Title:
IMAGING ELEMENT, IMAGING DEVICE AND PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2023/021740
Kind Code:
A1
Abstract:
The present technology pertains to an imaging element, imaging device and production method which make it possible to improve sensitivity and suppress a worsening of color-mixing. The present invention is equipped with: a substrate; photoelectric conversion regions provided to the substrate; a first highly reflective film which is provided between adjacent photoelectric conversion regions and inside an interpixel separation section provided to the substrate; and a second highly reflective film which is provided to a surface of the substrate which is opposite the light-incident surface thereof. The first and second highly reflective films are continuously formed from the same material. The second highly reflective film is formed outside a region where a transistor is formed. The present technology is applicable, for example, to an imaging element.
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Inventors:
MIURA TSUKASA (JP)
Application Number:
PCT/JP2022/008512
Publication Date:
February 23, 2023
Filing Date:
March 01, 2022
Export Citation:
Assignee:
SONY SEMICONDUCTOR SOLUTIONS CORP (JP)
International Classes:
H01L27/146
Foreign References:
| JP2016082133A | 2016-05-16 | |||
| JP2013098446A | 2013-05-20 | |||
| JP2021015869A | 2021-02-12 | |||
| JP2020174157A | 2020-10-22 |
Attorney, Agent or Firm:
NISHIKAWA Takashi et al. (JP)
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