MASK, MASK MANUFACTURING METHOD, DISPLAY DEVICE MANUFACTURING METHOD, AND DISPLAY DEVICE

WIPO Patent Application WO/2024/057754

A1

Provided are a mask with which superior workability and transferability of individual pieces can be achieved, a mask manufacturing method, a display device manufacturing method, and a display device. A curable resin film (22) that is provided on a substrate (21) is irradiated with a laser beam from the substrate (21) side, using a mask in an opening that allows the laser beam to pass through, said mask having a light blocking section of a prescribed shape that blocks the laser beam and transmitting the laser beam at the periphery of the light blocking section. The curable resin film (22) in the irradiated section is removed (removed section (23)), and individual pieces that have prescribed shapes, comprise the curable resin film (22), and have a reaction percentage of 25% or less are formed on the substrate (21). Thus, superior workability and transferability of individual pieces can be achieved, and takt time can be improved.

JP3236484	ENERGY BEAM PROCESSING METHOD AND ENERGY BEAM PROCESSING DEVICE
JPH0417992	POWER DAMPER
JP2003100653	APPARATUS AND METHOD FOR WORKING

TSUKAO REIJI (JP)
HAYASHI NAOKI (JP)
WATANABE KAZUMU (JP)
NODA DAIKI (JP)
SHIRAIWA TOSHIKI (JP)
YAMAOKA HIROSHI (JP)
KURATA MASAMI (JP)
USAMI TAKETO (JP)
OGAWA TAKANORI (JP)
KONDO KAZUNORI (JP)

PCT/JP2023/028273

March 21, 2024

August 02, 2023

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DEXERIALS CORP (JP)
SHINETSU CHEMICAL CO (JP)

B23K26/066; B23K26/361; G09F9/00; G09F9/33; H01L33/00; H01L33/62

WO2017150257A1

2017-09-08

JP2004233251A	2004-08-19
JPS5371398A	1978-06-24
JP2010020925A	2010-01-28

NOGUCHI, Nobuhiro (JP)

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