Title:
LASER ANNEALING DEVICE AND LASER ANNEALING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/039310
Kind Code:
A1
Abstract:
The present invention comprises: a plurality of light sources that each emit continuously oscillated laser light; and an optical head that processes the respective laser lights emitted from the plurality of light sources so as to form concentrated laser beams, enabling the respective laser beams to be projected in accordance with a sequence within the modification-planned region positioned above the gate line. In the optical head, in a state where spot sections that are most concentrated in each of the laser beams are positioned in the film interior of the amorphous silicon film at the modification-planned region, the laser beams are relatively scanned along a direction in which the gate line extends within the modification-planned region.
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Inventors:
KOSUGI JUNICHI (JP)
YANG YINGBAO (JP)
YANG YINGBAO (JP)
Application Number:
PCT/JP2020/029833
Publication Date:
March 04, 2021
Filing Date:
August 04, 2020
Export Citation:
Assignee:
V TECH CO LTD (JP)
International Classes:
B23K26/354; B23K26/082; G02F1/1343; G02F1/1368; H01L21/20; H01L21/268; H01L21/336; H01L29/786
Foreign References:
JP2010118409A | 2010-05-27 | |||
JP2011165717A | 2011-08-25 | |||
JP2006041092A | 2006-02-09 | |||
JP2006100427A | 2006-04-13 |
Attorney, Agent or Firm:
NISSAY INTERNATIONAL PATENT OFFICE (JP)
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