Title:
PARAMETER ANALYSIS METHOD AND DEVICE OF MASK PLATE
Document Type and Number:
WIPO Patent Application WO/2021/175245
Kind Code:
A1
Abstract:
A parameter analysis method and device of a mask plate. The method comprises: obtaining detection parameters of at least one mask pattern, the detection parameters comprising deviation coordinates between measured coordinates of each alignment mark in a mask pattern prepared by a mask plate and preset coordinates of each alignment mark in a layout of the mask pattern; obtaining, according to the detection parameters, the direction and vector length of a deviation vector of the deviation coordinates of each alignment mark in the mask pattern; and generating quality analysis data of the mask plate according to the direction and vector length of the deviation vector of each alignment mark in the mask pattern. According to the method, operation is simple, efficiency is high, and the accuracy of the generated analysis data is high.
Inventors:
ZU JIANGJIAO (CN)
Application Number:
PCT/CN2021/078850
Publication Date:
September 10, 2021
Filing Date:
March 03, 2021
Export Citation:
Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G03F1/36; G03F1/72; G03F1/84
Foreign References:
| CN105573047A | 2016-05-11 | |||
| US20080028361A1 | 2008-01-31 | |||
| CN102566291A | 2012-07-11 | |||
| US20100211352A1 | 2010-08-19 | |||
| CN104423140A | 2015-03-18 | |||
| US20180293720A1 | 2018-10-11 |
Attorney, Agent or Firm:
BEIJING INTELLEGAL INTELLECTUAL PROPERTY AGENT LTD. (CN)
Download PDF:
Previous Patent: AUTHORIZATION AND POLICY PARAMETER CONFIGURATION METHOD, TERMINAL, AND NETWORK FUNCTIONS
Next Patent: SOCKET, PLUG AND POWER STRIP
Next Patent: SOCKET, PLUG AND POWER STRIP