photoreactor assembly may (further) comprise a beam combiner, wherein the beam combiner is configured to combine in an operational mode solid state light source radiation of the two or more solid state light sources.

In further embodiments, the two or more radiation sources, especially two radiation sources, provide polarized light (radiation), comprising different polarization states (such as p-polarization and s-polarization), and the beams of the two radiation sources may be combined using a polarizing beam combiner. A polarizing beam combiner may also comprise or be referred to as a “polarizing beam splitter”. Depending on a direction of the radiation through the polarizing beam splitter, a beam of unpolarized radiation may be split in two polarized beams each comprising a different polarizing stage. Yet, if the radiation travels through the polarizing beam splitter (PBS) in the opposite direction especially the PBS may combine two beams of different polarization to a single combined beam. Herein, the term “ polarizing beam splitter” may refer to a polarizing beam combiner.

Hence, in embodiments, the beam combiner is selected from the group comprising a dichroic mirror and a polarizing beam combiner (or “polarizing beam splitter” - PBS).

In further specific embodiments, the radiation generating device may comprise a laser system comprising one or more lasers (laser diodes). The laser may be combined with e.g. a dichroic cube (for combining different colors) or e.g. a polarizing beam splitter (PBS) (for combining 2 lasers with different polarization states). The assembly may further comprise a collimator lens at a location downstream of the radiation source e.g. downstream of the laser, and especially upstream of the beam steering device, more especially of the beam combiner. This way, radiation source radiation, such as laser radiation, may be collimated. Especially (parallel) beams of radiation source radiation of more than one radiation source, especially of two radiation sources, may in embodiments be collimated before combining them into a single beam of device radiation, such as by using the dichroic cube or the PBS. In further embodiments, the radiation source comprises a collimator lens for collimating radiation source radiation. Additionally or alternatively, the assembly comprises the collimator lens configured downstream of the radiation source and especially upstream of any beam combiner, beam shaping element, or beam steering device.

Hence, in embodiments, the control system may be configured to temporally vary one or more of the spectral power distribution and the intensity of one or more of the radiation source radiations, especially the intensity. In further embodiments, the control system may be configured to control the one or more of the spectral power distribution and the intensity of the device radiation, especially the spectral power distribution, or especially the intensity, even more especially the spectral power distribution and the intensity. Herein, this may further be described as modulating the radiation generating device (radiation) and/or the radiation source (radiation).

The beam of the device radiation may in embodiments comprise a cross sectional area matching part of the reactor, especially the channel and or the cavity. In embodiments, the device radiation beam may comprise a circular cross section. In other embodiments, the device radiation beam may comprise an elliptical cross section. In further embodiments a laser diode may provide a beam of radiation source radiation (light) comprising an elliptical cross section. In embodiments, an elliptical cross section may provide an elliptical spot at the reactor channel (or cavity). This may be advantageous if a semi -major axis of the elliptical spot aligns with the channel axis. Yet, this may in embodiments result in a reduced efficiency, e.g. if a part of the spot is provided adjacent to the channel. Moreover, in embodiments, controllability and/or reproducibility of the location where the radiation is provided at the reactor may be improved by shaping the beam, e.g. to a beam comprising a circular cross section. Yet, in further embodiments another type of cross section may be preferred, e.g. an even more elliptical (having a larger ratio of the semi -major axis to the semi-minor axis), strip-like shape (to match the application). In embodiments, e.g. an anamorphic prism pair may be used to shape an elliptical cross section of the device radiation beam to e.g. a round or more stripe-like shape. The anamorphic prism pair may be configured to (re-)shape (the cross section of) the device radiation beam, especially to expand or shrink (the cross section ol) the device radiation beam in a predetermined dimension, e.g. to achieve a more round or elliptical (cross section of the) beam. In embodiments at least one of the prisms of the prism pair may be moved, especially to move the prisms relative to each other. Moving the prisms relative to each other may control the shape (the cross section ol) the device radiation beam. The anamorphic prism pair may e.g. comprise one or more actuators (e.g. motors) or be connected to the one or more actuators. The anamorphic prism pair, especially the one or more actuators, may be functionally coupled to the control unit. In embodiments, the anamorphic prism pair may be controlled by the control system.

Further, a cross section of a beam may be expanded or shrunken using a telescope. The telescope especially comprises two parallel lenses or curved mirrors that may be moved relative to each other. The telescope may comprise an (fl-f2) telescope. Herein, fl and f2 refer to a focus distance (fl) of the first lens (mirror) and a focus distance (f2) of the second lens (mirror). A ratio and distance between the focal lengths of those lenses or curved mirrors determine the angular magnification of the input beam. The telescope may be functionally coupled to the control system. The control system may in embodiments control the telescope.

In yet further embodiments, the photoreactor assembly further comprises a beam shaping element configured downstream of the radiation generating device and upstream of the beam steering device. The beam shaping element may comprise an (fl-f2) telescope. In further embodiments, the beam shaping element comprises an anamorphic prism pair. The beam shaping element may in further embodiments facilitate changing a total amount of energy per unit of area to the reactor without modulating the radiation source (radiation). The control system may be configured to control the beam shaping element, especially the telescope and/or especially the anamorphic prism pair.

The term “beam shaping element” may relate to a plurality of (different) beam shaping element. In embodiments, the assembly for instance comprises the anamorphic prism pair and the (fl-f2) telescope. The anamorphic prism pair is especially configured upstream of the telescope (relative to the propagation of the radiation).

The assembly is in embodiments configured for treating a fluid of a fluidic reactor with device radiation. The assembly may in embodiments comprise the fluid reactor. The reactor may be configured for hosting the (reactor) fluid to be treated with the device radiation. In particular, the reactor may comprise a fluidic system, especially one or more reactor channels and/or one or more reactor cavities, configured for hosting the fluid. The term “reactor channel” may herein especially comprise an elongated shape, especially wherein, during use, the fluid flows from one end of the reactor channel to another end of the reactor channel. Hence, a length of the reactor channel may especially be larger than a (circular equivalent) (inner) diameter of the reactor channel. A ratio of the length of the reactor channel to the (circular equivalent) (inner) diameter of the reactor channel may in embodiments be larger than 5, especially larger than 10. A width of the channel (perpendicular to a longitudinal channel axis) may in embodiments be constant. In further specific embodiments the channel width may vary over the length of the channel. The channel width is especially constant. In embodiments, the channel width of a first channel may differ from a channel width of a further channel of the one or more channels.

The term “cavity” may herein especially refer to an isolated reactor chamber or a chamber having especially only a single opening through the fluid may enter and exit the chamber. In embodiments, e.g., the cavity comprises a side chamber of a channel, especially comprising an opening or side channel fluidly connecting the cavity to the channel. In further embodiments, the cavity (volume) is entirely enclosed by a (transmissive) wall (or a number of walls) of the cavity. The cavity may e.g. comprise a (micro)well, such as for instance of a well plates. Well plates are known to the skilled person and may in most popular well plates e.g. comprise 96 wells. Yet other numbers of wells are also feasible. Isolated or entirely enclosed cavities may be filled with the fluid and successively the cavity may be closed with lid or plate, especially closing all cavities at once, to entirely enclose the cavity (volume).

The reactor, especially the reactor channel and/or the reactor cavity may in embodiments comprise a catalytic element for catalyzing the photocatalytic reaction. The catalytic element may e.g. be comprised by a catalytic membrane and/or the reactor wall and/or a wall of the cavity. The reactor may comprise a catalytic membrane.

The reactor may comprise one or more reactor walls. The one or more reactor walls especially comprise a radiation transmissive reactor wall. The radiation transmissive reactor wall at least partly defines the fluidic system, especially the one or more reactor channels and/or the one or more cavities. At least part of the radiation transmissive reactor wall is radiation transmissive for the device radiation. The assembly is especially configured such that at least part of the fluid flowing through the reactor channel (s) and/or hosted by the one or more cavities may receive device radiation (in the operational mode). In further embodiments, substantial the entire radiation transmissive wall is transmissive for device radiation. The radiation transmissive reactor wall, especially the fluidic reactor may comprise, especially be made of, a radiation transmissive material (being radiation transmissive for device radiation). In embodiments, (substantially) the (entire) fluidic reactor is transmissive for the device radiation. The fluidic reactor, especially the fluidic system may especially comprise an irradiation side of the fluidic system configured for being irradiated with the device radiation. The assembly, especially the reactor, and especially the beam steering device, is especially configured such that at least 30%, such as at least 50%, especially at least 70%, especially at least 90%, such as substantially all, of (a total surface area arranged at the irradiation side ol) the one or more channels and/or the one or more cavities may be irradiated with the device radiation in the operational mode. This especially implies that the beam steering device may be enabled to provide in the operational mode the beam of device radiation to 30%, such as at least 50%, especially at least 70%, especially at least 90%, such as substantially all of the one or more channels and/or the one or more cavities. Yet, the beam steering device not necessarily provides the beam to all possible locations (because the beam steering device only may provide the beam at the controlled spatially (and temporally) controlled location). In embodiments, for instance at least 50%, especially at least 70%, such as at least 80%, especially at least 90% of the device radiation provided by the radiation generating device may be incident on the radiation transmissive reactor wall at a location of the one or more channels and/or one or more cavities in the operational mode. Especially a remainder of the device radiation may be provided adjacent to the one or more channels and/or one or more cavities. A total volume of the fluid that may be provided with the device radiation may further depend on a maximum depth of penetration of the device radiation in the fluid.

In embodiments, the reactor channel, may have a flow path. The flow path may in embodiments comprise straight sections. The flow path may further comprise curves. In embodiments, the flow path comprises a straight flow path. Especially the flow path meanders. The meandering may especially contribute to providing turbulence in the reactor chamber.

The one or more reactor walls, especially the radiation transmissive reactor wall, may especially have an average reactor wall thickness selected from the range of 0.4 - 12 mm, especially from the range of 0.5 - 10 mm, such as from the range of 0.7 - 8 mm. The reactor wall thickness may (at each location) especially be measured perpendicular to the surface of a reactor wall. The reactor wall thickness may not be constant along the reactor. In further embodiments, along at least 80% of the radiation transmissive reactor wall, such as at least 90%, especially at least 95%, the radiation transmissive reactor wall may have a reactor wall thickness of at least 1 mm, especially at least 2 mm, such as at least 5 mm. In particular, the radiation transmissive reactor wall may comprise an inner side and an outer side, wherein the inner side is directed towards the one or more channels and/or one or more cavities. The outer side may comprise the irradiation side.

The term “reflector element” especially relates to an element being able to reflect the device radiation. Especially at least 50% of the device radiation may be reflected when provided to the reflector element. In embodiments, the reflector element may reflect at least 60% of device radiation incident on the reflect element, such as at least 70%, especially at least 80%. In further embodiments, the reflector element may reflect at least 90% of device radiation incident on the reflector element, such as at least 95%. The reflector element may e.g. comprise a (reflective) coating, or a reflective surface. In embodiments, the object comprising the reflector element may (at least partly) be made of reflective material. For instance, the object may be made of a reflective metal, or another (non-metal type) material that may reflect the device radiation. Further, in specific embodiments, one or more of a thermally conductive elements (see below) are made of thermally conductive material that also is reflective for the device radiation.

In further embodiments, a spatially controlled location of the fluidic system, especially the radiation transmissive reactor wall, is configured in a radiation receiving relationship with radiation generating device. In particular, the radiation generating device is configured to provide device radiation to the radiation transmissive reactor wall.

It will be clear to the person skilled in the art that the phrase “configured to provide device radiation to X” and similar phrases indicate that the device radiation travels along a flow path crossing X. Hence, the radiation generating device may provide device radiation to a reactor wall, wherein the device radiation passes through the reactor wall into the reactor fluid (during operation).

The radiation transmissive reactor wall may, in embodiments, be (at least partly) transmissive for the device radiation. Especially, the device radiation provided to the radiation transmissive reactor wall may (essentially) pass the reactor wall unhampered.

In embodiments, the one or more reactor walls, especially the radiation transmissive reactor wall, may be made of glass. The one or more reactor walls, especially the radiation transmissive reactor wall, may e.g. be made of quartz, borosilicate glass, soda- lime(-silica), high-silica high temperature glass, aluminosilicate glass, or soda-barium soft glass (or sodium barium glass) (PH160 glass). The glass may, e.g., be marketed as Vycor, Corex, or Pyrex. The one or more reactor walls, especially the radiation transmissive reactor wall, is in embodiments (at least partly) made of amorphous silica, for instance known as fused silica, fused quartz, quartz glass, or quartz. The one or more reactor walls, especially the radiation transmissive reactor wall, may in further embodiments at least partly be made of a (transmissive) polymer. Suitable polymers are e.g. poly(methyl methacrylate) (PMMA), silicone/polysiloxane, polydimethylsiloxane (PDMS), perfluoroalkoxy alkanes (PFA), and fluorinated ethylene propylene (FEP). The one or more reactor walls, especially the radiation transmissive reactor wall, may further comprise a transmissive ceramic material. Examples of transmissive ceramics are e.g. alumina AI2O3, yttria alumina garnet (YAG), and spinel, such as magnesium aluminate spinel (MgAhCh) and aluminum oxynitride spinel (AI23O27N5). In embodiment, e.g. the one or more reactor walls, especially the radiation transmissive reactor wall, is (at least partly) made of one of these ceramics. In yet further embodiments, the one or more reactor walls, especially the radiation transmissive reactor wall, may comprise (be made ol) transmissive materials such as BaF2, CaF2 and MgF2. The material of the one or more reactor walls, especially the radiation transmissive reactor wall, may further be selected based on the fluid to be treated. The material may especially be selected for being inert for the (compounds in) the fluid.

In further embodiments, the one or more reactor walls, especially the radiation transmissive reactor wall, may comprise a material selected from the group comprising poly fluor alkoxy (PFA), FEP, ethylene tetra fluorethylene (ETFE), and PMMA. In particular, these materials may be transparent for UV radiation.

Photochemical reactions may be carried out in the reactor by irradiating fluid in the reactor with the device radiation. The one or more reactor walls, especially the radiation transmissive reactor wall, may therefore be configured to be transmissive to the device radiation. The term “transmissive” in the phrase “transmissive to the device radiation “especially refers to the property of allowing the device radiation to pass through (the wall).

In embodiments, the one or more reactor walls, especially the radiation transmissive reactor wall, may be translucent for the device radiation. Yet, in further embodiments, the one or more reactor walls, especially the radiation transmissive reactor wall, is transparent for the device radiation. The term “transmissive” not necessarily implies that 100% of the device radiation provided emitted to the reactor wall may also pass through the wall. In embodiments at least 50% of the device radiation emitted to the reactor wall may pass through the reactor wall, such as at least 70%, especially at least 90%. In further embodiments, at least 95% of the device radiation emitted to the reactor wall may pass through the reactor wall, such as at least 98%. A relative amount of device radiation passing through the reactor wall may e.g. depend on the wavelength of the device radiation. In embodiments, the radiation transmissive reactor wall may be configured transmissive for UV radiation. In further embodiments, the radiation transmissive reactor wall may for instance (also) be configured transmissive for visible radiation. In yet further embodiments, the radiation transmissive reactor wall may be configured (also) transmissive for IR radiation.

The term “light source” may refer to a semiconductor light-emitting device, such as a light emitting diode (LED), a resonant cavity light emitting diode (RCLED), a vertical cavity laser diode (VCSEL), an edge emitting laser, etc.. The term “light source” may also refer to an organic light-emitting diode, such as a passive-matrix (PMOLED) or an active-matrix (AMOLED). In embodiments, the light source may comprise solid state light sources (such as LEDs or laser diodes). In further embodiments, the light sources may comprise one or more of chips-on-board light sources, light emitting diodes, laser diodes, and superluminescent diodes. In an embodiment, the light source may comprise an LED. The term LED may also refer to a plurality of LEDs. Further, the term “light source” may in embodiments also refer to a so-called chips-on-board (COB) light source. The term “COB” especially refers to LED chips in the form of a semiconductor chip that is neither encased nor connected but directly mounted onto a substrate, such as a PCB and/or a heat sink Hence, a plurality of semiconductor light sources may be configured on the same substrate. In embodiments, a COB is a multi LED chip configured together as a single lighting module. The term “light source” may also relate to a plurality of (essentially identical (or different)) light sources, such as 2-2000 solid state light sources. In embodiments, the light source may comprise one or more micro-optical elements (array of micro lenses) downstream of a single solid state light source, such as a LED, or downstream of a plurality of solid state light sources (i.e. e.g. shared by multiple LEDs). In embodiments, the light source may comprise a LED with on-chip optics. In embodiments, the light source comprises a pixelated single LED (with or without optics) (offering in embodiments on-chip beam steering). In embodiments, the light source may comprise a laser module.

The phrases “different light sources”, “different radiation sources”, or “a plurality of different light sources”, and similar phrases, may in embodiments refer to a plurality of (solid state) light sources selected from at least two different bins. Likewise, the phrases “identical light sources” or “a plurality of same light sources”, and similar phrases, may in embodiments refer to a plurality of (solid state) light sources selected from the same bin. In embodiments, the cavities may be configured in a 2D array. Hence, the radiation transmissive reactor wall may have a plate shape , especially a curved (or “bent”) plate shape, or especially a flat plate shape. The term “plate shape” may herein especially refer to a shape having two dimensions that are substantially larger than a third dimension, such as at least 10 times larger, especially at least 50 times larger, such as at least 100 times larger.

In embodiments, at least part of the reactor may be defined by two parallel configured reactor walls. The two parallel configured reactor walls may especially define (or “provide”) a reactor volume. In embodiments, the two parallel configured reactor walls may define a reaction channel and may especially be configured in a radiation receiving relationship with the plurality of light sources. As can be derived from the above, especially the reactor walls are transmissive for the device radiation.

In particular, in such embodiments, the reactor, may have a plate-like shape. Hence, the two parallel configured reactor walls may define at least part of the reactor, especially the reactor channel.

The intensity of device radiation may diminish rapidly with increased distance into the reactor chamber, especially into the reactor fluid. Hence, if the reactor fluid exhibits laminar flow, the reactor fluid may be non-uniformly exposed to the device radiation. Hence, in embodiments, the reactor walls, especially the radiation transmissive reactor wall, may have a corrugated shape, especially a corrugated shape at least partly defined by corrugations.

The corrugated shapes may result in turbulence for a fluid flowing in the reactor, especially in the reactor chamber. The turbulence may disrupt the laminar flow, and may thereby result in a more uniform exposure of the reactor fluid to the device radiation.

In embodiments, the corrugations may comprise the cavities. In further embodiments, the corrugations may define the cavities.

The corrugated shape may, in embodiments, be defined by ID corrugations. Hence, the reactor walls, especially the light transmissive reactor wall, may have a first dimension along which cross-sections of the reactor walls are essentially straight lines, and a second dimension, perpendicular to the first dimension, along which cross-section of the reactor walls approximate a wave shape, such as approximate a sine wave shape.

In further embodiments, the corrugated shapes may be defined by 2D corrugations. Hence, the reactor walls, especially the light transmissive reactor wall, may have a first dimension and a second dimension perpendicular to the first dimension, wherein cross-section of the reactor walls along the first dimension and the second dimension approximate a wave shape, such as approximate a sine wave shape.

In embodiments, the photoreactor assembly, especially the reactor channel, may host flow influencing elements. In particular, the one or more reactor walls may comprise (or “define”) the flow influencing elements. The flow influencing elements may especially be configured to increase turbulence for the reactor fluid.

In further embodiments, the flow influencing elements may be selected from the group comprising protrusions, obstacles, bars, sills, and strictures.

The flow influencing elements may especially be configured within the reactor, especially within the reactor channel and/or cavity.

Hence, in embodiments, a reactor wall may comprise an inner wall for contacting the reactor fluid, wherein the reactor wall comprises a flow influencing element arranged on the inner wall.

In further embodiments, the inner wall may be shaped to facilitate creation of turbulence, such as by causing Eddies.

The photoreactor assembly may, in embodiments, comprise a temperature control element, especially a temperature control channel. The temperature control element may be configured to control the temperature of the reactor, especially of the reactor fluid.

The temperature control element may especially comprise a cooling element.

In embodiments, the temperature control element may comprise a temperature control channel. The term “temperature control channel” especially relates to a channel/path configured in the photoreactor assembly which may hold a temperature control (or cooling) fluid, especially through which a fluid may flow (such as by a forced transport or spontaneously). The term temperature control channel” may in embodiments refer to a plurality of (different) temperature control channels. The temperature control fluid, especially the cooling fluid, may be a gas, such as air. The temperature control fluid may also be a liquid, such as water. The temperature control fluid may further be known as “a coolant”. The temperature control channel is especially configured in functional contact (especially in thermal contact) with the reactor, especially with the reactor fluid. The temperature control fluid may be configured for cooling the (reactor) fluid, especially the reactor. Temperature controlling may in embodiments of the invention especially be explained based on reducing the temperature, and as such temperature controlling may herein mostly be described as cooling. Yet, in alternative embodiments temperature controlling may comprise increasing a temperature. Hence, it will be understood that if the element is explained in relation to cooling, the element may in alternative embodiments be used for heating. As such in embodiments the term “cooling” may be exchanged with the term “heating” (or “temperature control (ling)”).

In specific embodiments, the reactor, especially the reactor channel and/or the cavity, or especially the reactor volume may be configured traversed with one or more temperature control channels.

In embodiments wherein the reactor comprises a reactor channel, the temperature control channel may be arranged (essentially) perpendicular to the reactor channel, especially wherein the reactor comprises a plurality of reactor channels and a plurality of temperature control channels arranged in a grid.

In embodiments, the temperature control channel may (at least partially) be arranged in the reactor channel or in the cavity, i.e., the reactor fluid may be in (direct) fluid contact with the (outside of the) temperature control channel.

In further embodiments, the temperature control channel may be arranged at a distance from the reactor channel or cavity, i.e., the reactor fluid may be fluidically separated from the temperature control channel. In such embodiments, a thermally conductive material may be arranged between the reactor channel or cavity and the temperature control channel. For instance, a second reactor wall (of the one or more walls) may comprise a thermally conductive material, wherein the temperature control channel is arranged in the second reactor wall.

In further embodiments, the temperature control channel may especially be arranged at least partially parallel to the reactor channel and be in thermal contact therewith (via the at least partial parts). Thereby, the area along which the temperature control channel and the reactor channel are in thermal contact may be relatively larger, which may facilitate increased temperature control.

Herein, the term “thermal contact” may especially refer to an arrangement of elements that may provide a thermal conductivity of at least about 10 W/m/K, such as at least 20 W/m/K, such as at least 50 W/m/K. In embodiments, the term “thermal contact” may especially refer to an arrangement of elements that may provide a thermal conductivity of at least about 150 W/m/K, such as at least 170 W/m/K, especially at least 200 W/m/K. In embodiments, the term “thermal contact” may especially refer to an arrangement of elements that may provide a thermal conductivity of at least about 250 W/m/K, such as at least 300 W/m/K, especially at least 400 W/m/K. For instance, a metal support for a light source, wherein the metal support is in physical contact with the light source and in physical contact with a channel wall of a fluid transport channel, wherein the light source is not in the fluid transport channel, may provide a thermal conductivity between the light source and the fluid transport channel of at least about 10 W/m/K. Suitable thermally conductive materials, that may be used to provide the thermal contact, may be selected from the group (of thermally conductive materials) consist of copper, aluminum, silver, gold, silicon carbide, aluminum nitride, boron nitride, aluminum silicon carbide, beryllium oxide, a silicon carbide composite, aluminum silicon carbide, an copper tungsten alloy, a copper molybdenum carbide, carbon, diamond, and graphite. Alternatively, or additionally, the thermally conductive material may comprise or consist of a ceramic material, such aluminum oxide of a garnet of the YAG-type family, such as YAG. Especially, the thermally conductive material may comprise e.g. copper or aluminum.

Hence, in embodiments, one or more of a spectral power distribution of the device radiation and an intensity of the device radiation may be controllable, especially the spectral power distribution, or especially the intensity.

In specific embodiments, two or more of the light sources may provide radiation source radiation having different spectral power distributions. For instance, a first radiation source may be configured to generate UV radiation and a second light source may be configured to generate visible radiation.

The term “wavelength” may herein also relate to a plurality of wavelengths. The term may especially refer to a wavelength distribution.

Hence, the invention especially relates to a photoreactor assembly for providing a (controlled) radiation (spectral power distribution) to a (fluid) in a fluid reactor. The radiation may especially be provided to predetermine (controlled) location of the fluid reactor. Furthermore, the predetermined location may be spatiotemporally controlled (especially in a spatial (3D) dimension in combination with a time-dimension). Embodiments of the invention relate to a laser based photo chemical reactor assembly using directed laser light.

In embodiments, the assembly may be functionally coupled to a control system, especially for controlling the(spatiotemporally controlled) predetermined location.

In embodiments, the photoreactor assembly may further comprise the control system. The control system may especially be configured to control the photoreactor assembly. The control system may be configured to control the spatially/spatiotemporally controlled locations, as discussed above. In further embodiments, the control system may be configured to control a flow of fluid through the reactor. In further embodiments, the control system may be configured to control a composition of the fluid. In further embodiments, the control system may be configured to (independently) control (one or more ol) the light sources. In further embodiments, the control system may be configured to control the temperature control element.

The assembly may further comprise a sensor, especially functionally coupled to the control system. The sensor may be configured for sensing a characteristic of the fluid (in the fluid system). The senor may be configured for sensing a characteristic of (at least part ol) the fluidic reactor (and/or further elements of the assembly). The sensor may in embodiments, e.g., sense a configuration of the fluidic reactor. The senor may in embodiments be configured for sensing a configuration, especially location of the one or more reactor channel and/or reactor cavities. The sensor may in embodiments sense a configuration (e.g. location, shape) of the fluid reactor, especially relative to the beam steering device. The senor may in further embodiments sense a location being provided with the device radiation. In further embodiments, the sensor may sense a temperature at a location, especially the (temporary) location being provided with the device radiation. In further embodiments, the sensor may sense radiation. In embodiments, the sensor may sense one or more of UV radiation, visible radiation, and IR radiation. In embodiments, the sensor comprises an optical sensor. The optical sensor may especially sense one or more of UV radiation, visible radiation, and IR radiation. The term “sensor” may in embodiments refer to a plurality (of different) sensors.

The sensor may in embodiments (be configured to) sense radiation from the fluid in at least part of the fluidic system, especially at a sensing location. Such radiation may relate to many different characteristics, e.g. to a progress of the reaction at such location (e.g. if the reaction induces a change in color of the fluid or if a phase transition takes place during reaction), a temperature at the location (e.g. based on IR radiation), or, e.g., a discrimination between a reactor channel or cavity and location adjacent to the reactor channel/cavity. The sensor may in embodiments be configured to sense a color of the fluid in the fluidic system.

