Title:
MASK PLATE DESIGN
Document Type and Number:
WIPO Patent Application WO2002077327
Kind Code:
B1
Abstract:
The present invention includes a mask plate design that includes at least one or a plurality of channels portions on a surface of the mask plate, into which electrolyte solution will accumulate when the mask plate surface is disposed on a surface of wafer, and out of which the electrolyte solution will freely flow. There are also at least one or a plurality of polish portions on the mask plate surface that allow for polishing of the wafer when the mask plate surface is disposed on a surface of wafer.
Inventors:
BASOL BULENT M
UZOH CYPRIAN
BOGART JEFF A
UZOH CYPRIAN
BOGART JEFF A
Application Number:
PCT/US2002/006231
Publication Date:
March 27, 2003
Filing Date:
February 27, 2002
Export Citation:
Assignee:
NUTOOL INC (US)
International Classes:
B24B37/04; C25D5/02; C25D5/08; C25D5/22; C25D7/12; C25F7/00; H01L21/288; H01L21/768; (IPC1-7): C25D5/02; C25D5/22; C25F7/00; H01L21/288; H01L21/768; B24B37/04; B24D7/10
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