Title:
MASK DATA GENERATION METHOD AND MASK DATA GENERATION PROGRAM
Document Type and Number:
WIPO Patent Application WO/2021/167005
Kind Code:
A1
Abstract:
The objective of the present invention is to generate, in a shorter time, mask data for a pixel-based mask with which it is possible to obtain a projection image similar to that obtained when a mask based on polygon mask data is used. This mask data generation method comprises: calculating a first evaluation value for a projection image based on first mask data in which a first value or second value is set for each of multiple unit elements (S102); among the first mask data, changing, to the second value, the value of a first unit element for which the first value is set, and changing, to the first value, the value of a second unit element which is disposed close to the first unit element and for which the second value is set, to generate second mask data(S106); calculating a second evaluation value for a projection image based on the second mask data (S107); and, on the basis of the result obtained by comparing the first evaluation value and the second evaluation value (S108), selecting one of the first mask data and the second mask data as output mask data.
Inventors:
OKUDAIRA YOSUKE (JP)
YASHIKI SATOSHI (JP)
YASHIKI SATOSHI (JP)
Application Number:
PCT/JP2021/006127
Publication Date:
August 26, 2021
Filing Date:
February 18, 2021
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F1/26; G03F1/36; G03F1/70; G06F30/39
Foreign References:
| JP2013213973A | 2013-10-17 | |||
| JP2014182179A | 2014-09-29 | |||
| JP2008505363A | 2008-02-21 | |||
| JP2005513770A | 2005-05-12 | |||
| JP4695711B2 | 2011-06-08 | |||
| JPH086228A | 1996-01-12 |
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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