In further embodiments, the sensor may (be configured to) sense (at the sensing location) transmission of radiation through the fluid in the fluidic system. Additionally or alternatively, the sensor may be configured to sense absorption of radiation by the fluid (at the sensing location). In embodiments, the sensor may be configured to sense (at least part ol) radiation that may be provided by the radiation generating device. For instance to sense a location of impact on the fluid system, or to sense device radiation that is absorbed by and/or transmitted through the fluid. In embodiments, the sensor may sense a polarization of the device radiation and/or of one or more of the radiation sources radiations. In further embodiments, the sensor may (also) be configured to sense radiation not directly provided by the radiation generating device. Examples of this kind of radiation may comprise radiation provided by further radiation sources, secondary generated radiation, e.g. device generated radiation being modified by elements of the assembly or external elements, (re) polarized radiation, etc. Additionally or alternatively, the sensor may (be configured to) sense a temperature of the fluid in at least part of the fluidic system. For instance, the optical sensor may be configured to detect IR radiation (and thereby sense heat).

Hence, in further embodiments, the optical sensor is configured to sense one or more of: (i) radiation from the fluid in at least part of the fluidic system, (ii) color from the fluid in at least part of the fluidic system, (iii) transmission of radiation through the fluid in at least part of the fluidic system, and (iv) absorption of radiation by the fluid in at least part of the fluidic system. The sensor may in further embodiments be configured to (further) sense a temperature of the fluid in at least part of the fluidic system.

The sensor may be configured to sense (a parameter described above in) at least part of the fluidic system, such as at least 25%, especially at least 50%, even more especially at least 75%, such as substantially 100% (of an area or volume) of the fluidic reactor, especially of the fluidic system.

It may further be advantageous to provide information about the configuration (or design) of the reactor directly to the control system, especially without having to sense (scan) the entire reactor. Such information may e.g. be provided to the control system via an external instruction (see below). Further information about the fluidic reactor may in embodiments (also) be provided using (sensor) readable information provided by a bar code, or a matrix code (such as a QR code). In embodiments, the information may be provided by a (wireless) communication device, especially providing sensor sense-able (or sensor readable) information. In embodiments, the sensor is configured for sensing the information of the fluidic reactor, especially information comprised by the fluidic reactor.

Hence, in embodiments, the (optical) sensor is configured to sense sensor readable information comprised by the fluidic reactor, especially wherein the sensor readable information is comprised by or readable from one or more of a bar code, a matrix bar code, and a wireless communication device.

The sensor may especially have an operational mode, in which the sensor may sense the characteristic. The sensor may further generate a (related) sensor signal, especially a (related) optical sensor signal, and especially provide the sensor signal to the control system. Based on the sensor signal, in embodiments, the beam steering device may be controlled. Further, based on the sensor signal in embodiments (also) the radiation generating device may be controlled. In embodiments, e.g., the intensity and/or the spectral power distribution of the device radiation may be controlled based on the sensor signal. In embodiments, the control system may control the one or more radiation sources, based on the sensor signal. The one or more of the radiation sources may in embodiments be switched on or off (independently from each other) by the control system. The one or more of the radiation sources may in further embodiments be modulated (independently from each other) by the control system. Especially based on the sensor signal, operating the assembly may be controlled.

Hence, in embodiments, the photoreactor assembly further comprises an optical sensor configured to sense in an operational mode at least part of the fluid reactor and to generate a related optical sensor signal. Further, especially, the control system is configured to control one or more of the radiation generating device and the beam steering device in dependence of the optical sensor signal. The control system may in further embodiments be configured for controlling the beam steering element.

In embodiments, device radiation may at least partly travel through the fluidic reactor without being absorbed in the fluid or, e.g., by a photocatalysts in the reactor. Further embodiments of the assembly may comprise a mirror element, especially for reflecting device radiation downstream of the fluidic reactor (back) to the fluidic reactor. Unused radiation may in embodiments be recycled. Especially, for polarized (device) radiation, e.g. comprising laser radiation, it may in embodiments be advantageous to change the linear polarized radiation into circular polarized light upstream of the fluid reactor. This may for instance be performed using a ¼ lambda wave plate. A ¼ lambda wave plate may change radiation passing through the wave plate from linear polarized light into circular polarized light, and vice versa (either to p or s-polarized). Configuring a ¼ lambda wave plate together with a dichroic mirror at a first side, especially the irradiation side, of the fluid reactor, and especially configuring the mirror element at a further side of the fluidic reactor, opposite to the first side may enable keeping most of the radiation inside of the assembly. In embodiments, e.g. p-polarized radiation coming from the dichroic mirror may be converted to circularly polarized radiation at a location upstream of the reactor (between the reactor and the dichromic mirror). “Unused” radiation that passes the reactor may be reflected by the mirror element back to the reactor, wherein optionally again a part of the unused radiation may pass the reactor in the direction of the ¼ lambda wave plate. When passing through the ¼ lambda waveplate, the radiation may be converted into linear polarized radiation, (the p- polarized radiation in a first pass being circularly polarized by the waveplate now, in the second pass, turning form circularly polarized to s-polarized) and travel to the dichroic mirror again. The (s-polarized) radiation successively may be reflected back in the direction of the fluidic reactor (or transmitted, especially p-polarized radiation based on multiple passes through the ¼ lambda waveplate) by the dichroic mirror. Especially, a band edge of the dichroic mirror may be selected to correspond to a wavelength of the device radiation (especially the radiation device radiation). In embodiments, the reflection/transmission will be different for s- and p- polarized light. Especially, a bandpass/reject edge may be configured different for s- and p- polarized radiation in the dichroic mirror, e.g. allowing p- polarized radiation to pass and s-polarized radiation to be reflected (or vice versa). As such, unused device radiation may be recycled in the assembly.

Hence, in further embodiments, (wherein the fluidic reactor is transmissive for the device radiation), the assembly comprises a mirror assembly, comprising a first assembly element, a second assembly element, and a third assembly element, wherein along an optical path (i) the first assembly element is configured between the radiation generating device and the second assembly element, and (ii) the fluidic reactor is configured between the second assembly element and the third assembly element; Especially, the first assembly element comprises a dichroic mirror, wherein the second assembly element comprises a quarter lambda waveplate, and wherein the third assembly element comprises a mirror. Further, especially, (in such assembly) the radiation generating device, optionally in combination with a polarizer element, may be configured to generate polarized device radiation.

Additionally, or alternatively, (at least part ol) the unused device radiation may be converted (using luminescent material) into luminescent material light. The luminescent material light may further in embodiments be directed to the fluid reactor again. For instance a mirror element may be arranged downstream of the fluid reactor, especially wherein the mirror element comprises luminescent material (or phosphor) (at a side facing the fluid reactor).

Hence, in embodiments, the assembly further comprises a luminescent material configured to convert part of the device radiation that during operation of the photoreactor assembly is not absorbed by the fluidic reactor into luminescent material light, wherein the fluidic reactor is configured in a light receiving relationship with the luminescent material. The term “controlling” and similar terms especially refer at least to determining the behavior or supervising the running of an element. Hence, herein “controlling” and similar terms may e.g. refer to imposing behavior to the element (determining the behavior or supervising the running of an element), etc., such as e.g. measuring, displaying, actuating, opening, shifting, changing temperature, etc.. Beyond that, the term “controlling” and similar terms may additionally include monitoring. Hence, the term “controlling” and similar terms may include imposing behavior on an element and also imposing behavior on an element and monitoring the element. The controlling of the element can be done with a control system, which may also be indicated as “controller”. The control system and the element may thus at least temporarily, or permanently, functionally be coupled. The element may comprise the control system. In embodiments, the control system and element may not be physically coupled. Control can be done via wired and/or wireless control. The term “control system” may also refer to a plurality of different control systems, which especially are functionally coupled, and of which e.g. one control system may be a master control system and one or more others may be slave control systems. A control system may comprise or may be functionally coupled to a user interface.

The control system may also be configured to receive and execute instructions form a remote control. In embodiments, the control system may be controlled via an App on a device, such as a portable device, like a Smartphone or I-phone, a tablet, etc.. The device is thus not necessarily coupled to the lighting system, but may be (temporarily) functionally coupled to the lighting system.

The system, or apparatus, or device may execute an action in a “mode” or “operation mode” or “mode of operation”. Likewise, in a method an action or stage, or step may be executed in a “mode” or “operation mode” or “mode of operation” or “operational mode”. The term “mode” may also be indicated as “controlling mode”. This does not exclude that the system, or apparatus, or device may also be adapted for providing another controlling mode, or a plurality of other controlling modes. Likewise, this may not exclude that before executing the mode and/or after executing the mode one or more other modes may be executed.

However, in embodiments a control system may be available, that is adapted to provide at least the controlling mode. Would other modes be available, the choice of such modes may especially be executed via a user interface, though other options, like executing a mode in dependence of a sensor signal or a (time) scheme, may also be possible. The operation mode may in embodiments also refer to a system, or apparatus, or device, that can only operate in a single operation mode (i.e. “on”, without further tunability).

Hence, in embodiments, the control system may control in dependence of one or more of an input signal of a user interface, a sensor signal (of a sensor), and a timer. The term “timer” may refer to a clock and/or a predetermined time scheme.

It will be clear to the person skilled in the art, that also a combination of temporal and spatial control is possible.

In embodiments, the reactor fluid may flow through the reactor, especially the reactor channel, or especially the reactor volume, along a flow path (or fluid path). In particular, the reactor may comprise a reactor inlet and a reactor outlet, wherein the reactor fluid, during use of the reactor, flows from the reactor inlet to the reactor outlet along the flow path, i.e., the flow path may be a path through the reactor chamber from the reactor inlet to the reactor outlet.

The reactor assembly may be used for treating a fluid. As a result, (photosensitive) reactants in the fluid may react. Moreover, the term “treating the fluid with device radiation” may in embodiments relate to executing a (photochemical) reaction on (reactants in) the fluid.

Herein also the term “irradiating the fluid” such as in the phrase “irradiating the fluid with the device radiation” is used. The term may especially relate to providing device radiation to the fluid. Hence, herein the terms “providing device radiation (to the fluid)” and the like and “irradiating (the fluid with) device radiation” may especially be used interchangeably. Moreover, herein the terms “light” and “radiation” may be used interchangeably, especially in relation to the device radiation.

In a further aspect, the invention may provide a method for treating a fluid with device radiation. Especially, the method may comprise providing the fluid (to be treated with the device radiation) in the fluidic reactor, especially in the one or more reactor channels and/or the one or more reactor cavities, of the photoreactor assembly described herein. The method may further comprise irradiating the fluid with the device radiation.

Hence, in specific embodiments, the invention provides a method for treating a fluid with device radiation, wherein the method comprises: providing the fluid to be treated with the device radiation in the reactor of the photoreactor assembly according to the invention; and irradiating the fluid with the device radiation.

In embodiments, the method may comprise transporting the fluid through the reactor, especially while irradiating the fluid with the device radiation. In embodiments, the method may (further) comprise hosting the fluid in one or more of the reactor chambers, especially while irradiating the fluid with the device radiation.

In further embodiments, the method may comprise controlling the beam steering device, especially to provide (in an operational mode) a beam of device radiation to a spatially controlled location of the fluidic system, especially to a treat the fluid in the channel and/or cavity at the spatially controlled location.

In further specific embodiments, the method may comprise controlling one or more of a spectral power distribution of the device radiation, intensity of the device radiation, and beam direction relative to the fluidic system.

In further specific embodiments, the method (further) comprises sensing (in an operational mode) at least part of the fluid reactor and generating a related optical sensor signal, and especially controlling one or more of the radiation generating device and the beam steering device in dependence of the optical sensor signal. In embodiments, the method comprises sensing one or more of: (i) radiation from the fluid in at least part of the fluidic system, (ii) color from the fluid in at least part of the fluidic system, (iii) transmission of radiation through the fluid in at least part of the fluidic system, and (iv) absorption of radiation by the fluid in at least part of the fluidic system. Further, alternatively or additionally, in embodiments the method may comprise sensing a temperature of the fluid in at least part of the fluidic system.

In further embodiments, the method especially comprises sensing readable information comprised by the fluidic reactor, especially wherein the sensor readable information is comprised by or readable from one or more of a bar code, a matrix bar code, and a wireless communication device, and especially prior to irradiating the fluid with the device radiation.

In further embodiments, the method may comprise controlling one or more of a spectral power distribution and an intensity, especially a spectral power distribution, or especially an intensity, of the device radiation and/or of the one or more light sources, especially at a predetermined time, and/or especially during a predetermined time.

Irradiating the fluid with the device radiation may induce a photochemical reaction. In embodiment, the (photochemical) reaction comprises a photocatalytic reaction. In embodiments, the method further comprises providing a photocatalyst and or photosensitizer to the (reactor) fluid prior to and/or during irradiating the (reactor) fluid with the device radiation. In embodiments, the method comprises a batch process. In other embodiments, the method comprises a continuous process. Hence, in specific embodiments, the method comprises transporting the fluid through the reactor while irradiating the fluid with the device radiation.

The photoreactor assembly may especially comprise one or more temperature control elements (described herein). The method may further comprise transporting a temperature control fluid through and/or along one or more of the temperature control elements.

In yet further embodiments, the method comprises selecting the device radiation from one or more of UV radiation, visible radiation, and IR radiation, prior to irradiating the fluid with the device radiation. The device radiation may especially be selected by selecting the one or more light sources to generate the (selected) device radiation. The device radiation may further be selected based on the fluid to be treated, especially a (photosensitive) reactant and/or photocatalyst and/or photosensitizer in the fluid.

In further embodiments, one or more of the light sources are controlled to radiate different intensities and/or wavelength distributions.

In further specific embodiments, the method comprises polarizing the device radiation and/or the radiation source radiation.

Many photochemical reactions are known, such as dissociation reactions, isomerization or rearrangement reactions, addition reactions and substitution reactions, and, e.g., redox reactions. In embodiments, the (photochemical) reaction comprises a photocatalytic reaction. Photochemical reactions may especially use the energy of the device radiation to change a quantum state of a system (an atom or a molecule) (that absorbs the energy) to an excited state. In the excited state, the system may successively further react with itself or other systems (atoms, molecules) and/or may initiate a further reaction. In specific embodiments, a rate of the photochemical reaction may be controlled by an added (photo-)catalysts or photosensitizer. The terms “treating”, “treated” and the like, used herein, such as in the phrase “treating a fluid with the light source (light)” may especially thus relate to performing a photochemical reaction on a relevant (especially photosensitive) system (atom or molecule) in the fluid, especially thereby elevating the system (atom, molecule) to a state of higher energy and especially causing the further reaction. In embodiments a photoactive compound may be provided to the fluid prior and/or during the irradiation of the fluid. For instance, a photocatalyst and/or a photosensitizer may be added to start and/or promote/accelerate the photochemical reaction. Herein, such atom or molecule may further also be named “a (photosensitive) reactant”. Hence, the reactor fluid may comprise a (photosensitive) reactant.

When absorbing (light source) radiation (light), energy of a photon may be absorbed. The photon energy may also be indicated as hv, wherein h is Planck’s constant and v is the photon’s frequency. Hence, the amount of energy provided to the atom or molecule may be provided in discrete amounts and is especially a function of the frequency of the light (photon). Furthermore, the excitation of an atom or a molecule to a higher state may also require a specific amount of energy, which preferably is matched with the amount of energy provided by the photon. This may also explain that different photochemical reactions may require light having different wavelength. Therefore, in embodiments, the photoreactor assembly may be configured to control a wavelength of the device radiation.

The embodiments described herein are not limited to a single aspect of the invention. For example, an embodiment describing the method may, for example, further relate to the system, especially to an operational mode of the system, or especially to the control system. Similarly, an embodiment of the system describing an operation of the system may further relate to embodiments of the method. In particular, an embodiment of the method describing an operation (of the system) may indicate that the system may, in embodiments, be configured for and/or be suitable for the operation. Similarly, an embodiment describing an operation (of the system) may indicate that the method may, in embodiments, comprise that operation.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings in which corresponding reference symbols indicate corresponding parts, and in which:

Fig.l schematically depicts an embodiment of the photoreactor assembly; and Figs. 2-7 schematically depicts some aspects of the photoreactor assembly.

The schematic drawings are not necessarily to scale.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Fig. 1 schematically depicts an embodiment of the photoreactor assembly 1000, herein also indicated as “assembly” 1000. The embodiment comprises a fluidic reactor 200, a radiation generating device 100, a beam steering device 400, and a control system 300. The reactor 200 not necessarily is part of the assembly 1000. Also the control system 300 may not be comprised by the assembly 1000. Hence, some embodiments of the assembly 1000 may functionally be coupled to a fluid reactor 200 and/or a control system 300. The assembly 1000 may advantageously be used to treat a fluid 5 with device radiation 101, especially comprising UV radiation and/or visible radiation and/or IR radiation, such as with the method of the invention. The radiation generating device 100 may be configured to generate such device radiation 101.

The radiation generating device 100 of the embodiment comprises two radiation sources 10. In the given embodiment the two light sources 10 are solid state light sources 10, for instance comprising a laser (diode) or a superluminescent diode, and are indicated with reference numerals 10a and 10b.

The beam steering device 400 is configured in a radiation receiving relationship with the radiation generating device 100 as is indicated by the combination of the straight line and the dotted line. The radiation generating device is especially configured to provide (in an operational mode) a beam 120 of device radiation 101 to a spatially controlled location of the fluidic system 210 of the fluidic reactor 200. A such the device radiation 101 may treat the fluid 5 in the fluidic system 210. In the figures the beam 120 of device radiation provided to the reactor 200 is depicted by two arrows: a top (dotted) arrow and a lower (continuous) arrow. The arrows may represent different times. For instance, at a first time the beam 120 of device radiation 101 may propagate according to the top arrow, and at a second time, the device radiation 101 may propagate according to the lower arrow.

The location of impact of the device radiation is especially spatially (and temporality) controlled. The spatially controlled location may in this embodiment refer to a location in the (3D) space, as indicated by the x, y, z directions. A spatial controlled location may further in embodiments refer to a location in a 2D plane, see e.g. Fig. 3.

