Title:
MANUFACTURING METHOD FOR POLISHING COMPOSITION, AND POLISHING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2024/071086
Kind Code:
A1
Abstract:
Provided are a polishing composition, a substrate protection agent, and manufacturing methods therefor, said polishing composition containing a cellulose derivative, and being effective for reducing surface defects after polishing. Provided is a manufacturing method for a polishing composition containing abrasive grains, a basic compound, a cellulose derivative, and a surfactant. Said manufacturing method comprises a step (A) for producing a base cellulose derivative solution by dissolving a base cellulose derivative in a solvent, and either: a step (B1) for heating the base cellulose derivative solution, and a step (B2) for adding a base surfactant to the base cellulose derivative solution that has undergone the step (B1); or a step (C1) for producing an additive-agent mixed liquid by adding a base surfactant to the base cellulose derivative solution, and a step (C2) for heating the additive-agent mixed liquid.
Inventors:
MURASE TAKEHIKO (JP)
TSUCHIYA KOHSUKE (JP)
TANSHO HISANORI (JP)
TSUCHIYA KOHSUKE (JP)
TANSHO HISANORI (JP)
Application Number:
PCT/JP2023/034854
Publication Date:
April 04, 2024
Filing Date:
September 26, 2023
Export Citation:
Assignee:
FUJIMI INC (JP)
International Classes:
H01L21/304; B24B37/00; C09G1/02; C09K3/14
Attorney, Agent or Firm:
ABE, Makoto (JP)
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