Title:
LOW INTENSITY PHOTOMASK AND SYSTEM, METHOD AND PROGRAM PRODUCT FOR MAKING LOW INTENSITY PHOTOMASK FOR USE IN FLAT PANEL DISPLAY LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO/2023/183218
Kind Code:
A9
Abstract:
A method of manufacturing a photomask including the steps of receiving initial photomask design data associated with one or more patterns to be formed on a photomask and optimizing the initial photomask design data to minimize printing exposure energy while maintaining an acceptable pattern quality and size. In embodiments, the step of optimizing includes setting minimization of printing exposure energy as a priority design rule, setting optimization of pattern quality and size as a secondary design rule, iterating size of mask design features to determine a range of size biases that satisfy both the priority and secondary design rules so as to provide an initial optimized mask design, and adjusting mask variables over the range of size biases to determine mask variables that further optimize the initial optimized mask design to obtain a final optimized mask design.
Inventors:
PROGLER CHRISTOPHER (US)
HAM YOUNG MOG (US)
HAM YOUNG MOG (US)
Application Number:
PCT/US2023/015615
Publication Date:
October 26, 2023
Filing Date:
March 20, 2023
Export Citation:
Assignee:
PHOTRONICS INC (US)
International Classes:
G03F1/70; G03F7/20; G06F30/20; G06F30/398; G03F1/36
Attorney, Agent or Firm:
HALPERN, Benjamin, M. (US)
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