In the given embodiment, the fluidic system 210 comprises a reactor channel 220 and a plurality of reactor cavities 230. In this embodiment, the cavities 230 are configured further downstream from the beam steering device 400 than the channel 220 (relative to a propagation of the device radiation 101). In further embodiments, the cavities 230 may be arranged as e.g. side chambers of the channel 220, wherein the channel 220 and the cavities 230 are arranged in a virtual plane especially perpendicular to the device radiation 101, see e.g. Figs. 4 and 5. Yet, all kind of configurations are possible. The cavities 230 may also be arranged further upstream to the beam steering device 400 than the one or more channels 220. In the given embodiment, the cavities 230 are fluidly connected to the channel 220. Yet in further embodiments, the fluidic system 210 does only comprise one or more cavities 230 (and no channel(s) 220) (or the one or more channels 220 are not fluidly connected to the one or more cavities 230). This may e.g. be pictured based on Fig. 4, by removing the channel 220, or by removing the fluid connections between the channel 220 and the cavities 230, respectively. The fluidic system 210 may thus comprise isolated cavities 230. Herein it is also described that the fluid 5 may be stagnant in such isolated cavities 230. The fluidic system 210 is at least partly defined by a radiation transmissive reactor wall 201, especially being radiation transmissive for the device radiation 101. Further, a virtual plane of the fluidic system 210 may in embodiments especially be a flat plane. In specific further embodiments the virtual plane may be curved (or bent).

The control system 300 is in embodiments functionally coupled (not indicated in the schematic figure) to at least the radiation generating device 100 and the beam steering device 400 and is especially configured to control the radiation generating device 100 and the beam steering device 400.

The embodiment further comprises the (optical) sensor 500. The sensor 500 is especially configured to sense (in an operational mode) at least part of the fluid reactor 200. The sensor 200 may generate a related optical sensor signal. Based on the optical sensor signal the control system 300 may, e.g., control one or more of the radiation generating device 100 and the beam steering device 400. The (optical) sensor 500 may in embodiments e.g. sense radiation from the fluid 5 in at least part of the fluidic system 210, color from the fluid 5 in at least part of the fluidic system 210, transmission of radiation through the fluid 5 in at least part of the fluidic system 210 and absorption of radiation by the fluid 5 in at least part of the fluidic system 210. The sensor 500 may in embodiments sense a temperature of the fluid 5.

The sensor 500 may be used to follow the reaction in the fluid 5. The sensor 500 may in further embodiments (also) be used to determine a configuration of the fluidic reactor 200. The sensor may e.g. be used to sense a type of fluidic reactor 200 that is being used, sense a position of the fluidic system 210, sense a location of the beam steering device 400 and of the spatially controlled location, so a distance between these locations may be determined and the radiation steering device 400 may be calibrated. The sensor 500 may sense a radiation path (or optical path) within the assembly 10000. The sensor 500 may further be configured to sense sensor readable information comprised by the fluidic reactor 200, such sensor readable information comprised by or readable from one or more of a bar code, a matrix bar code, and a wireless communication device. In Fig. 3 an example of such readable information is depicted in the form of a QR code (an embodiment of a matrix bar code).

The beam steering device 400 may further comprise an at least partly rotatable element 410, especially to steer or direct incoming device radiation 101 to the spatially controlled location. In Fig. 2 some embodiments of the rotatable element 410 are depicted. The rotatable elements 410 both comprise a reflective element reflecting the (beam 120 ol) device radiation 101. Further, at least the embodiment at the bottom also comprises a transmissive element on top of the reflective element. Embodiments of the beam steering device 400 may comprise more than one rotatable element 410, especially having non parallel aligned rotation axes 410 allowing to steer the beam 120 in three dimensions. In further embodiments the rotatable element 410 may be rotated over two axes or e.g. a single point to steer the beam 120 in three dimensions. The more than one rotatable elements 410 are especially configured in mutually radiation receiving configuration (during operation).

The beam steering device 400 may e.g. comprise a galvo-scanner, wherein the galvo-scanner comprises two at least partly rotatable elements 410. The rotation of the rotatable element 410 may especially be controlled by the control system 300. By controlling the beam steering device 400, the device radiation 101 may (temporarily) be provided to a spatially controlled location of the fluidic system 210 as is schematically depicted in Fig. 3. The device radiation 101 may, e.g., at a first time and/or during a first period of time be provided to a first location and at a further time and/or during a further time period at a second location. Herein such locations may therefore also be indicated as a spatiotemporal controlled location. In Fig. 3, for instance device radiation 101a is provided at a first location and may, e.g., initiate a first reaction (of a substance) in the fluid 5 at the first location. At a later time device radiation 101b may be provided at a further location downstream of the first location (relative to a fluid 5 flow), e.g. to initiate a further reaction in the fluid 5 or to terminate the reaction in the fluid 5. When changing from the first location to the further location, the spectral power distribution and/or intensity of the device radiation 101 may be controlled (with reference to the above description e.g. to match the spectral power distribution/energy that is preferred to, start the reaction(s) and/or terminate the reaction).

The embodiment of Fig. 1 further depicts focusing optics 610 configured downstream of the beam steering device 400 and upstream of the fluidic reactor 200. The focusing optics 610 may be used to focus the beam 120 to a reduced area of the spatially controlled location, and may in embodiments comprise a F-0 lens. Further, the radiation generating device 100 may especially be configured to generate device radiation 101 having a controllable spectral power distribution. Moreover, the beam steering device 400 may be configured to provide in an operational mode the beam 120 of device radiation 101 having the controllable spectral power distribution to the spatially controlled location of the fluidic system 210. In such embodiment, especially the control system 300 may be configured to control the spectral power distribution of the device radiation 101.

In embodiments, the spectral power distributions and/or intensities of the one or more light sources 10 may be controlled (by the control system 300). A light source 10 may e.g. be switched on or off (temporarily), and/or, e.g., a light source 10 may be dimmed or the light source radiation 11 may be intensified. The light source 10 may be modulated. If the assembly 1000 comprises more than one radiation source 10 each providing a beam of radiation source light 11, a combination of these beams may in embodiments define the beam 120 of device radiation 101. Especially, the combination of these beams may be provided to the beam steering device 400 (as a single beam 120 of device radiation 101). The embodiment of Fig. 1, e.g., also comprises a beam combiner 670. The beam combiner 670 is especially configured to combine (in an operational mode) radiation source radiation 11 of the more than on radiation sources 10, especially for the depicted embodiment, solid state light source radiation 11 of the two or more solid state light sources 10. The beam combiner 670 may e.g. be a dichroic mirror or a polarizing beam combiner. In further embodiments, the beam combiner 670 may comprise a polarizing beam splitter. Such beam combiner 670 may also be known as a “beam spliter”. In the depicted embodiment, the beam combiner comprises a dichroic mirror. The dichroic mirror allows solid state radiation 1 la of one of the solid state light sources 10a to pass and reflects the solid state radiation lib of the other solid state light source 10b. In specific embodiments, the device radiation 101 comprises laser light 11 or multiple (overlay ed) laser beams with different wavelengths.

The depicted embodiment further comprises two beam shaping elements 630 downstream of the radiation generating device 100 and upstream of the beam steering device 400. One of the depicted beam shaping elements 630 comprises a telescope device 640, especially an fl-f2 telescope device 640. The telescope device 640 may widen or shrink the (parallel) beam 120, for instance to match a width of a reactor channel 220 or of a cavity 230. Even if the beam 120 propagates over a long distance, the beam 120 spot diameter (or cross section) may remain constant. The other beam shaping device 630 comprises an anamorphic prism pair 650 arranged upstream of the telescope device 640. By means the anamorphic prism pair 650, the shape of the elliptical spot can for instance be changed to e.g. a round or more stripe-like shape. One or more of the beam shaping devices 630 may be controlled by the control system 300.

In Figs. 4-6 some embodiments are depicted to recycle device radiation 101. The embodiments of Fig. 4 depict a photoreactor assembly 1000, especially having a fluidic reactor 200 that is transmissive for the device radiation 101. The assembly 1000 comprises a mirror assembly 700, comprising three mirror assembly elements, especially three optical elements, (a first assembly element 710, a second assembly element 720, and a third assembly element 730). Along an optical path, the first assembly element 710 is configured between the radiation generating device 100 and the second assembly element 720. Further, the fluidic reactor 200 is configured between the second assembly element 720 and the third assembly element 730. In the embodiment, the first assembly element 710 comprises a dichroic mirror 711, the second assembly element 720 comprises a quarter lambda waveplate 721, and the third assembly element 730 comprises a mirror 731. The embodiment may especially facilitate recycling (linear) polarized device radiation 101. The embodiment may especially be applied in embodiments wherein the radiation generating device 100, optionally in combination with a polarizer element, is configured to generate polarized device radiation 101. Hence, in embodiments, the assembly 1000 may further comprise a polarizer element configured upstream of the first assembly element 710 (not depicted).

Such embodiment may be used in a method to recycle and optionally maximize the use of the device radiation 101. The device radiation 101 may in embodiments comprise linear polarized radiation 11 originating from a laser source type solid state light source 10. Recycling may be achieved using the polarization properties of radiation, especially of laser light 11 and the fact that dichroic mirrors have a polarization dependency in their reflection properties. In this way, it is possible to recycle polarized radiation 101P that has not been absorbed in the chemical reaction during a first pass. This may be achieved by a selected configuration of a dichroic filter, a mirror and a l/41ambda plate. Properties of a dichroic mirror are especially polarization dependent. Further, the radiation source radiation 11 and especially laser radiation 11 may have a very narrow spectrum.

