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Title:
MANUFACTURING METHOD FOR GLASS SUBSTRATE AND MANUFACTURING METHOD FOR EUVL MASK BLANK
Document Type and Number:
WIPO Patent Application WO/2021/172449
Kind Code:
A1
Abstract:
This method for manufacturing a glass substrate includes the following (A)-(D). (A) A glass substrate, which is formed from Ti-doped quartz glass, is housed in a processing container. (B) A drying gas is supplied to the inside of the processing container and the partial water vapor pressure inside the processing container is adjusted to be less than 400 Pa. (C) A halogen-containing gas is supplied to a machining head inside the processing container, the halogen-containing gas is turned into plasma, and halogen radicals are generated. (D) In a state in which the partial water vapor pressure is less than 400 Pa, the halogen radicals are used to etch the glass substrate while the machining head and the glass substrate move relative to each other. The overall temperature of the glass substrate is 90°C or higher during the etching of the glass substrate.

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Inventors:
AZUMA SHINYA (JP)
MIYAMOTO NAOAKI (JP)
FURUKAWA TOMOKI (JP)
Application Number:
PCT/JP2021/007155
Publication Date:
September 02, 2021
Filing Date:
February 25, 2021
Export Citation:
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Assignee:
AGC INC (JP)
International Classes:
C03C15/00; C03C23/00; G03F1/24; G03F1/60
Foreign References:
JP2006076816A2006-03-23
JP2019071407A2019-05-09
JP2013184872A2013-09-19
JP2018061007A2018-04-12
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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