METHOD FOR PRODUCING SILICON OXYNITRIDE GLASS, METHOD FOR PRODUCING OPTICAL WAVEGUIDE, SILICON OXYNITRIDE GLASS, OPTICAL WAVEGUIDE, INFRARED IMAGE FURNACE, WINDOW MATERIAL, AND OPTICAL MEMBER

Title:

METHOD FOR PRODUCING SILICON OXYNITRIDE GLASS, METHOD FOR PRODUCING OPTICAL WAVEGUIDE, SILICON OXYNITRIDE GLASS, OPTICAL WAVEGUIDE, INFRARED IMAGE FURNACE, WINDOW MATERIAL, AND OPTICAL MEMBER

Document Type and Number:

WIPO Patent Application WO/2023/136349

Kind Code:

A1

Abstract:

Silicon oxynitride glass can easily be produced according to a method for producing silicon oxynitride glass that includes bringing silica particles into contact with ammonia gas under heating, and sintering the silicon oxynitride particles obtained through said contact by heating to a temperature exceeding 1500°C using a spark plasma sintering method.

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Inventors:

SEGAWA HIROYO (JP)
OHASHI NAOKI (JP)
OSAWA YUTA (JP)
YOSHIDA TERU (JP)

Application Number:

PCT/JP2023/001034

Publication Date:

July 20, 2023

Filing Date:

January 16, 2023

Export Citation:

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Assignee:

NAT INST MATERIALS SCIENCE (JP)

International Classes:

C03B8/00; G02B1/00; G02B3/00; G02B6/02

Foreign References:

JPH01167255A	1989-06-30
JP2000143257A	2000-05-23
JPH10502324A	1998-03-03

Other References:

SJOBERG, J. ET AL.: "PREPARATION OF Si2N2O BASED SINTERED BODIES FROM POWDERS MADE BY NITRIDATION OF AMORPHOUS SILICA IN AMMONIA", HIGH TECH CERAM. A, 1987, pages 535 - 543, XP009547743
FAN LEI, SHI ZHONGQI, LU XUEFENG, WANG CHAO, CHEN MENG, LI YAWEN, WANG HONGJIE, RIEDEL: "Silicon Oxynitride Ceramics Prepared by Plasma Activated Sintering of Nanosized Amorphous Silicon Nitride Powder without Additives", JOURNAL OF THE AMERICAN CERAMIC SOCIETY, BLACKWELL PUBLISHING, MALDEN, MA., US, vol. 96, no. 8, 1 August 2013 (2013-08-01), US , pages 2358 - 2361, XP055845955, ISSN: 0002-7820, DOI: 10.1111/jace.12463