As is illustrated in the figure, the polarized device radiation 101 may be reflected or transmitted by the dichroic mirror 711, depending on the polarization state of the radiation 101 (p or s-polarized), see also Fig. 7. By rotating the polarization state of the laser 10, the light 11 will be transmitted or reflected. It is noted that laser diodes 10 may normally be linearly polarized, and by rotating the laser unit, the polarization state, as seen by the dichroic mirror 711, may be altered. Yet for other types of radiation source light 11/ device radiation 101 other ways of changing the polarization state may be used, such as placing ½ of ¼ lambda waveplates in the light path. A ½ lambda waveplate will change the polarization from S to P and vice versa. A ¼ lambda wave plate 721 will change linear polarized light into circular polarized light, and vice versa. Also, by rotating the waveplates the polarization state can be changed, e.g. made elliptical.

The embodiment is based on the above described phenomenon; in the figure, the arrows from the top to the bottom may depict the successive passes: Through the first assembly element 710 p-polarized radiation lOlp, indicated with J, may pass, whereas s- polarized radiation 101s, indicated with ·, is reflected. When passing the second assembly element 720 linear polarized radiation 101s, lOlp will be converted to circularly polarized radiation 101c, indicated with the circular arrow, and vice versa. Hence, using the second assembly element 720 circularly polarized device radiation will be provided to the reactor 200. Unused device radiation 101 will pass through the reactor 200 and may be reflected to the reactor 200 via the third assembly element 730, etc.. The figure depicts that the polarized device radiation 101 may be provided with multiple occasions where it can contribute to the photo-chemical reaction, in the depicted figure 4 times. Hence assume if in a “normal pass”, only 50% of the device radiation 101 is used/absorbed by the photochemical reaction, of those 50% (absolute) 43.75% (absolute) (i.e. 87.5% relative) may be recycled in four passes through the assembly 1000: 1 ^st pass -50% used and 50% is transmitted further; 2 ^nd pass - 50%*0.5=25% used and 25% transmitted further; 3 ^rd pass - 25%*0.5- 12.5% used and 12.5% transmitted further; 4 ^th pass - 12.5%*0.5=6.25% used and 6.25% transmitted further. This way, a total of 93.75 % may be used in the photochemical reaction.

In Fig. 5 another embodiment is depicted to further recycle unused device radiation 101. In embodiments, the assembly 1000 may comprise a luminescent material 20 configured to convert part of the device radiation 101 that during operation of the photoreactor assembly 1000 is not absorbed by the fluidic reactor 200 into luminescent material light 21. The fluidic reactor 200 is configured in a light receiving relationship with the luminescent material 20. The luminescent material 20 may especially be configured at a reflecting element 740, e.g. a mirror 731 to reflect luminescent material light 21 and device radiation 101 back to the reactor 200. The luminescent material 21 may e.g. comprise a Ce:YAG, LuAG, LuYAG, YGdAG phosphor.

In the depicted embodiment, the assembly 1000 further comprises a dichroic mirror 711, e.g. a short-pass filter that may transmit the device radiation 101 and acts as a mirror for the luminescent material light 21. The unused device radiation 101 is converted using a luminescent material 20 and reflected back to the reactor 200. A part of the luminescent material light 21 that is not absorbed or used by the fluidic reactor may be reflected by the dichroic mirror 711 to the reactor 200 again. In the figure as well as in Fig. 6, the arrows from the top to the bottom (and from large to small) depict the successive passes, especially (the direction ol) the optical path for the radiation.

In specific embodiments a light source 10 may provide radiation/light 11, 101, e.g. in embodiments blue light e.g. 405nm or 445-460nm. The light source 10 may be a LED or laser, which may irradiate radiation source radiation 11 at certain wavelength of at a limited wavelength-range (providing the device radiation 101). Downstream of the radiation source 10, a dichroic mirror 711 may be configured, e.g., a short-pass filter. This mirror 711 transmits the device radiation 101 but acts as a mirror at wavelengths that are above that or beyond the emission spectrum of the device radiation 101. Especially, all radiation source radiation 11,101 is transmitted through the dichroic mirror/filter 711. This radiation 101 is introduced to the reactor 200. In this reactor 200, chemical input components in a fluid 5 may be introduced or may be pumped around. After interaction of the radiation 101, part of the radiation 101 may be transmitted or may not have contributed to the reaction or reaction area. This (unused) radiation 101 is then collected at the backside of the reactor. At this position, a mirror 731 coated with a phosphor 20 is configured. The remainder of the initial radiation 101 may hit the phosphor 20 and may be converted to luminescent material light 21 comprising another broad spectrum that is e.g., red-shifted.

As a Stokes-shift is introduced in the newly emitted light 21, some part of the optical energy is converted into heat. Therefore, the phosphor 20 may be cooled, e.g., via the mirror 731 attached to a cooling system 750, e.g. a heatsink with a fan or e.g. a liquid filled cooling system, a heat pipe, a vapor-phase chamber, etc.

The luminescent material light 21may then be directed back towards the reactor 200 via the back-mirror 731, located at the back of the phosphor 20. This light 21 may in embodiments be re-introduced in the reactor 200 again to take part in the chemical reaction. In specific embodiments, a part of the light 21 that still passes through the reactor 200 may hit the dichroic mirror 711, wherein it may be reflected towards the reactor 200, optionally passing again through the reactor 200. If there is still any light left, this may again hit the phosphor 20. Part of this remaining luminescent material light 21 may be reflected- back, and a small part (a few percent) may be re-absorbed and be re-emitted, at a wavelength that may be further (red) shifted than the original spectrum of the converted light 21, as is schematically depicted with the arrows that reduce in size. In further embodiments (not depicted), the assembly 1000 may further comprise one or more beam shaping reflectors. The back-mirror 731 and or dichroic mirror 711 may be arranged between one of the beam shaping reflectors and the reactor 200. The one or more beam shaping reflectors may especially be configured to reflect radiation 101 and/or material light 21 passing along the back-mirror 31 and/or the dichroic mirror 711 in a direction of the reactor 200.

In Fig. 6, a further alternative with a phosphor 20 on a PCB 760 (‘printed circuit board’) in-between LEDs 11 is shown. In this embodiment a PCB 760 is equipped with a mirror 731 and a phosphor 20 layer in-between the LEDs 10. At an opposite side of the reactor 200 a highly reflective mirror 731 is placed. The mirror 731 may be specular or diffuse. The remainder of the light 11 from the LED 10 from the first pass, is reflected and can take another pass through the reactor 200. A major part of the remainder of this 2 ^nd pass will hit the phosphor layer 20. The converted light 21 is reflected and emitted towards the reactor 200 again and may enable the same or a different reaction step of the photo-catalytic reaction that may takes place in the fluid 5 inside the reactor 200. After the 1 ^st pass of the converted light 21 through the reactor 200, it may be reflected, to have a 2 ^nd run. In this configuration, the phosphor 20 may be cooled via the PCB 760, which can e.g., be a thermally high performing copper or aluminum based metal core PCB. Like the embodiment of Fig. 5 also the embodiment depicted in Fig. 6 may further comprise one or more beam shaping reflectors. The mirror 731 and/or the PCB 760 may e.g. be arranged between one of the beam shaping reflectors and the reactor 200. The one or more beam shaping reflectors may then especially be configured to reflect radiation 101 and/or material light 21 passing along the mirror 31 and/or the PCB 760 in a direction of the reactor 200.

Fig. 7 depicts an embodiment of a dichroic mirror 711 that is configured to transmit p-polarized radiation lOlp and to reflect s-polarized radiation 101s. A beam 120 of device radiation 101 may be provided at an angle a to the dichroic mirror. In embodiments, especially for angles approaching 45° and higher s-polarized and p-polarized radiation may interact with the mirror (filter) 711 significantly different. In further, embodiments, incident angles near 0° may provide the same effect. The wavelength of the band edge of the dichroic mirror for p-polarized radiation lOlp may differ from the wavelength of the band edge for s- polarized radiation 101s. Depending on the angle a, this difference may in embodiments be enlarged. As a result, there is a range of wavelengths for which p-polarized light is highly transmitted while s-polarized light is highly reflected, as indicated in by the hatched area in the right figure. By configuring the dichroic mirror 711 to filter the radiation 101 at this wavelength )or up to this wavelength), only p-polarized radiation lOlp is transmitted and s- polarized radiation 101s is reflected.

Specific embodiments of the invention may be used to increase the use of the light 11 provided by a laser source 10 to illuminate the reagents in a fluid 5 inside a fluidic channel 220 and/or cavity 230. Different wavelengths/colors may be applied to the reagents in the fluid 5 at a certain time and at a certain position. This may be achieved by active beam steering and radiation beam 120 modulation. In this way, a “map” of the fluidic system 210 can be illuminated, where not only position but also temporal modulation can be applied to the reagents, during their travel through the fluidic channels 220. Also, specific laser radiation 11 may be used to locally add extra heat to the reagents inside the fluid 5, during specific reaction steps that take place during the travel of the fluids 5 though the reactor 200. The assembly may comprise in embodiments the radiation source(s) 10, the beam steering device 400, the sensor 500 and the control system 300.

In embodiments the radiation source radiation 10 may comprise laser radiation/ light 11. Laser radiation 11 may in embodiments be advantageously used as a result of one or more of the flowing properties: The (laser) radiation 11 may be monochromatic, allowing very specific tuning to a certain reaction step. A laser 10 may be pulsed extremely high (e.g., 5x DC level), if the average maximum DC level is not surpassed. This may enable high power wavelength multiplexing, make use of a-linear effects in chemical reactions, or enable short high-power exposure (e.g., using different wavelengths at different positions or at different times sequentially) of certain positions at specific times in the fluidic system 210. Further, multiple different colors of laser light 11 can be mixed using, e.g., a dichroic combiner cube, which may provide a substantially perfect overlay of the beams. By doing so, multiple laser lines can be used to irradiate the exact same position at the same time, or sequentially. Because the laser light is polarized by nature, laser beams with the same color (or different colors as well) may be combined/overlay ed perfectly by means of a polarizing beam splitter cube (PBS) 670; The beam may be made extremely parallel, so it can travel long distances without spot broadening; By using a telescope 630, a parallel beam 120 can be widened or shrunken to match the width of the fluidic channels 220 or cavities 230; If needed, the laser 10 can be focused on the fluidic system 210 into a very small spot (<10mi crons) by means of e.g. a f-theta lens 610, which may ensure that the focal point remains constant over the full area of the fluidic system 210.

In further specific embodiments the sensor 500 may be used for detecting a type of reactor 200 that is being used, determining a position of the fluidic system 210, especially of the one or more channels 220 and/or the one or more cavities 230, detection of a distance between galvo and reactor 200, especially to automatically compensate for height deviations e.g. by means of applying test pulses to extremes, especially comers of the fluidic system 210, align a laser trajectory with the fluidic channel 220 and/or cavity 230, e.g., adjust for x-y and phi-angle displacement (of a planar fluidic system 210, especially wherein a plane of the fluidic system 210 is defined by the x and y direction).

In further embodiments, the control system 300 may be used (i) to control the beam steering device 400, e.g. the galvo-scanner, and the radiation generating device 100, e.g. a laser system; (ii) process the sensor signal form the sensor 500 and apply adjustments to the device radiation beam 120 trajectory; (iii) calculate corrections with respect to the z- position (perpendicular to the x and y direction) by applying test pulses and detecting the positions of the spots on the fluidic system 210 - especially the plane of the fluidic system may be arranged in a vertical direction, especially parallel to a direction of gravity; in case of a (slightly) tilted plane (i.e. in case of a z-offset) of the fluidic system 210, an x-y theta correction can be done and deviations originating from z-offset can be compensated for; (iv)synchronization of the beam steering and laser modulation.

Because in embodiments the control system 300 has full control over the laser driver (and thus the lasers) and the galvo scanner, it is possible to apply various protocols.

As the speed of the scanning beam is very fast compared to that of the speed of the liquid, it is possible to illuminate the reaction fluids inside the fluidic channels with different colors, combination of colors and different flux levels at any given time at any given positions within the boundaries of translation and jumping speeds of the galvo-scanner (or other scanning means). The modulation speed of the laser is not limiting in this case, but the galvo-speed is.

When using the assembly 1000 of the invention it is possible in embodiments to illuminate with different colors, using different time scales, while the beam 120 is only very precisely aimed at the fluid channels 220 and/or cavities 230. Especially, almost no light 101 may be lost and the flux levels that can be achieved locally may be extremely high (over 5W/mm2). Further, when using one or more lasers 10, the lasers 10 may be pulsed, either at the same time of after each other, which may enable even higher pulsed flux levels locally. This can be done at the position of the channel 220, or at further specific locations such as (dedicated) cavities 230, e.g. reaction chambers or mixing chambers, or at areas that may adsorb the radiation 101 in order to locally heat up the reagents. Due to the modulation possibilities it may be possible to also vary the optical, but also thermal load during the reacting trajectory. E.g., absorbers can be placed to absorb a particular type of radiation, e.g. a particular color and may locally heat the reagents. In embodiments, it is e.g. possible to use one laser 10a for the photo-chemical reaction, whereas a different laser 10b is used to apply a thermal load / locally apply heat to the reaction fluid 5.

The invention allows to tune various parameters throughout the reaction channel 220 and in the cavity 230, thus influencing the reaction chain, which can be beneficial in some cases by e.g. reducing unwanted by-products or increased reaction speed by local thermal assistance etc.

In specific further embodiments, the invention provides a photoreactor assembly 1000 comprising a fluidic reactor 200, a radiation generating device 100, and optionally a control system 300 (or wherein the assembly 1000 is configured to functionally couple to the control system 300), wherein (i) the radiation generating device 100 is configured to generate device radiation 101, wherein the device radiation 101 comprises one or more of UV radiation, visible radiation, and IR radiation, wherein the radiation generating device 100 comprises a radiation source 10 (or a light source) (as described herein); (ii) the fluidic reactor 200 comprises a fluidic system 210 for hosting a fluid, wherein the fluidic system 210 comprises one or more reactor channels 220 and/or one or more reactor cavities 230, wherein the fluidic system 210 is at least partly defined by a radiation transmissive reactor wall 201, wherein the radiation transmissive reactor wall 201 is radiation transmissive for the device radiation 101; and especially (iii) the control system 300 is configured to control the radiation generating device 100.

The term “plurality” refers to two or more. Furthermore, the terms “a plurality of’ and “a number of’ may be used interchangeably.

The terms “substantially” or “essentially” herein, and similar terms, will be understood by the person skilled in the art. The terms “substantially” or “essentially” may also include embodiments with “entirely”, “completely”, “ah”, etc. Hence, in embodiments the adjective substantially or essentially may also be removed. Where applicable, the term “substantially” or the term “essentially” may also relate to 90% or higher, such as 95% or higher, especially 99% or higher, even more especially 99.5% or higher, including 100%. Moreover, the terms ’’about” and “approximately” may also relate to 90% or higher, such as 95% or higher, especially 99% or higher, even more especially 99.5% or higher, including 100%. For numerical values it is to be understood that the terms “substantially”,

“essentially”, “about”, and “approximately” may also relate to the range of 90% - 110%, such as 95%-105%, especially 99%-101% of the values(s) it refers to. The term “comprise” also includes embodiments wherein the term “comprises” means “consists of’.

The term “and/or” especially relates to one or more of the items mentioned before and after “and/or”. For instance, a phrase “item 1 and/or item 2” and similar phrases may relate to one or more of item 1 and item 2. The term "comprising" may in an embodiment refer to "consisting of but may in another embodiment also refer to "containing at least the defined species and optionally one or more other species".

Furthermore, the terms first, second, third and the like in the description and in the claims, are used for distinguishing between similar elements and not necessarily for describing a sequential or chronological order. It is to be understood that the terms so used are interchangeable under appropriate circumstances and that the embodiments of the invention described herein are capable of operation in other sequences than described or illustrated herein.

The devices, apparatus, or systems may herein amongst others be described during operation. As will be clear to the person skilled in the art, the invention is not limited to methods of operation, or devices, apparatus, or systems in operation.

The term “further embodiment” and similar terms may refer to an embodiment comprising the features of the previously discussed embodiment but may also refer to an alternative embodiment.

It should be noted that the above-mentioned embodiments illustrate rather than limit the invention, and that those skilled in the art will be able to design many alternative embodiments without departing from the scope of the appended claims.

In the claims, any reference signs placed between parentheses shall not be construed as limiting the claim.

Use of the verb "to comprise" and its conjugations does not exclude the presence of elements or steps other than those stated in a claim. Unless the context clearly requires otherwise, throughout the description and the claims, the words “comprise”, “comprising”, “include”, “including”, “contain”, “containing” and the like are to be construed in an inclusive sense as opposed to an exclusive or exhaustive sense; that is to say, in the sense of “including, but not limited to”.

The article "a" or "an" preceding an element does not exclude the presence of a plurality of such elements.

The invention may be implemented by means of hardware comprising several distinct elements, and by means of a suitably programmed computer. In a device claim, or an apparatus claim, or a system claim, enumerating several means, several of these means may be embodied by one and the same item of hardware. The mere fact that certain measures are recited in mutually different dependent claims does not indicate that a combination of these measures cannot be used to advantage. The invention also provides a control system that may control the device, apparatus, or system, or that may execute the herein described method or process. Yet further, the invention also provides a computer program product, when running on a computer which is functionally coupled to or comprised by the device, apparatus, or system, controls one or more controllable elements of such device, apparatus, or system. The invention further applies to a device, apparatus, or system comprising one or more of the characterizing features described in the description and/or shown in the attached drawings. The invention further pertains to a method or process comprising one or more of the characterizing features described in the description and/or shown in the attached drawings. Moreover, if a method or an embodiment of the method is described being executed in a device, apparatus, or system, it will be understood that the device, apparatus, or system is suitable for or configured for (executing) the method or the embodiment of the method, respectively.

The various aspects discussed in this patent can be combined in order to provide additional advantages. Further, the person skilled in the art will understand that embodiments can be combined, and that also more than two embodiments can be combined. Furthermore, some of the features can form the basis for one or more divisional applications.