Title:
METHOD FOR PRODUCING POLISHING LIQUID COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2012/086698
Kind Code:
A1
Abstract:
Provided is a method for producing a polishing liquid composition which is capable of reducing scratches and particles on an object to be polished after polishing. Specifically provided is a method for producing a polishing liquid composition, which comprises a process wherein a silica particle dispersion liquid that contains colloidal silica having an average particle diameter of primary particles of 1-100 nm is filtered by a filtration filter. The filtration filter contains diatomite that is cationized using a polyvalent amine compound that has 9-200 cationic groups in each molecule.
Inventors:
YONEDA YASUHIRO
SATO KANJI
SATO KANJI
Application Number:
PCT/JP2011/079666
Publication Date:
June 28, 2012
Filing Date:
December 21, 2011
Export Citation:
Assignee:
KAO CORP (JP)
YONEDA YASUHIRO
SATO KANJI
YONEDA YASUHIRO
SATO KANJI
International Classes:
C09K3/14; B01D37/02; B24B37/00; H01L21/304
Foreign References:
| JP2010095568A | 2010-04-30 | |||
| JP2006075975A | 2006-03-23 | |||
| JPS5015162A | 1975-02-18 | |||
| US3352424A | 1967-11-14 |
Attorney, Agent or Firm:
IKEUCHI SATO & PARTNER PATENT ATTORNEYS (JP)
Patent business corporation Ikeuchi and Sato and partners (JP)
Patent business corporation Ikeuchi and Sato and partners (JP)
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Claims: