MONITORING METHOD, APPARATUS AND SYSTEM

WIPO Patent Application WO/2024/044900

A1

A monitoring method, apparatus and system. The method comprises: a processing apparatus receiving collected information from a detector, wherein the collected information comprises at least one of the following: reflected-light information of a user, heat radiation information of the user, or image information of the user; the processing apparatus determining, according to the collected information, a first light receiver unit in the detector, which first light receiver unit collects ROI information of the user; the processing apparatus determining, according to correspondences between light receiver units and time units, a first time unit corresponding to the first light receiver unit; and the processing apparatus increasing the irradiation power of a light source in the first time unit. Since a processing apparatus increases the irradiation power of a light source in a first time unit in which ROI information is collected, the problem of a monitoring effect being poor due to light being insufficient is solved; and the processing apparatus does not increase the irradiation power in the other time units, such that the problem of the user experience being poor due to the light intensity of an external light source being excessively great is solved.

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ZHANG JIANAN (CN)
HUANG JINGJING (CN)
ZHANG JUNPING (CN)

PCT/CN2022/115554

March 07, 2024

August 29, 2022

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HUAWEI TECH CO LTD (CN)

H04N7/18

CN103156636A	2013-06-19
CN104853107A	2015-08-19
US20020196535A1	2002-12-26
US20160360970A1	2016-12-15

TDIP & PARTNERS (CN)

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