Title:
PELLICLE FRAME FOR EXTREME ULTRAVIOLET LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO/2022/169171
Kind Code:
A2
Abstract:
The present invention relates to a pellicle frame for extreme ultraviolet lithography. More specifically, the present invention relates to a pellicle frame for extreme ultraviolet lithography ensuring ventilation. The present invention provides a pellicle frame for extreme ultraviolet lithography which is a hollow and cylindrical pellicle frame for supporting a pellicle membrane, and comprises: a porous frame including an inner surface and an outer surface and having a plurality of pores such that gas can pass through the inner surface, the outer surface, and a gap therebetween; a top reinforcement frame coupled to the top surface of the porous frame; and a bottom reinforcement frame coupled to the bottom surface of the porous frame. The pellicle frame for extreme ultraviolet lithography, according to the present invention, has excellent mechanical strength while ensuring ventilation, and has the advantage of minimizing the generation of outgas.
Inventors:
YU LAN (KR)
KIM CHEONG (KR)
CHO SANG JIN (KR)
KIM KYOUNG SOO (KR)
LEE SO YOON (KR)
SEO KYOUNG WON (KR)
CHOI JAE HYUCK (KR)
MOON SEONG YONG (KR)
KIM JI KANG (KR)
KIM CHEONG (KR)
CHO SANG JIN (KR)
KIM KYOUNG SOO (KR)
LEE SO YOON (KR)
SEO KYOUNG WON (KR)
CHOI JAE HYUCK (KR)
MOON SEONG YONG (KR)
KIM JI KANG (KR)
Application Number:
PCT/KR2022/001278
Publication Date:
August 11, 2022
Filing Date:
January 25, 2022
Export Citation:
Assignee:
FINE SEMITECH CORP (KR)
International Classes:
G03F1/64
Attorney, Agent or Firm:
DYNE PATENT & LAW FIRM (KR)
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