Title:
METHOD FOR PRODUCING HYDROGEN FLUORIDE ADSORBENT
Document Type and Number:
WIPO Patent Application WO/2024/053704
Kind Code:
A1
Abstract:
The present invention provides a method for producing a hydrogen fluoride adsorbent that has a high hydrogen fluoride adsorption capacity. This method for producing a hydrogen fluoride adsorbent comprises: an adsorption step in which a hydrogen fluoride-containing gas that contains hydrogen fluoride and a diluent gas for diluting the hydrogen fluoride, with the hydrogen fluoride concentration being 0.5% by volume to 60% by volume, is brought into contact with a metal fluoride, thereby having the hydrogen fluoride in the hydrogen fluoride-containing gas adsorbed on the metal fluoride so that the proportion of the hydrogen fluoride in the metal fluoride, on which the hydrogen fluoride is adsorbed, is 2% by mass to 25% by mass; and a desorption step in which the metal fluoride, on which hydrogen fluoride has been adsorbed in the adsorption step, is heated at a temperature of 240°C or less in a heat treatment atmosphere gas, thereby having the adsorbed hydrogen fluoride desorbed from the metal fluoride.
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Inventors:
KANAUCHI RIKU (JP)
FUKUCHI YOHSUKE (JP)
KOBAYASHI HIROSHI (JP)
FUKUCHI YOHSUKE (JP)
KOBAYASHI HIROSHI (JP)
Application Number:
PCT/JP2023/032671
Publication Date:
March 14, 2024
Filing Date:
September 07, 2023
Export Citation:
Assignee:
RESONAC CORP (JP)
International Classes:
B01J20/04; B01D53/68; B01J2/00; B01J20/30; C01D3/02
Domestic Patent References:
| WO2022185879A1 | 2022-09-09 | |||
| WO2022185878A1 | 2022-09-09 |
Foreign References:
| JP2006282487A | 2006-10-19 | |||
| JP2008214187A | 2008-09-18 | |||
| JPS51126395A | 1976-11-04 | |||
| JP2011017077A | 2011-01-27 | |||
| CN107441883A | 2017-12-08 | |||
| CN112551559A | 2021-03-26 | |||
| JPH072515A | 1995-01-06 |
Attorney, Agent or Firm:
TANAKA Hidetetsu et al. (JP)
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