PHOTO-CURED HIGH-SOLID-PHASE SILICON NITRIDE CERAMIC, AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF

WIPO Patent Application WO/2022/222448

A1

A photo-cured high-solid-phase silicon nitride ceramic, and a preparation method therefor and an application thereof, relating to the technical field of ceramic materials. The preparation method comprises: placing a prepared base layer resin mixed solution in a 3D printer material tank, and printing a base layer model; placing configured high-solid-phase silicon nitride ceramic slurry in the 3D printing material tank, and printing a model ceramic layer under auxiliary leveling of a scraper; after the molding is finished, removing the cured base layer resin and ceramic layer from a printing platform by using a blade, and removing the base layer resin by using a ceramic degreasing process to obtain a final photo-cured ceramic biscuit. According to the printing method, the problem of a low forming success rate caused by high viscosity and photo-curing depth of high-solid-phase silicon nitride ceramic slurry can be effectively solved, moreover, the photo-cured high-solid-phase silicon nitride forming defect can be reduced, and the printing precision is improved.

WU SHANGHUA (CN)
SUN ZHENFEI (CN)
LV DONGLIN (CN)
OU JUN (CN)
HUANG SHENGWU (CN)
WANG BO (CN)
YANG PING (CN)

PCT/CN2021/130652

October 27, 2022

November 15, 2021

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UNIV GUANGDONG TECHNOLOGY (CN)

C04B35/596; B28B1/00; B29C64/124; C04B35/622; C04B35/634

CN113511901A	2021-10-19
CN106810215A	2017-06-09
CN107158474A	2017-09-15
CN108675798A	2018-10-19
CN106699191A	2017-05-24
KR20190068652A	2019-06-19
CN109133917A	2019-01-04

SHENZHEN TALENT PATENT SERVICE (CN)

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