Title:
GATE VALVE FOR VACUUM APPARATUS
Document Type and Number:
WIPO Patent Application WO/2007/066537
Kind Code:
A1
Abstract:
Even when a gate valve for a vacuum apparatus used in a vapor deposition apparatus is
in an open position, the reliability of holding of vacuum in a vapor deposition chamber
can be improved by protecting the inner wall face of a valve casing and a seal member
of a valve body against the vapor of a deposition material. A gate valve for a vacuum
apparatus is used as a gate valve (1) for an electron gun. When the valve is in a closing
position, as with the prior art technique, a valve body (3) detaches an electron
gun part from a vapor deposition chamber. On the other hand, when the valve is in
an open position, a valve chamber (15) is separated from the vapor deposition
chamber by inserting a cylindrical movable shield (22) into the valve chamber
(15) to prevent the inner wall face of a valve casing (2) and a seal member of the
valve body (3) from being exposed to vapor in the vapor deposition chamber, whereby
they are protected against the deposition of a deposition material (MgO).
Inventors:
IIJIMA EIICHI (JP)
Application Number:
PCT/JP2006/323682
Publication Date:
June 14, 2007
Filing Date:
November 28, 2006
Export Citation:
Assignee:
ULVAC INC (JP)
IIJIMA EIICHI (JP)
IIJIMA EIICHI (JP)
International Classes:
C23C14/24; F16K3/02; F16K51/02
Foreign References:
| JPS61272375A | 1986-12-02 | |||
| JPH05202467A | 1993-08-10 | |||
| JPS6293467U | 1987-06-15 | |||
| JPH0274671U | 1990-06-07 | |||
| JP2005146382A | 2005-06-09 | |||
| JPS55109169U | 1980-07-31 |
Attorney, Agent or Firm:
IISAKA, Yasuo (6-85 Benten-dori, Naka-k, Yokohama-shi Kanagawa 07, JP)
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